Metal oxide semiconductor gas sensor

US12196698B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12196698-B2
Application numberUS-202217984758-A
CountryUS
Kind codeB2
Filing dateNov 10, 2022
Priority dateNov 10, 2022
Publication dateJan 14, 2025
Grant dateJan 14, 2025

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A metal oxide semiconductor gas sensor includes a first electrode, a second electrode, and a sensing layer in contact with the first electrode and the second electrode. The sensing layer includes SnO 2 and WO 3 . A cross section of the sensing layer has an average porosity of 16.0% or more and 22.0% or less. SnO 2 occupies 60 vol % or more and 80 vol % or less and WO 3 occupies 20 vol % or more and 40 vol % or less in the sensing layer provided that pores are not counted as part of the sensing layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal oxide semiconductor gas sensor comprising: a first electrode; a second electrode; and a sensing layer in contact with the first electrode and the second electrode; wherein the sensing layer includes SnO 2 and WO 3 , a cross section of the sensing layer has an average porosity of 16.0% or more and 22.0% or less, and SnO 2 occupies 60 vol % or more and 80 vol % or less and WO 3 occupies 20 vol % or more and 40 vol % or less in the sensing layer provided that pores are not counted as part of the sensing layer. 2. The metal oxide semiconductor gas sensor according to claim 1 , wherein φ f −φ n ≥1.0 is satisfied, in which φ n (%) is the average porosity of a region of the sensing layer closest to the first electrode and the second electrode, and φ f (%) is the average porosity of a region of the sensing layer farthest from the first electrode and the second electrode, provided that the sensing layer is divided into three substantially equal regions in a thickness direction of the sensing layer. 3. The metal oxide semiconductor gas sensor according to claim 1 , wherein a cross section of the sensing layer has an average pore size of 70 nm or more and 150 nm or less. 4. The metal oxide semiconductor gas sensor according to claim 1 , wherein the sensing layer has a thickness of 1.0 μm or more.

Assignees

Inventors

Classifications

  • G01N27/125Primary

    Composition of the body, e.g. the composition of its sensitive layer · CPC title

  • G01N27/127Primary

    comprising nanoparticles · CPC title

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What does patent US12196698B2 cover?
A metal oxide semiconductor gas sensor includes a first electrode, a second electrode, and a sensing layer in contact with the first electrode and the second electrode. The sensing layer includes SnO 2 and WO 3 . A cross section of the sensing layer has an average porosity of 16.0% or more and 22.0% or less. SnO 2 occupies 60 vol % or more and 80 vol % or less and WO 3 occupies 20 vol % or m…
Who is the assignee on this patent?
Tdk Corp
What technology area does this patent fall under?
Primary CPC classification G01N27/125. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 14 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).