Equipment front end module

Patent metadata

Field	Value
Publication number	US-12201995-B2
Application number	US-202217730980-A
Country	US
Kind code	B2
Filing date	Apr 27, 2022
Priority date	Apr 28, 2021
Publication date	Jan 21, 2025
Grant date	Jan 21, 2025

Abstract

An EFEM includes a circulation path including a transfer chamber configured to form a transfer space where a substrate is transferred and a return path configured to return a gas flowing from one side to the other side of the transfer chamber, the EFEM including: a capture part provided in the return path and configured to electrically capture particles contained in the gas flowing through the return path, wherein the return path and the transfer chamber are provided such that a partition wall is interposed therebetween, and a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the return path becomes higher than a pressure on the side of the transfer chamber in a state in which the gas circulates through the circulation path.

First claim

What is claimed is:

1. An EFEM including a circulation path including a transfer chamber configured to form a transfer space where a substrate is transferred and a return path configured to return a gas flowing from one side to the other side of the transfer chamber, the EFEM comprising:
a capture part provided in the return path and configured to electrically capture particles contained in the gas flowing through the return path,
wherein the return path and the transfer chamber are provided such that a partition wall is interposed therebetween, and a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the return path becomes higher than a pressure on the side of the transfer chamber in a state in which the gas circulates through the circulation path.

2. The EFEM of claim 1 , wherein the capture part is configured to capture the particles contained in the gas by causing the particles to adhere to a charging surface by an electrostatic force.

3. The EFEM of claim 1 , further comprising
a housing including a plurality of panels and a column configured to support the plurality of panels,
wherein the column includes a hollow portion,
wherein the return path is provided in the hollow portion, and
wherein the capture part is provided on an inner wall surface of the column.

4. The EFEM of claim 2 , further comprising
a housing including a plurality of panels and a column configured to support the plurality of panels,
wherein the column includes a hollow portion,
wherein the return path is provided in the hollow portion, and
wherein the capture part is provided on an inner wall surface of the column.

5. The EFEM of claim 3 , wherein the column includes:
an opening through which the capture part is accessible; and
a cover portion configured to be capable of closing and opening the opening.

6. The EFEM of claim 4 , wherein the column includes:
an opening through which the capture part is accessible; and
a cover portion configured to be capable of closing and opening the opening.

7. The EFEM of claim 1 , wherein the circulation path includes an individual return path configured to return gas flowing inside a predetermined device arranged in the transfer chamber,
wherein the individual return path and the transfer chamber are provided such that a partition wall is interposed therebetween such that when the gas circulates through the circulation path, a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the individual return path is kept higher than the pressure on the side of the transfer chamber, and
wherein the capture part is provided in each of the return path and the individual return path.

8. The EFEM of claim 2 , wherein the circulation path includes an individual return path configured to return gas flowing inside a predetermined device arranged in the transfer chamber,
wherein the individual return path and the transfer chamber are provided such that a partition wall is interposed therebetween such that when the gas circulates through the circulation path, a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the individual return path is kept higher than the pressure on the side of the transfer chamber, and
wherein the capture part is provided in each of the return path and the individual return path.

9. The EFEM of claim 3 , wherein the circulation path includes an individual return path configured to return gas flowing inside a predetermined device arranged in the transfer chamber,
wherein the individual return path and the transfer chamber are provided such that a partition wall is interposed therebetween such that when the gas circulates through the circulation path, a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the individual return path is kept higher than the pressure on the side of the transfer chamber, and
wherein the capture part is provided in each of the return path and the individual return path.

10. The EFEM of claim 4 , wherein the circulation path includes an individual return path configured to return gas flowing inside a predetermined device arranged in the transfer chamber,
wherein the individual return path and the transfer chamber are provided such that a partition wall is interposed therebetween such that when the gas circulates through the circulation path, a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the individual return path is kept higher than the pressure on the side of the transfer chamber, and
wherein the capture part is provided in each of the return path and the individual return path.

11. The EFEM of claim 5 , wherein the circulation path includes an individual return path configured to return gas flowing inside a predetermined device arranged in the transfer chamber,
wherein the individual return path and the transfer chamber are provided such that a partition wall is interposed therebetween such that when the gas circulates through the circulation path, a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the individual return path is kept higher than the pressure on the side of the transfer chamber, and
wherein the capture part is provided in each of the return path and the individual return path.

12. The EFEM of claim 6 , wherein the circulation path includes an individual return path configured to return gas flowing inside a predetermined device arranged in the transfer chamber,
wherein the individual return path and the transfer chamber are provided such that a partition wall is interposed therebetween such that when the gas circulates through the circulation path, a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the individual return path is kept higher than the pressure on the side of the transfer chamber, and
wherein the capture part is provided in each of the return path and the individual return path.

13. The EFEM of claim 1 , wherein a connecting pipe configured to guide gas flowing inside a predetermined device arranged in the transfer chamber is connected to an intermediate portion of the return path at an upstream side of the capture part.

14. The EFEM of claim 2 , wherein a connecting pipe configured to guide gas flowing inside a predetermined device arranged in the transfer chamber is connected to an intermediate portion of the return path at an upstream side of the capture part.

15. The EFEM of claim 3 , wherein a connecting pipe configured to guide gas flowing inside a predetermined device arranged in the transfer chamber is connected to an intermediate portion of the return path at an upstream side of the capture part.

16. The EFEM of claim 4 , wherein a connecting pipe configured to guide gas flowing inside a predetermined device arranged in the transfer chamber is connected to an intermediate portion of the return path at an upstream side of the capture part.

17. The EFEM of claim 5 , wherein a connecting pipe configured to guide gas flowing inside a predetermined device arranged in the transfer chamber is connected to an intermediate portion of the return path at an upstream side of the capture part.

18. The EFEM of claim 6 , wherein a connecting pipe configured to guide gas flowing inside a predetermined device arranged in the transfer chamber is connected to an inter

Assignees

• Sinfonia Technology Co Ltd

Inventors

• Kawai Toshihiro
• Ogura Gengoro

Classifications

• H10P72/00

  Handling or holding of wafers, substrates or devices during manufacture or treatment thereof · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/3408 Primary

  Docking arrangements · CPC title

• H10P72/3406

  involving removal of lid, door or cover · CPC title

• H10P72/3402

  Mechanical parts of transfer devices · CPC title