Trifluoroacetyl iodide compositions useful for making trifluoroiodomethane

Patent metadata

Field	Value
Publication number	US-12258357-B2
Application number	US-202318400050-A
Country	US
Kind code	B2
Filing date	Dec 29, 2023
Priority date	Oct 14, 2020
Publication date	Mar 25, 2025
Grant date	Mar 25, 2025

Abstract

The present disclosure provides a composition including trifluoroacetyl iodide, at least one organic impurity and at least one inorganic impurity. The at least one organic impurity includes at least one of: difluoroiodomethane, pentafluoroiodoethane, iodomethane, iodopropane, dichlorotetrafluoroethane, dichlorotrifluoroethane, trichlorotrifluoroethane, methyltrifluoroacetate, trifluoroacetic anhydride, difluorobutane and methyl propane. The at least one inorganic impurity includes at least one of: hydrogen iodide, hydrogen chloride, iodine and hydrogen triiodide.

First claim

What is claimed is:

1. A composition comprising:
trifluoroacetyl iodide;
at least one organic impurity comprising at least one of: iodopropane, dichlorotetrafluoroethane, dichlorotrifluoroethane, trichlorotrifluoroethane, methyltrifluoroacetate, difluorobutane and methyl propane; and
at least one inorganic impurity comprising at least one of: hydrogen iodide, hydrogen chloride, iodine and hydrogen triiodide.

2. The composition of claim 1 , wherein the at least one organic impurity is present, in GC area % of total organic compounds, in an amount from about 0.05 GC area % to about 1.0 GC area %.

3. The composition of claim 1 , wherein the at least one organic impurity is present, in GC area % of total organic compounds, in an amount from about 0.05 GC area % to about 0.5 GC area %.

4. The composition of claim 1 , wherein the at least one organic impurity comprises methyl propane present, in GC area % of total organic compounds, in an amount from about 0.0001 GC area % to about 0.2 GC area %.

5. The composition of claim 1 , wherein the at least one organic impurity comprises methyl propane present, in GC area % of total organic compounds, in an amount from about 0.0001 GC area % to about 0.1 GC area %.

6. The composition of claim 1 , wherein the at least one organic impurity comprises methyl propane present, in GC area % of total organic compounds, in an amount from about 0.0001 GC area % to about 0.05 GC area %.

7. The composition of claim 1 , wherein the at least one organic impurity comprises at least one of: dichlorotetrafluoroethane, dichlorotrifluoroethane, trichlorotrifluoroethane, iodopropane, difluorobutane and methyl propane present, in GC area % of total organic compounds, in total in an amount from about 0.0001 GC area % to about 0.5 GC area %.

8. The composition of claim 1 , further comprising at least one additional organic impurity comprising at least one of: trifluoroacetic acid, trifluoroacetyl fluoride, trifluoroacetyl chloride, trifluoroiodomethane and chlorotrifluoroethane.

9. The composition of claim 8 , wherein the at least one additional organic impurity comprises trifluoroacetic acid present, in GC area % of total organic compounds, in amount from about 0.001 GC area % to about 0.1 GC area %.

10. The composition of claim 8 , wherein the at least one additional organic impurity comprises trifluoroacetyl fluoride present, in GC area % of total organic compounds, in amount from about 0.0001 GC area % to about 0.05 GC area %.

11. The composition of claim 8 , wherein the at least one additional organic impurity comprises trifluoroacetyl chloride present, in GC area % of total organic compounds, in amount from about 0.001 GC area % to about 0.1 GC area %.

12. The composition of claim 8 , wherein the at least one additional organic impurity comprises trifluoroiodomethane present, in GC area % of total organic compounds, in amount from about 0.0001 GC area % to about 0.1 GC area %.

13. The composition of claim 8 , wherein the at least one additional organic impurity comprises chlorotrifluoroethane present, in GC area % of total organic compounds, in amount from about 0.0001 GC area % to about 0.05 GC area %.

14. The composition of claim 1 , wherein the at least one inorganic impurity is present in total in an amount from about 0.01 wt. % to about 0.5 wt. % of the composition.

15. The composition of claim 1 , wherein the at least one inorganic impurity is present in total in an amount from about 0.01 wt. % to about 0.2 wt. % of the composition.

16. The composition of claim 1 , wherein the at least one inorganic impurity comprises iodine in amount from about 0.001 wt. % to about 0.05 wt. % of the composition.

17. The composition of claim 1 , wherein the at least one inorganic impurity comprises hydrogen iodide in amount from about 0.0001 wt. % to about 0.01 wt. % of the composition.

18. The composition of claim 1 , wherein the at least one inorganic impurity comprises hydrogen triiodide in amount from about 0.0001 wt. % to about 0.01 wt. % of the composition.

19. The composition of claim 1 , wherein the at least one organic impurity is present, in GC area % of total organic compounds, in an amount from about 0.05 GC area % to about 1.0 GC area %, and the at least one inorganic impurity is present in an amount from about 0.01 wt. % to about 0.5 wt. % of the composition.

20. The composition of claim 1 , wherein the at least one organic impurity comprises methyl propane, and the at least one inorganic impurity comprises iodine.

21. The composition of claim 1 , wherein the at least one organic impurity comprises methyl propane, and the at least one inorganic impurity comprises hydrogen triiodide.

22. The composition of claim 1 , wherein the at least one organic impurity comprises at least one of dichlorotetrafluoroethane, dichlorotrifluoroethane and difluorobutane, and the at least one inorganic impurity comprises iodine.

23. The composition of claim 1 , wherein the at least one organic impurity comprises at least one of dichlorotetrafluoroethane, dichlorotrifluoroethane and difluorobutane, and the at least one inorganic impurity comprises hydrogen triiodide.

24. The composition of claim 8 , wherein the at least one organic impurity comprises trifluoroacetyl chloride, and the at least one inorganic impurity comprises iodine.

25. The composition of claim 8 , wherein the at least one organic impurity comprises trifluoroacetyl chloride, and the at least one inorganic impurity comprises hydrogen triiodide.

26. The composition of claim 8 , wherein the at least one organic impurity comprises trifluoroacetic acid, and the at least one inorganic impurity comprises iodine.

27. The composition of claim 8 , wherein the at least one organic impurity comprises trifluoroacetic acid, and the at least one inorganic impurity comprises hydrogen triiodide.

Assignees

• Honeywell Int Inc

Inventors

• Wang Haiyou
• Nair Haridasan K
• Merkel Daniel C
• Bektesevic Selma
• Yang Terris

Classifications

• C07C19/16

  and iodine · CPC title

• C07C69/62

  Halogen-containing esters (haloformic acid esters C07C69/96) · CPC title

• C07F13/00 Primary

  Compounds containing elements of Groups 7 or 17 of the Periodic Table · CPC title

• C07C17/363 Primary

  by elimination of carboxyl groups · CPC title