Chiral control
US-2024229026-A1 · Jul 11, 2024 · US
US12269840B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12269840-B2 |
| Application number | US-201917299087-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 3, 2019 |
| Priority date | Dec 4, 2018 |
| Publication date | Apr 8, 2025 |
| Grant date | Apr 8, 2025 |
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The invention generally relates to an improved processes for the preparation of a cyclic dinucleotide which is useful as a STING agonist of the following formula (I), involving the use of compounds A and B.
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We claim: 1. A process for the preparation of Compound I having the formula comprising the steps of a) reacting Compound 1 with TBSCl and Et 3 N to afford Compound 2; b) reacting Compound 2 with a phosphorus (V) compound consisting of Compound A to afford Compound 3 c) reacting Compound 3 and Compound 9 to afford Compound 4; d) reacting Compound 4 in a solvent, and then adding a base, followed by the addition of a phosphorus (V) compound consisting of Compound B to afford Compound 5 having the formula e) selectively deprotecting Compound 5 to afford Compound 6 having the formula f) the Compound 6 is cyclized in a suitable solvent under basic conditions to afford Compound 7 having the formula g) the Compound 7 is subsequently mixed in a suitable base, stirred and concentrated to afford Compound 8 having the formula and h) the Compound 8 is subsequently deprotected to afford Compound I. 2. The process according to claim 1 , wherein step b) further comprises a base selected from imidazole, DBU, diisopropylethylamine, triazole, tetrazole, metal alkoxide bases, lithium diisopropylamide, sodium bis(trimethysiliyl)amide or other amide bases. 3. The process according to claim 2 , wherein the base is imidazole. 4. The process according to claim 1 , wherein step c) further comprises a solvent selected from THF, MeCN or DMF. 5. The process according to claim 4 , wherein the solvent is THF. 6. The process according to claim 1 , wherein step c) further comprises a base selected from lithium diisopropylamide, sodium bis(trimethysiliyl)amide, other amide bases, potassium t-butoxide, DBU or other alkoxide bases. 7. The process according to claim 6 , wherein the base in step c) is sodium tert-pentoxide or sodium t-amylate. 8. The process according to claim 1 , wherein the solvent in step d) is THF, 2-MeTHF, MeCN or DMF. 9. The process according to claim 8 , wherein the solvent in step d) is 2-MeTHF. 10. The process according to claim 1 , wherein the base in step d) is imidazole, DBU, triazole, tetrazole, diisopropylethylamine or other t-butoxides. 11. The process according to claim 10 , wherein the base in step d) is imidazole. 12. The process according to claim 1 , wherein the solvent in step f) is THF, MeCN, NMP or DMF or mixtures thereof. 13. The process according to claim 12 , wherein the solvent in step f) is a mixture of THF and NMP. 14. The process according to claim 1 , wherein the base in step f) is lithium diisopropylamide, potassium bis(trimethylsilyl)amide, other amide bases, potassium t-butoxide, DBU, other alkoxide bases, NaHMDS or other alkylsilylamines. 15. The process according to claim 14 , wherein the base in step f) is lithium t-butoxide. 16. The process according to claim 1 , wherein the base in step g) is methylamine, ammonium or other alkylamine bases. 17. The process according to claim 16 , wherein the base in step g) is methylamine.
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