Epitaxial structure

Patent metadata

Field	Value
Publication number	US-12281411-B2
Application number	US-202016950916-A
Country	US
Kind code	B2
Filing date	Nov 18, 2020
Priority date	Nov 18, 2019
Publication date	Apr 22, 2025
Grant date	Apr 22, 2025

Abstract

An epitaxial structure including at least a substrate, a nucleation layer, a buffer layer, a channel layer, a barrier layer, and a P-type aluminum indium gallium nitride layer is provided. The nucleation layer is formed on the substrate; the buffer layer is formed on the nucleation layer; the channel layer is formed on the buffer layer; the barrier layer is formed on the channel layer; and the P-type aluminum indium gallium nitride layer is formed on the barrier layer. The material of the P-type aluminum indium gallium nitride layer is AlInGaN with a P-type dopant, in which the contents of Al, In and Ga all change stepped-periodically or stepped-periodical-gradually in the thickness direction, and the doping concentration of the P-type dopant changes stepped-periodically or stepped-periodical-gradually in the thickness direction.

First claim

What is claimed is:

1. An epitaxial structure comprising:
a substrate;
a nucleation layer formed on the substrate;
a buffer layer formed on the nucleation layer;
a channel layer formed on the buffer layer;
a barrier layer formed on the channel layer; and
a P-type aluminum indium gallium nitride layer formed on the barrier layer, wherein a material of the P-type aluminum indium gallium nitride layer is AlInGaN with a P-type dopant, the P-type dopant is magnesium, iron, zinc, or carbon, wherein
a content of aluminum in the P-type aluminum indium gallium nitride layer includes alternating changes among a first minimum content, a first increasing content, a first discontinuous stepwise increasing content, and a first reducing content in a thickness direction,
a content of indium in the P-type aluminum indium gallium nitride layer includes alternating changes among a second minimum content, a second increasing content, a second discontinuous stepwise increasing content, and a second reducing content in the thickness direction, the first discontinuous stepwise increasing content in the content of aluminum and the second discontinuous stepwise increasing content in the content of indium simultaneously increase in the thickness direction,
a content of gallium in the P-type aluminum indium gallium nitride layer includes alternating changes among a third maximum content, a third reducing content, a third discontinuous stepwise reducing content, and a third increasing content in the thickness direction,
a doping concentration of the P-type dopant in the P-type aluminum indium gallium nitride layer includes alternating changes among a maximum concentration, a reducing concentration, a discontinuous stepwise reducing concentration, and an increasing concentration in the thickness direction, and
an initial value of the first discontinuous stepwise increasing content in the content of aluminum is more than 0% and less than or equal to 50%, an end value of the first discontinuous stepwise increasing content in the content of aluminum is 50% to 100%, an initial value of the second discontinuous stepwise increasing content in the content of indium is more than 0% and less than or equal to 50%, and an end value of the second discontinuous stepwise increasing content in the content of indium is 5% to 50%.

2. The epitaxial structure according to claim 1 , wherein a lattice constant of the P-type aluminum indium gallium nitride layer is 3.2-0.3 Å.

3. The epitaxial structure according to claim 1 , wherein a step slope of the first discontinuous stepwise increasing content in the content of aluminum is 0.1%/step to 50%/step, a slope of the first increasing content in the content of aluminum is 1%/nm to 50%/nm, and a slope of the first reducing content in the content of aluminum is-1%/nm to −50%/nm, a step slope of the second discontinuous stepwise increasing content in the content of indium is 0.1%/step to 20%/step, a slope of the second increasing content in the content of indium is 1%/nm to 10%/nm, and a slope of the second reducing content in the content of indium is-1%/nm to −10%/nm, and
an energy gap of the P-type aluminum indium gallium nitride layer includes alternating changes among a minimum value, an increasing value, a discontinuous stepwise increasing value, and a reducing value in the thickness direction, wherein the discontinuous stepwise increasing value simultaneously increases with the first discontinuous stepwise increasing content in the content of aluminum and the second discontinuous stepwise increasing content in the content of indium, and the discontinuous stepwise increasing value of the energy gap of the P-type aluminum indium gallium nitride layer changes from 3.4±1 eV to 5.03=1 eV in the thickness direction.

4. The epitaxial structure according to claim 3 , wherein a step slope of the discontinuous stepwise reducing concentration in the doping concentration is-1E17 cm −3 /step to −10E17 cm −3 /step, and a slope of the reducing concentration in the doping concentration is −1E17 cm −3 /nm to −10E17 cm −3 /nm, and a slope of the increasing concentration in the doping concentration is 1E17 cm −3 /nm to 10E17 cm −3 /nm.

Assignees

• Globalwafers Co Ltd

Inventors

• Liu Jia-Zhe
• Lin Tzu-Yao
• Shih Ying-Ru

Classifications

• H10P14/3444

  P-type · CPC title

• H10P14/3416

  Nitrides · CPC title

• H10P14/3254

  Graded layers · CPC title

• H10P14/3251

  consisting of three or more layers · CPC title

• H10P14/3216

  Nitrides · CPC title