Electrostatic chuck device

Patent metadata

Field	Value
Publication number	US-12176237-B2
Application number	US-202117799956-A
Country	US
Kind code	B2
Filing date	Feb 10, 2021
Priority date	Feb 21, 2020
Publication date	Dec 24, 2024
Grant date	Dec 24, 2024

Abstract

An electrostatic chuck device is provided in which the occurrence of cracking in a ceramic layer, the cracking being caused by a difference in thermal expansion between a substrate and a sleeve due to heat generated during formation of the ceramic layer, is suppressed. The electrostatic chuck device includes a substrate, a laminated body that is laminated on the substrate and that includes at least an internal electrode, and a ceramic layer that is laminated on the upper surface of the laminated body in the thickness direction. The electrostatic chuck device is such that the substrate has a through-hole provided so as to pass through in the thickness direction, a sleeve formed from an insulating material is inserted into the through-hole, and the sleeve is joined to the through-hole via a joining means at an upper portion of the substrate in the thickness direction.

First claim

The invention claimed is:

1. An electrostatic chuck device comprising:
a substrate comprising:
a through-hole provided so as to pass through in a thickness direction of the substrate, the through-hole having a concave portion provided on an inner wall of the hole within 50% of the thickness of the substrate from a surface of the substrate,
adhesive within the concave portion of the through-hole, and having a total length amount to 5% to 30% of the thickness of the substrate, and
a sleeve, formed from an insulating material, inserted into the through-hole and joined to the through-hole via the adhesive;

a laminated body that is laminated on the substrate and that includes at least an internal electrode; and
a ceramic layer that is laminated on the upper surface of the laminated body in the thickness direction.

2. The electrostatic chuck device according to claim 1 , wherein the ceramic layer comprises a base layer and a surface layer formed on the upper surface of the base layer and having irregularities.

3. The electrostatic chuck device according to claim 2 , wherein the laminated body comprises at least an insulating organic film provided on both sides of the internal electrode in the thickness direction.

4. The electrostatic chuck device according to claim 1 , wherein the laminated body comprises at least an insulating organic film provided on both sides of the internal electrode in the thickness direction.

Assignees

• Tomoegawa Co Ltd
• Tomoegawa Corp

Inventors

• Hagihara Tomoya
• Tochihira Jun

Classifications

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• H10P72/72 Primary

  using electrostatic chucks · CPC title

• H10P72/7616 Primary

  characterised by a coating, a hardness or a material · CPC title

• H02N13/00

  Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect · CPC title

• H01L21/6833 Primary

  Electricity · mapped topic