Multilayer coating for corrosion resistance

Patent metadata

Field	Value
Publication number	US-12191120-B2
Application number	US-202217691384-A
Country	US
Kind code	B2
Filing date	Mar 10, 2022
Priority date	Mar 10, 2022
Publication date	Jan 7, 2025
Grant date	Jan 7, 2025

Abstract

Exemplary methods of coating a metal-containing component are described. The methods are developed to increase corrosion resistance and improve coating adhesion to a metal substrate. The methods include forming a bonding layer on a metal substrate, where the bonding layer includes an oxide of a metal in the metal substrate. The coating methods further include depositing a stress buffer layer on the bonding layer, where the stress buffer layer is characterized by a stress buffer layer coefficient of thermal expansion (CTE) that is less than a metal substrate CTE and a bonding layer CTE. The coating methods also include depositing an environmental barrier layer on the stress buffer layer, where a ratio of the metal substrate CTE to an environmental barrier layer CTE is greater than or about 20:1, and where the environmental barrier layer includes silicon oxide. The metal-containing components may be used in fabrication equipment for electronic devices.

First claim

The invention claimed is:

1. A coating method comprising:
forming a bonding layer on a metal substrate, wherein the bonding layer comprises an oxide of a metal in the metal substrate;
depositing a stress buffer layer on the bonding layer, wherein the stress buffer layer comprises a coefficient of thermal expansion (CTE) that is less than a coefficient of thermal expansion of the metal substrate and a coefficient of thermal expansion of the bonding layer;
depositing an environmental barrier layer on the stress buffer layer, wherein a ratio of the coefficient of thermal expansion of the metal substrate to a coefficient of thermal expansion of the environmental barrier layer is greater than or about 20:1, wherein the coefficient of thermal expansion of the environmental barrier layer is less than the coefficient of thermal expansion of the stress buffer layer, and wherein the environmental barrier layer comprises silicon oxide.

2. The coating method of claim 1 , wherein the coefficient of thermal expansion of the metal substrate is greater than or about 10×10 −6 /° C.

3. The coating method of claim 1 , wherein the coefficient of thermal expansion of the environmental barrier layer CTE is less than or about 0.5×10 −6 /° C.

4. The coating method of claim 1 , wherein the metal substrate comprises stainless steel and the oxide of the metal in the bonding layer comprises chromium oxide.

5. The coating method of claim 1 , wherein the bonding layer is formed on the metal substrate by thermal oxidation of the metal in the metal substrate.

6. The coating method of claim 5 , wherein the forming of the bonding layer further comprises exposing the metal substrate to an atmosphere comprising ozone.

7. The coating method of claim 1 , wherein the stress buffer layer comprises aluminum oxide.

8. The coating method of claim 1 , wherein the stress buffer layer and the environmental barrier layer are deposited by atomic layer deposition.

9. A method of forming a multilayer coating on a metal substrate, the method comprising:
forming a bonding layer on the metal substrate, wherein the bonding layer is characterized by a thickness of less than or about 10 nm;
depositing a stress buffer layer on the bonding layer, wherein the stress buffer layer is characterized by a thickness of less than or about 50 nm;
depositing an environmental barrier layer on the stress buffer layer, wherein the environmental barrier layer is characterized by a thickness of greater than or about 50 nm,
wherein the multilayer coating increases corrosion resistance of the metal substrate to at least one halogen, a coefficient of thermal expansion of the environmental barrier layer is less than a coefficient of thermal expansion of the stress buffer layer.

10. The method of claim 9 , wherein the metal substrate comprises stainless steel and the bonding layer comprises chromium oxide.

11. The method of claim 9 , wherein the stress buffer layer comprises aluminum oxide, and wherein the stress buffer layer is characterized by a CTE that is greater than the coefficient of thermal expansion of the environmental barrier layer and less than a coefficient of thermal expansion of the metal substrate.

12. The method of claim 9 , wherein the environmental barrier layer comprises silicon dioxide and-the multilayer coating increases the corrosion resistance of the metal substrate to chlorine.

13. The method of claim 9 , wherein the environmental barrier layer comprises hafnium oxide and the multilayer coating increases the corrosion resistance of the metal substrate to halogen-containing compounds.

14. The method of claim 9 , wherein the metal substrate is incorporated into a component of a semiconductor fabrication apparatus that is exposed to the at least one halogen.

Assignees

• Applied Materials Inc

Inventors

• Tavakoli Amir H
• Kaushal Tony S
• Reimer Peter
• Jorgensen David

Classifications

• H10P72/0422

  for wet etching · CPC title

• H10P72/0421

  for drying etching · CPC title

• C04B2235/9669

  Resistance against chemicals, e.g. against molten glass or molten salts · CPC title

• C04B2235/3241

  Chromium oxides, chromates, or oxide-forming salts thereof · CPC title

• H01J2237/334

  Etching · CPC title