High purity 2-naphthylacetonitrile and method for producing same

US12187664B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12187664-B2
Application numberUS-202318190244-A
CountryUS
Kind codeB2
Filing dateMar 27, 2023
Priority dateOct 29, 2019
Publication dateJan 7, 2025
Grant dateJan 7, 2025

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  1. Title

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  2. Abstract

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Abstract

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High purity 2-naphthylacetonitrile with fewer impurities that is useful as a starting material or intermediate for the synthesis of various pharmaceutical products, agricultural chemicals, and chemical products, and a production method thereof. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, and containing naphthalene compounds represented by the formulas (a)-(j) at a content of a predetermined area % or below. A method for producing high purity 2-naphthylacetonitrile.

First claim

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The invention claimed is: 1. A method for producing a high purity 2-naphthylacetonitrile, the method comprising reacting 2-naphthylacetic acid and a halogenating agent, mixing a first reaction starting material comprising an obtained acid halide compound of formula (5), in which X is a halogen atom, and a second reaction starting material comprising sulfamide at a temperature of from 10° C. to 100° C., and raising the temperature to from 85° C. to 120° C. to give 2-naphthylacetonitrile. 2. The method according to claim 1 , wherein the first reaction starting material is added to the second reaction starting material at a temperature of from 10° C. to 100° C., and the temperature is raised to a temperature of from 85° C. to 120° C. to give 2-naphthylacetonitrile. 3. The method according to claim 1 , wherein the first reaction starting material is added to the second reaction starting material such that an amount of the acid halide compound is not less than 0.0027 mol/min per 1 mol of the sulfamide. 4. The method according to claim 1 , wherein an amount of the sulfamide is 1 mol to 5 mol per 1 mol of the 2-naphthylacetic acid. 5. The method according to claim 2 , wherein an amount of the sulfamide is 1 mol to 5 mol per 1 mol of the 2-naphthylacetic acid. 6. The method according to claim 2 , wherein the first reaction starting material is added to the second reaction starting material such that an amount of the acid halide compound is not less than 0.0027 mol/min per 1 mol of the sulfamide. 7. The method according to claim 4 , wherein the first reaction starting material is added to the second reaction starting material such that an amount of the acid halide compound is not less than 0.0027 mol/min per 1 mol of the sulfamide. 8. A method for producing high purity 2-naphthylacetonitrile, the method comprising: subjecting 2′-acetonaphthone to a Willgerodt reaction, optionally in the presence of an additive, to obtain an amide compound; hydrolyzing the amide compound; and liberating 2-naphthylacetic acid to give 2-naphthylacetic acid; mixing a first reaction starting material comprising the liberated 2-naphthylacetic acid, a halogenating agent, and a first organic solvent, and a second reaction starting material comprising sulfamide and a second organic solvent at a temperature in a range of from 10° C. to 100° C.; and raising the temperature to a range of from 85° C. to 120° C. to give 2-naphthylacetonitrile.

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Classifications

  • of amides of sulfuric acids · CPC title

  • C07C255/33Primary

    with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by saturated carbon chains · CPC title

  • C07C253/34Primary

    Separation; Purification · CPC title

  • Preparation of carboxylic acid nitriles (of cyanogen or compounds thereof C01C3/00) · CPC title

  • Radicals derived from thio- or thiono carboxylic acids · CPC title

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What does patent US12187664B2 cover?
High purity 2-naphthylacetonitrile with fewer impurities that is useful as a starting material or intermediate for the synthesis of various pharmaceutical products, agricultural chemicals, and chemical products, and a production method thereof. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, and containing naphthalene compounds re…
Who is the assignee on this patent?
Api Corp
What technology area does this patent fall under?
Primary CPC classification C07C255/33. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 07 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).