Method and apparatus for reducing the work function of polycrystalline metal hexaboride

Patent metadata

Field	Value
Publication number	US-12237137-B2
Application number	US-202117221170-A
Country	US
Kind code	B2
Filing date	Apr 2, 2021
Priority date	Apr 2, 2021
Publication date	Feb 25, 2025
Grant date	Feb 25, 2025

Abstract

Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB 6 , M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm 2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.

First claim

We claim:

1. A method for treating a polycrystalline material, the method comprising:
exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein:
the surface comprises a plurality of crystallites each having a composition MB 6 , M being a metal element;
the plasma comprises ions, the ions being characterized by an average ion flux selected from a range of 1.5 to 100 A/cm 2 and an average ion energy that is less than a sputtering threshold energy of the plurality of MB 6 crystallites in a presence of said plasma;
the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and
the second average work function is less than the first average work function.

2. The method of claim 1 , wherein M is La, Ce, Sr, Ba, Y, Gd, Sm, Th, Ca, Ti, Zr, Ni, Ta, Cr, Mn, Fe, Sc, Hf, V, Nb, Mo, W, Tc, Re, Ru, Os, Co, Rh, Ir, Pd, Pt, Li, Na, K, Be, Mg, Al, Si, B, or any combination of these.

3. The method of claim 1 , wherein the plasma comprises ions characterized by an average ion energy selected from a range of 10 eV to 100% of the sputtering threshold energy of the plurality of MB 6 crystallites of the surface in the presence of said plasma characterized by said average ion energy and said average ion flux.

4. The method of claim 1 , wherein the plasma comprises ions characterized by an average ion energy selected from a range of 25 to 35 eV and an average ion flux selected from a range of 1.5 to 100 A/cm 2 .

5. The method of claim 1 , wherein said ions of the plasma are characterized by said average ion flux within 1 μm of said surface of the polycrystalline material and/or wherein said ions of the plasma are characterized by said average ion energy within 1 μm of said surface of the polycrystalline material.

6. The method of claim 1 , wherein the ions of the plasma are ionization products of one or more gases, the one or more gases comprising CH 2 , BCl 3 , Cl 2 , CF 4 , CHF 3 , HBr, O 2 , NCl 3 , SiF 4 , NF 3 , HCl, H 2 , C 2 F 6 , C 3 F 8 , SiCl 4 , SiCl, SF 6 , N 2 , He, Ne, Ar, Kr, Xe, or any combination of these.

7. The method of claim 1 , wherein at least 95% of the ions are N ions, He ions, Ne ions, Ar ions, Kr ions, and/or Xe ions.

8. The method of claim 1 , wherein the surface is characterized by a temperature selected from a range of −273° C. to 2000° C. during the step of exposing and/or wherein the step of exposing is performed for a time selected from a range of 1 ns to 100 hours.

9. The method of claim 1 , wherein the step of changing comprises etching the surface due to exposure of the surface to the plasma.

10. The method of claim 1 , wherein the starting condition of the surface is further characterized by a first degree of crystalline texture and the treated condition of the surface is further characterized by a second degree of crystalline texture; and wherein the second degree of crystalline texture is greater than the first degree of crystalline texture.

11. The method of claim 1 , wherein the starting condition of the surface is characterized by a lack of crystalline texture and wherein the treated condition of the surface is characterized by having crystalline texture.

12. The method of claim 1 , wherein the surface having the treated condition is characterized by a preferred crystalline orientation being ( 100 ).

13. The method of claim 1 , wherein the second average work function is less than the first average work function by a value greater than 0 eV and less than or equal to 0.6 eV.

14. The method of claim 1 , wherein the second average work function is selected from a range of 2.07 eV to 2.6 eV.

15. The method of claim 1 , wherein the treated condition of the surface persists for at least 24 hours after the step of exposing is terminated.

16. The method of claim 1 , wherein at least 95% of crystallites of the surface have the composition MB 6 .

17. The method of claim 1 , wherein the polycrystalline material is a part of an electrode of a device.

18. The method of claim 1 , wherein the surface has a cylindrical or other three-dimensional contour.

19. The method of claim 1 , wherein the ions are characterized by an average ion flux selected from a range of 1.5 to 4.5 A/cm 2 .

20. The method of claim 1 , wherein said ions of the plasma are characterized by said average ion flux within 1 nm of said surface of the polycrystalline material and/or wherein said ions of the plasma are characterized by said average ion energy within 1 nm of said surface of the polycrystalline material.

21. The method of claim 1 , wherein M is one or more metal elements comprising La.

22. The method of claim 1 , wherein M is La, Ce, or a combination thereof.

23. The method of claim 1 , wherein M is La.

Assignees

• California Inst Of Techn

Inventors

• Guerrero Vela Pedro P
• Polk James E

Classifications

• C04B41/0054

  Plasma-treatment, e.g. with gas-discharge plasma · CPC title

• C04B41/91

  involving the removal of part of the materials of the treated articles, e.g. etching · CPC title

• C04B41/009

  characterised by the material treated · CPC title

• C04B2235/3804

  Borides · CPC title

• H01J9/042

  Manufacture, activation of the emissive part · CPC title