Method for preparing package of sputtering target, and method for transporting same

Patent metadata

Field	Value
Publication number	US-12258164-B2
Application number	US-201916981396-A
Country	US
Kind code	B2
Filing date	Sep 20, 2019
Priority date	Mar 29, 2019
Publication date	Mar 25, 2025
Grant date	Mar 25, 2025

Abstract

A method for preparing a package that can effectively suppress surface alteration even in a sputtering target whose surface is likely to be altered by moisture such as a sputtering target comprising an oxide of boron is provided. A method for preparing a package of sputtering target, including a step 1 of housing a sputtering target in a first packaging bag made of a film having a water vapor permeability of 1 g/(m 2 ·24 h) or less, and then vacuum sealing an opening of the first packaging bag; and a step 2 of housing the first packaging bag which has been vacuum sealed in the step 1, in a second packaging bag made of a film having a water vapor permeability of 1 g/(m 2 ·24 h) or less, and then enclosing one or more cushion gases selected from a group consisting of air and inert gas in the second packaging bag, and sealing an opening of the second packaging bag.

First claim

The invention claimed is:

1. A method for preparing a package of sputtering target, comprising:
a step 1 of housing a sputtering target comprising an oxide of boron in a first packaging bag made of a film having a water vapor permeability of 1 g/(m 2 ·24 h) or less, provided that nothing or only a desiccant is housed in the first packaging bag together with the sputtering target, and then vacuum sealing an opening of the first packaging bag,
wherein the sputtering target includes a disk-shaped backing plate and a sputtering target member bonded to a main surface of the backing plate; or
wherein the sputtering target includes a sputtering target member without a further backing substrate such that when the sputtering target is housed within the first packaging bag, top and bottom surfaces of the sputtering target member are exposed within the first packaging bag; and
a step 2 of housing the first packaging bag which has been vacuum sealed in the step 1, in a second packaging bag made of a film having a water vapor permeability of 1 g/(m 2 ·24 h) or less, and then enclosing one or more cushion gases selected from a group consisting of air and inert gas in the second packaging bag, and sealing an opening of the second packaging bag.

2. The method for preparing a package of sputtering target according to claim 1 , wherein a gas pressure at 20° C. in the vacuum sealed first packaging bag is 250 Pa (abs) or less.

3. The method for preparing a package of sputtering target according to claim 1 , wherein a gas pressure at 20° C. in the second packaging bag after the cushion gas is enclosed is 10 kPa (abs) or more and 1150 KPa (abs) or less.

4. The method for preparing a package of sputtering target according to claim 1 , wherein a gas pressure at 20° C. in the second packaging bag after the cushion gas is enclosed is 10 kPa (abs) or more and 120 KPa (abs) or less.

5. The method for preparing a package of sputtering target according to claim 1 , wherein an atmospheric pressure dew point of the cushion gas is −76° C. or higher and 15° C. or lower.

6. The method for preparing a package of sputtering target according to claim 1 , wherein in the step 1, the desiccant is housed in the first packaging bag together with the sputtering target.

7. The method for preparing a package of sputtering target according to claim 6 , wherein the desiccant comprises a silica gel.

8. The method for preparing a package of sputtering target according to claim 6 , wherein 1 g or more and 6 g or less of the desiccant is housed per 100 cm 2 of a surface area of the sputtering target.

9. The method for preparing a package of sputtering target according to claim 6 , wherein the desiccant is housed in one or more packing bags having a water vapor permeable surface.

10. The method for preparing a package of sputtering target according to claim 9 , wherein a total area of the water vapor permeable surface of the one or more packing bags is 1000 mm 2 or more per 100 cm 2 of the surface area of the sputtering target.

11. The method for preparing a package of sputtering target according to claim 9 , wherein the one or more packing bags are dustproof.

12. The method for preparing a package of sputtering target according to claim 1 , wherein before carrying out the step 1, a cleaning process comprising either or both of cleaning the sputtering target with an organic solvent and dry cleaning the sputtering target is performed.

13. The method for preparing a package of sputtering target according to claim 12 , comprising ultrasonically cleaning the sputtering target in the organic solvent before carrying out the step 1.

14. The method for preparing a package of sputtering target according to claim 12 , comprising performing one or more dry cleanings selected from a group consisting of plasma treatment, laser treatment, and ashing treatment for the sputtering target.

15. The method for preparing a package of sputtering target according to claim 1 , wherein the first packaging bag is not secured to the second packaging bag.

16. The method for preparing a package of sputtering target according to claim 1 , wherein the first packaging bag is made of the film having the water vapor permeability of 0.5 g/(m 2 ·24 h) or less.

17. A method for transporting a package of sputtering target, comprising packaging the sputtering target by the method for preparing a package of sputtering target according to claim 1 , and transporting the sputtering target.

18. The method for transporting a package of sputtering target according to claim 17 , wherein the transporting involves air transportation.

Assignees

• Jx Nippon Mining & Metals Corp
• Jx Advanced Metals Corp

Inventors

• Ogino Shin-Ichi

Classifications

• B65B51/146

  Closing bags · CPC title

• B65D77/04

  Articles or materials enclosed in two or more containers disposed one within another · CPC title

• C23C14/3407

  Cathode assembly for sputtering apparatus, e.g. Target · CPC title

• B65B55/19

  by adding materials intended to remove free oxygen or to develop inhibitor gases, e.g. vapour phase inhibitors · CPC title

• B65B31/048

  specially adapted for wrappers or bags · CPC title