Plasma confinement system

US12245351B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12245351-B2
Application numberUS-202318150255-A
CountryUS
Kind codeB2
Filing dateJan 5, 2023
Priority dateFeb 23, 2017
Publication dateMar 4, 2025
Grant dateMar 4, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma having a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.

First claim

Opening claim text (preview).

The invention claimed is: 1. A plasma confinement system, comprising: an inner electrode; an outer electrode that substantially surrounds the inner electrode; an intermediate electrode that faces the inner electrode; one or more first valves configured to direct first gas from within the inner electrode to an acceleration region between the inner electrode and the outer electrode; two or more second valves configured to direct second gas from outside the outer electrode to the acceleration region; a first power supply configured to apply a first voltage between the inner electrode and the outer electrode; and a second power supply configured to apply a second voltage between the inner electrode and the intermediate electrode, wherein the outer electrode surrounds an assembly region between a first end of the inner electrode and the intermediate electrode, and wherein the plasma confinement system is configured to sustain a Z-pinch plasma within the assembly region. 2. The plasma confinement system of claim 1 , wherein the intermediate electrode is substantially disc-shaped. 3. The plasma confinement system of claim 1 , wherein the one or more first valves are positioned within the inner electrode. 4. The plasma confinement system of claim 1 , wherein the two or more second valves are arranged outside of the outer electrode. 5. The plasma confinement system of claim 1 , further comprising: an insulator between the outer electrode and the inner electrode. 6. The plasma confinement system of claim 1 , wherein the one or more first valves are positioned axially between a first end of the inner electrode and a second end of the inner electrode. 7. The plasma confinement system of claim 6 , wherein the first end of the inner electrode is opposite to the second end of the inner electrode. 8. The plasma confinement system of claim 1 , wherein: the first end of the inner electrode is opposite to a second end of the inner electrode; and the first end of the inner electrode is between a first end of the outer electrode and a second end of the outer electrode. 9. The plasma confinement system of claim 8 , wherein the first end of the outer electrode is opposite to the second end of the outer electrode. 10. The plasma confinement system of claim 8 , wherein the intermediate electrode is substantially disc-shaped. 11. The plasma confinement system of claim 1 , wherein the assembly region is a cylindrical volume surrounded by the outer electrode. 12. The plasma confinement system of claim 1 , further comprising: an insulator between an end of the outer electrode and the intermediate electrode. 13. The plasma confinement system of claim 1 , wherein the acceleration region has a substantially annular cross section surrounded by the outer electrode. 14. The plasma confinement system of claim 13 , wherein the substantially annular cross section is defined by shapes of the inner electrode and the outer electrode. 15. The plasma confinement system of claim 1 , wherein the inner electrode and the outer electrode are concentric and have radial symmetry with respect to a same axis. 16. The plasma confinement system of claim 1 , wherein the outer electrode forms a cavity and the inner electrode is positioned within the cavity. 17. The plasma confinement system of claim 1 , wherein each of the inner electrode and the outer electrode comprises a substantially cylindrical body. 18. The plasma confinement system of claim 1 , wherein the first gas and the second gas are of a same composition.

Assignees

Inventors

Classifications

  • Nuclear fusion reactors · CPC title

  • using magnetic fields substantially generated by the discharge in the plasma · CPC title

  • G21B1/05Primary

    with magnetic or electric plasma confinement · CPC title

  • Molecular or atomic-beam generation, e.g. resonant beam generation · CPC title

  • H05H1/06Primary

    Longitudinal pinch devices · CPC title

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Frequently asked questions

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What does patent US12245351B2 cover?
An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inne…
Who is the assignee on this patent?
Univ Washington
What technology area does this patent fall under?
Primary CPC classification G21B1/05. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 04 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).