Curable resin composition

Patent metadata

Field	Value
Publication number	US-12269917-B2
Application number	US-202017436498-A
Country	US
Kind code	B2
Filing date	Mar 27, 2020
Priority date	Mar 27, 2019
Publication date	Apr 8, 2025
Grant date	Apr 8, 2025

Abstract

Disclosed is a curable resin composition that has excellent curability by irradiation of light and heating and that is suitable for such applications as liquid encapsulants, liquid adhesives, adhesives for camera modules, and liquid crystal sealants. The curable resin composition contains (A) an aromatic epoxy resin having an allyl group, (B) a thiol-based curing agent, (C) a photoradical initiator, and (D) a thermally latent curing agent. Preferably, (A) the compound having an allyl group and an epoxy group is an aromatic epoxy resin having an allyl group. Preferably, the thiol-based curing agent, which is component (B), is in liquid form at 25° C.

First claim

The invention claimed is:

1. A curable resin composition comprising:
(A) a compound having an allyl group and an epoxy group;
(B) a thiol-based curing agent;
(C) a photoradical initiator; and
(D) at least one compound selected from the group consisting of thermally latent curing agents and curing catalysts,
wherein the compound having an allyl group and an epoxy group is an aromatic epoxy resin having an allyl group, wherein the aromatic epoxy resin is a compound represented by formula (1):

wherein m represents 0 or a positive number, Y is at least one moiety selected from the group consisting of formulae (Y-1) to (Y-3) and (Y-5) to (Y-9) below, and R 1 , R 2 , R 3 , and R 4 each independently represent a hydrogen atom, a C 1-4 alkyl group, an allyl group, or a glycidyloxy group

wherein n represents an integer from 4 to 12, R 5 and R 6 represent a hydrogen atom, R 7 and R 8 each independently represent a hydrogen atom or an unsubstituted or fluorine-substituted methyl group, and * represents a bonding site, and
wherein the component (D) is a modified amine-based curing agent comprising a polyepoxy and/or isocyanate adduct of an amine compound containing at least one active hydrogen.

2. The curable resin composition according to claim 1 , wherein the thiol-based curing agent which is the component (B) is in liquid form at 25° C.

3. The curable resin composition according to claim 1 , wherein the thiol-based curing agent which is the component (B) is a polythiol compound.

4. The curable resin composition according to claim 3 , wherein the polythiol compound is a polythiol ether of a polyol, or a polythiol having a heterocycle containing at least one nitrogen in a ring thereof.

5. The curable resin composition according to claim 1 , comprising, per 1 equivalent of the allyl group in the component (A), from 0.5 to 1.5 equivalents of the thiol-based curing agent which is the component (B).

6. The curable resin composition according to claim 1 , wherein the photoradical initiator which is the component (C) is at least one compound selected from the group consisting of acetophenone-based compounds, benzil-based compounds, benzophenone-based compounds, thioxanthone-based compounds, and oxime ester-based compounds.

7. The curable resin composition according to claim 6 , wherein the component (C) is an aminoacetophenone-based compound.

8. A method for curing a curable resin composition, comprising:
a step of pre-curing the curable resin composition according to claim 1 by irradiating the curable resin composition with light; and
a step of curing the pre-cured curable resin composition by heating the pre-cured curable resin composition.

9. A cured product obtained by first pre-curing the curable resin composition according to claim 1 by light, and then curing the pre-cured curable resin composition by heat.

10. The curable resin composition according to claim 1 , wherein Y in the formula (1) is the formula (Y-1).

11. The curable resin composition according to claim 10 , wherein R 1 , R 2 , R 3 , and R 4 in the formula (1) represent a hydrogen atom.

Assignees

• Adeka Corp

Inventors

• Kobayashi Shota
• Tamaso Ken-Ichi
• Ogawa Ryo
• Nagamatsu Tamotsu

Classifications

• C08J7/123

  Treatment by wave energy or particle radiation (C08J7/18 takes precedence) · CPC title

• C08J7/08

  Heat treatment · CPC title

• C08G2170/00

  Compositions for adhesives · CPC title

• C08G59/68

  characterised by the catalysts used · CPC title

• C08G59/66

  Mercaptans · CPC title