Nanoparticle composition with reduced contaminant and production method thereof

US12285526B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12285526-B2
Application numberUS-202017434883-A
CountryUS
Kind codeB2
Filing dateFeb 28, 2020
Priority dateMar 1, 2019
Publication dateApr 29, 2025
Grant dateApr 29, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for the production of the present disclosure comprises: a) a step of agitating a mixture containing a material to be ground, beads and a dispersion medium in a bead mill; and b) a step of adjusting the pH of the mixture. This method reduces a contamination caused by grinding process using a bead mill.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for the production of fine particles via a grinding process using a bead mill, wherein the method comprises: a) a step of preparing a slurry comprising a material to be ground and a dispersion medium, b) a step of adjusting the pH of the slurry prepared in the step a) to 6.5 to 9, and c) a step of agitating the slurry prepared in the step b) and beads in the bead mill; or wherein the method comprises: a′) a step of preparing a slurry comprising a material to be ground, beads and a dispersion medium, b′) a step of adjusting the pH of the slurry prepared in the step a′) to 6.5 to 9, and c′) a step of agitating the slurry prepared in the step b′) in the bead mill; wherein the material to be ground is a pharmaceutical compound, wherein impurities caused by the grinding process are derived from the beads and/or the bead mill, and wherein an amount of the impurities is less than 50 ppm with respect to the weight of the material to be ground. 2. The method according to claim 1 , wherein the dispersion medium comprises at least one selected from the group consisting of sodium linear alkylbenzene sulfonate, monoalkyl phosphate, sodium lauryl sulfate, cellulose polymer and vinyl polymer. 3. The method according to claim 1 , wherein the dispersion medium comprises polyvinylpyrrolidone. 4. The method according to claim 1 , wherein the dispersion medium comprises sodium lauryl sulfate. 5. The method according to claim 1 , wherein the dispersion medium comprises polyvinylpyrrolidone and sodium lauryl sulfate. 6. The method according to claim 1 , wherein the step b) of adjusting the pH of the slurry prepared in the step a) to 6.5 to 9 comprises adding an acidic substance or a basic substance to the slurry, or wherein the step b′) of adjusting the pH of the slurry prepared in the step a′) to 6.5 to 9 comprises adding an acidic substance or a basic substance to the slurry. 7. The method according to claim 1 , wherein the beads are zirconia beads. 8. The method according to claim 1 , wherein the beads comprise zirconium, yttrium and aluminum. 9. The method according to claim 1 , wherein the impurities are at least one selected from the group consisting of zirconium, yttrium and aluminum. 10. The production method according to claim 1 , wherein the fine particles are microparticles. 11. The production method according to claim 1 , wherein the fine particles are nanoparticles. 12. Fine particles obtained by the method according to claim 1 . 13. The fine particles according to claim 12 , which are microparticles. 14. The fine particles according to claim 12 , which are nanoparticles. 15. The fine particles according to claim 12 , wherein the fine particles comprise at least one kind of impurities selected from the group consisting of zirconium, yttrium and aluminum, and the amount of the impurities is 0.0001 ppm or more and less than 50 ppm. 16. A pharmaceutical composition comprising the fine particles according to claim 12 . 17. A method for reducing impurities caused by a grinding process using a bead mill, wherein the method comprises: a) a step of preparing a slurry comprising a material to be ground and a dispersion medium, b) a step of adjusting the pH of the slurry prepared in the step a) to 6.5 to 9, and c) a step of agitating the slurry prepared in the step b) and beads in the bead mill; or wherein the method comprises: a′) a step of preparing a slurry comprising a material to be ground, beads and a dispersion medium, b′) a step of adjusting the pH of the slurry prepared in the step a′) to 6.5 to 9, and c′) a step of agitating the slurry prepared in the step b′) in the bead mill; wherein the material to be ground is a pharmaceutical compound, wherein impurities caused by the grinding process are derived from the beads and/or the bead mill, and wherein an amount of the impurities is less than 50 ppm with respect to the weight of the material to be ground.

Assignees

Inventors

Classifications

  • Manufacture or treatment of nanostructures · CPC title

  • Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery · CPC title

  • Disintegrating members · CPC title

  • A61K9/14Primary

    Particulate form, e.g. powders, {Processes for size reducing of pure drugs or the resulting products, Pure drug nanoparticles (microspheres A61K9/16; microcapsules A61K9/50; nanocapsules, nanoparticles of the matrix type A61K9/51)} · CPC title

  • with organic macromolecular compounds · CPC title

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Frequently asked questions

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What does patent US12285526B2 cover?
A method for the production of the present disclosure comprises: a) a step of agitating a mixture containing a material to be ground, beads and a dispersion medium in a bead mill; and b) a step of adjusting the pH of the mixture. This method reduces a contamination caused by grinding process using a bead mill.
Who is the assignee on this patent?
Shionogi & Co, Hiroshima Metal & Machinery Co Ltd
What technology area does this patent fall under?
Primary CPC classification A61K9/14. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Apr 29 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).