Ruthenium compound, thin-film forming raw material, and method of producing thin film

Patent metadata

Field	Value
Publication number	US-12264168-B2
Application number	US-202017620934-A
Country	US
Kind code	B2
Filing date	Jun 10, 2020
Priority date	Jun 21, 2019
Publication date	Apr 1, 2025
Grant date	Apr 1, 2025

Abstract

The present invention provides a ruthenium compound represented by the following general formula (1) or (2), a thin-film forming raw material containing the ruthenium compound, and a method of producing a thin-film including using the thin-film forming raw material:

where R 1 to R 12 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing group, and “n” represents an integer from 0 to 2, provided that at least one of R 1 to R 12 represents the fluorine atom-containing group;

where R 13 to R 17 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and a total number of the carbon atoms of R 13 to R 17 is 3 or more.

First claim

The invention claimed is:

1. A ruthenium compound represented by the following general formula (2):

where R 13 and R 15 represent hydrogen atoms, and R 14 , R 16 and R 17 represent methyl groups.

2. A thin-film forming raw material, comprising the ruthenium compound of claim 1 .

3. A method of producing a thin-film containing ruthenium atoms on a surface of a substrate, comprising the steps of:
vaporizing the thin-film forming raw material of claim 2 ;
introducing vapor containing a ruthenium compound obtained in the vaporization step into a film formation chamber in which the substrate is set; and
subjecting the ruthenium compound to decomposition and/or a chemical reaction, to thereby form the thin-film containing ruthenium atoms on the surface of the substrate.

Assignees

• Adeka Corp

Inventors

• Enzu Masaki
• Hatase Masako
• Takeda Keisuke

Classifications

• C23C16/18

  from metallo-organic compounds · CPC title

• C07F17/00

  Metallocenes · CPC title

• C23C16/45553

  characterized by the use of precursors specially adapted for ALD · CPC title

• Y02E60/50

  Fuel cells · CPC title

• C07F15/0046 Primary

  Ruthenium compounds · CPC title