Structured nanoporous materials, manufacture of structured nanoporous materials and applications of structured nanoporous materials

Patent metadata

Field	Value
Publication number	US-12259650-B2
Application number	US-201916979367-A
Country	US
Kind code	B2
Filing date	Mar 13, 2019
Priority date	Mar 13, 2018
Publication date	Mar 25, 2025
Grant date	Mar 25, 2025

Abstract

A method is disclosed for manufacturing a structured polymeric material. In the method, a body is provided comprising a substantially homogenous precursor polymeric material. An interference pattern of electromagnetic radiation is set up within the body to form a partially cross-linked polymeric material, the interference pattern comprising maxima and minima of intensity of the electromagnetic radiation, the interference pattern thereby causing spatially differential cross linking of the precursor polymeric material to form crosslinked regions having relatively high cross linking density and non-crosslinked regions having relatively low cross linking density, the crosslinked regions and non-crosslinked regions corresponding to the maxima and minima of intensity of the electromagnetic radiation, respectively. The partially cross-linked polymeric material is then contacted with a solvent to cause expansion and crazing of at least some of the non-crosslinked regions to form a structured polymeric material containing pores.

First claim

The invention claimed is:

1. A method for manufacturing a structured polymeric material by craze lithography, the method comprising:
providing a body comprising a precursor polymeric material;
setting up an interference pattern of electromagnetic radiation within the body comprising precursor polymeric material to form a partially cross-linked polymeric material, the interference pattern comprising maxima and minima of intensity of the electromagnetic radiation, the interference pattern thereby causing spatially differential cross linking of the precursor polymeric material to form crosslinked regions having relatively high cross linking density and non-crosslinked regions having relatively low cross linking density, the crosslinked regions and non-crosslinked regions corresponding to the maxima and minima of intensity of the electromagnetic radiation, respectively,
contacting the partially cross-linked polymeric material with a solvent to cause expansion and crazing of at least some of the non-crosslinked regions to form a structured polymeric material containing pores,
wherein the solvent used to cause expansion and crazing falls outside a Hansen solubility sphere for the precursor polymeric material when plotted in Hansen space but lies close enough to the Hansen solubility sphere for the precursor polymeric material to expand and craze the precursor polymeric material, and
wherein the precursor polymeric material is substantially homogeneous.

2. The method according to claim 1 wherein the precursor polymeric material consists of a single phase.

3. The method according to claim 1 wherein the precursor polymeric material comprises one or more homopolymer, one or more copolymer and/or one or more block copolymer.

4. The method according to claim 1 wherein the precursor polymeric material comprises a photo-initiator, operable to cause cross linking of the precursor polymeric material on exposure to visible light.

5. The method according to claim 1 wherein the precursor polymeric material is formed as a layer on a substrate, a surface of the substrate providing a reflection interface for setting up the interference pattern.

6. The method according to claim 1 wherein a first region of the precursor polymeric material is selectively exposed to the electromagnetic radiation and a second region of the precursor polymeric material is not exposed to the electromagnetic radiation so that the expansion and crazing takes place only in the first region at which there is formed the structured polymeric material containing pores.

7. The method according to claim 6 wherein the second region is shielded from the electromagnetic radiation by a mask.

8. The method according to claim 6 wherein the first region is selectively exposed to the electromagnetic radiation by a laser.

9. The method according to claim 1 wherein a first region of the precursor polymeric material is selectively exposed to electromagnetic radiation to form a first interference pattern having a characteristic first periodicity to form a stratified porous structure having a corresponding first periodicity, and a second region of the precursor polymeric material is selectively exposed to electromagnetic radiation to form a second interference pattern having a characteristic second periodicity, different to the first periodicity.

10. A method for manufacturing a structured polymeric material by craze lithography, the method comprising:
providing a body comprising a precursor polymeric material;
selectively exposing a first region of the precursor polymeric material to electromagnetic radiation to form a first interference pattern having a characteristic first periodicity;
selectively exposing a second region of the precursor polymeric material to electromagnetic radiation to form a second interference pattern having a characteristic second periodicity, different to the first periodicity,
wherein the first and second interference patterns interact with the precursor polymeric material to form a partially cross-linked polymeric material, each interference pattern comprising maxima and minima of intensity of the electromagnetic radiation, the interference patterns thereby causing spatially differential cross linking of the precursor polymeric material to form crosslinked regions having relatively high cross linking density and non-crosslinked regions having relatively low cross linking density, the crosslinked regions and non-crosslinked regions corresponding to the maxima and minima of intensity of the electromagnetic radiation, respectively,
the method further comprising:
contacting the partially cross-linked polymeric material with a solvent to cause expansion and crazing of at least some of the non-crosslinked regions to form a stratified porous structure in the first region having a corresponding first stratified porous structure periodicity, and a stratified porous structure in the second region having a corresponding second stratified porous structure periodicity, different to the first stratified porous structure periodicity,
wherein the solvent used to cause expansion and crazing falls outside a Hansen solubility sphere for the precursor polymeric material when plotted in Hansen space but lies close enough to the Hansen solubility sphere for the precursor polymeric material to expand and craze the precursor polymeric material.

11. The method according to claim 10 wherein the first and second interference patterns are formed by electromagnetic radiation at different angles of incidence, or different wavelengths, or both.

Assignees

• Univ Kyoto

Inventors

• Sivaniah Easan
• Ito Masateru
• Yamamoto Daisuke

Classifications

• G03F7/2053

  using a laser (ablative removal B41C) · CPC title

• G02B2207/101

  Nanooptics · CPC title

• G02B1/005

  made of photonic crystals or photonic band gap materials (photonic band-gap structures or photonic lattices in integrated optics G02B6/1225; photonic band-gap structures or photonic lattices in optical fibres G02B6/02295) · CPC title

• C08J2325/06

  Polystyrene · CPC title

• C08J7/02

  with solvents, e.g. swelling agents · CPC title