Phthalonitrile-based high temperature resistive inks

US12187908B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12187908-B2
Application numberUS-202117451403-A
CountryUS
Kind codeB2
Filing dateOct 19, 2021
Priority dateOct 20, 2020
Publication dateJan 7, 2025
Grant dateJan 7, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Resistive inks and method of making resistive inks that utilize a phthalonitrile resin as a curable component in the inks are disclosed. In one example, a resistive ink is provided. The resistive ink comprises a solvent, a thermally-curable phthalonitrile-based resin dissolved in the solvent, and one or more conductive fillers. In some examples, the phthalonitrile resin can comprise a B-staged material.

First claim

Opening claim text (preview).

The invention claimed is: 1. A resistive ink, comprising: a solvent; a curable phthalonitrile resin dissolved in the solvent; and one or more conductive fillers. 2. The resistive ink of claim 1 , wherein the phthalonitrile resin comprises a ketone, an ether, a urethane, a urea, an amide, an imide, an ester, a sulfone, an oxamide, a benzoxazine, a maleimide, or a combination of two or more thereof. 3. The resistive ink of claim 1 , wherein the phthalonitrile resin comprises a polyether ether ketone (PEEK) resin. 4. The resistive ink of claim 1 , wherein the solvent comprises 2-phenoxyethanol, N-methyl-2-pyrrolidone (NMP), m-cresol, benzyl alcohol, diphenyl ether, acetone, methyl ethyl ketone (MEK), methyl n-propyl ketone (MPK), methyl isobutyl ketone (MIBK), tetrahydrofuran (THF), n-butyl acetate, chloroform, methylene chloride, carbon tetrachloride, toluene, trichloroethylene, isopropanol, diethyl ether, dimethyl sulfoxide, dimethyl formamide, xylene or a combination of two or more thereof. 5. The resistive ink of claim 1 , wherein the conductive filler comprises activated carbon, graphite, short-chopped carbon fiber, nickel, silver, copper, gold, platinum, iridium, stainless steel, iron, titanium, zinc, or a combination of two or more thereof. 6. The resistive ink of claim 1 , further comprising a dispersant, a flow agent, a cure promoter, a surfactant, a flame retardant, a viscosity modifier, or a combination of two or more thereof. 7. The resistive ink of claim 1 , further comprising a metallic catalyst, an amino-functional catalyst, a phenolic-functional catalyst, or a combination of two or more thereof. 8. The resistive ink of claim 1 , further comprising an organic filler comprising polyether ether ketone (PEEK), polyether ketone ketone (PEKK), a polyetherimide, or a combination of two or more thereof. 9. A method of making a resistive ink, the method comprising: mixing a phthalonitrile resin, a conductive filler, and a solvent to dissolve the phthalonitrile resin in the solvent and to form the resistive ink. 10. The method of claim 9 , further comprising, prior to mixing the phthalonitrile resin, applying heat to initiate a polymerization of the phthalonitrile resin, and quenching polymerization of the phthalonitrile resin before completion of polymerization to form a B-staged phthalonitrile resin. 11. The method of claim 10 , wherein applying heat to initiate polymerization of the phthalonitrile resin comprises heating to a temperature of 200° C. or greater to quick set the phthalonitrile resin. 12. The method of claim 9 , further comprising grinding the phthalonitrile resin prior to mixing. 13. The method of claim 9 , wherein mixing the phthalonitrile resin and the solvent comprises mixing via one or more of a shaker table, an overhead mixer, magnetic stirring, and a centrifugal mixer. 14. The method of claim 9 , wherein mixing the conductive filler in the solvent comprises mixing for between 5 minutes to 90 minutes. 15. The method of claim 9 , further comprising adding additional solvent after mixing the conductive filler, adding additional conductive filler, and then adding additional solvent. 16. The method of claim 9 , wherein the phthalonitrile resin comprises a polyether ether ketone (PEEK) resin. 17. A method of making a high temperature resistive film and/or cured adhesive, the method comprising: applying a resistive ink comprising a phthalonitrile resin, a solvent, and one or more conductive fillers on a substrate; evaporating the solvent from the resistive ink; and curing the phthalonitrile resin on the substrate by activating a catalyst contained in the resistive ink. 18. The method of claim 17 , wherein applying the resistive ink comprises applying via a doctor blade, a screen printing process, a roll-to-roll process, or a combination thereof. 19. The method of claim 17 , wherein evaporating the solvent comprises evaporating the solvent via a hot plate, oven, a heat lamp, an infrared lamp, or a combination of two or more thereof and heating for 1 min to 3 min. 20. The method of claim 17 , wherein curing the phthalonitrile resin comprises thermally curing the phthalonitrile resin at a temperature within a range of 150° C. to 400° C.

Assignees

Inventors

Classifications

  • Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing · CPC title

  • Homopolymers or copolymers of nitriles (C09D135/06, C09D135/08 take precedence) · CPC title

  • containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds · CPC title

  • Carbon · CPC title

  • Polyamines containing oxygen in the form of ether bonds in the main chain · CPC title

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What does patent US12187908B2 cover?
Resistive inks and method of making resistive inks that utilize a phthalonitrile resin as a curable component in the inks are disclosed. In one example, a resistive ink is provided. The resistive ink comprises a solvent, a thermally-curable phthalonitrile-based resin dissolved in the solvent, and one or more conductive fillers. In some examples, the phthalonitrile resin can comprise a B-staged …
Who is the assignee on this patent?
Boeing Co
What technology area does this patent fall under?
Primary CPC classification C09D11/52. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 07 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).