Feed gas reforming system and method of controlling the same

US12195335B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12195335-B2
Application numberUS-202117409296-A
CountryUS
Kind codeB2
Filing dateAug 23, 2021
Priority dateNov 30, 2020
Publication dateJan 14, 2025
Grant dateJan 14, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A feed gas reforming system is provided. The system includes a reformer configured to receive feed gas and supply water and to produce and discharge mixed gas including hydrogen, a pressure swing absorber (PSA) configured to receive the mixed gas and to refine and discharge hydrogen gas, a feed gas supply unit configured to control the supply amount of feed gas, a supply water supply unit configured to control the supply amount of supply water, a hydrogen gas supply unit configured to control the amount of hydrogen gas, and a control unit configured to control the flow rate of hydrogen gas, to control the feed gas supply unit based on the pressure of the discharged hydrogen gas, and to control the supply water supply unit based on the flow rate of feed gas.

First claim

Opening claim text (preview).

What is claimed is: 1. A feed gas reforming system comprising: a reformer configured to: receive feed gas and supply water; and produce and discharge mixed gas including hydrogen; a pressure swing absorber (PSA) configured to: receive the mixed gas from the reformer; and refine and discharge hydrogen gas; a feed gas supply unit configured to control a supply amount of the feed gas; a supply water supply unit configured to control a supply amount of the supply water; a hydrogen gas supply unit configured to control an amount of the hydrogen gas discharged from the PSA; and a control unit configured to: control a flow rate of the hydrogen gas discharged through the hydrogen gas supply unit; control the feed gas supply unit based on a pressure of the discharged hydrogen gas; and control the supply water supply unit based on a flow rate of the feed gas discharged through the feed gas supply unit, wherein the control unit further comprises a hydrogen gas controller configured to: control the hydrogen gas supply unit based on a flow rate or pressure of the hydrogen gas discharged from the PSA; and control the hydrogen gas supply unit according to a signal transmitted from outside, wherein the hydrogen gas controller further comprises: a first pressure sensor configured to measure the pressure of the hydrogen gas discharged from the PSA; and a first pressure indicator controller configured to control the hydrogen gas supply unit based on the measured pressure, wherein when a disturbance occurs in which a composition of the feed gas is changed, the control unit controls the hydrogen gas supply unit to discharge the hydrogen gas at a uniform pressure. 2. The feed gas reforming system according to claim 1 , wherein the control unit further comprises: a feed gas controller configured to control the feed gas supply unit based on the flow rate of the feed gas or the pressure of the hydrogen gas discharged from the PSA. 3. The feed gas reforming system according to claim 2 , wherein the feed gas controller further comprises: a second pressure indicator controller configured to: control the feed gas supply unit based on the pressure of the hydrogen gas discharged from the PSA; and control the feed gas supply unit to supply the feed gas at a flow rate corresponding to the pressure of the hydrogen gas. 4. The feed gas reforming system according to claim 3 , wherein the feed gas controller further comprises: a second flow sensor configured to measure the flow rate of the feed gas; and a second flow indicator controller configured to: control the feed gas supply unit based on the flow rate of the feed gas; and when the second flow indicator controller does not control the feed gas supply unit, control the feed gas supply unit to supply a uniform flow rate of the feed gas to the reformer. 5. The feed gas reforming system according to claim 1 , wherein the control unit further comprises: a supply water controller configured to control the supply water supply unit based on the flow rate of the feed gas. 6. The feed gas reforming system according to claim 5 , wherein the supply water controller further comprises: a third flow indicator controller configured to control the supply water supply unit to discharge the supply water in proportion to the flow rate of the feed gas. 7. The feed gas reforming system according to claim 6 , wherein the supply water controller further comprises: a third flow sensor configured to measure the flow rate of supply water, wherein the third flow indicator controller is configured to control the supply water supply unit to supply a uniform flow rate of the supply water according to the flow rate of the supply water measured by the third flow sensor. 8. The feed gas reforming system according to claim 1 , wherein the hydrogen gas controller further comprises: a first flow sensor configured to measure the flow rate of the hydrogen gas discharged from the PSA; and a first flow indicator controller configured to: control the hydrogen gas supply unit based on the measured flow rate; control the hydrogen gas supply unit according to a signal transmitted from outside; and control the hydrogen gas supply unit to discharge a uniform flow rate of the hydrogen gas. 9. The feed gas reforming system according to claim 8 , wherein when the first flow indicator controller does not control the hydrogen gas supply unit, the first pressure indicator controller controls the hydrogen gas supply unit to discharge the hydrogen gas at the uniform pressure.

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What does patent US12195335B2 cover?
A feed gas reforming system is provided. The system includes a reformer configured to receive feed gas and supply water and to produce and discharge mixed gas including hydrogen, a pressure swing absorber (PSA) configured to receive the mixed gas and to refine and discharge hydrogen gas, a feed gas supply unit configured to control the supply amount of feed gas, a supply water supply unit confi…
Who is the assignee on this patent?
Hyundai Motor Co Ltd, Kia Corp
What technology area does this patent fall under?
Primary CPC classification C01B3/34. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 14 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).