Water-resistant nanofilm, preparation method and article thereof

Patent metadata

Field	Value
Publication number	US-12173175-B2
Application number	US-202017596949-A
Country	US
Kind code	B2
Filing date	Jun 12, 2020
Priority date	Jul 26, 2019
Publication date	Dec 24, 2024
Grant date	Dec 24, 2024

Abstract

The present disclosure provides a water-resistant nanofilm, a preparation method and an article thereof, in which fluorocarbon gas is used as a plasma source and is formed on a substrate surface of substrate by a plasma enhanced chemical vapor deposition method, so that the water-resistance performance of the substrate surface is improved.

First claim

What is claimed is:

1. A water-resistant nanofilm, wherein the water-resistant nanofilm is formed on a surface of a substrate by plasma enhanced chemical vapor deposition through using fluorocarbon gas as plasma source,
wherein the fluorocarbon gas has a structural formula selected from C x F 2x+2 and C x F 2x , and x is 1, 2 or 3,
wherein the water-resistant nanofilm is formed of one, two or three selected from a group consisting of monomer 1, monomer 2 and monomer 3 as reaction materials for vapor deposition,
wherein the monomer 1 has a structural formula (I):
Y—C m H 2m —C n F 2n+1   (I)

where m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 12, and Y represents an organic functional group and is selected from the following structure: vinyl, halogened vinyl, alkyl substituted vinyl, acrylate group, C═C—O—C(O), methacrylate group, and, hydroxyl,
and the monomer 2 has a structural formula (II)

where R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are respectively selected from hydrogen, alkyl, aryl, halogenated aryl, halogen, halogenated alkyl, alkoxy and vinyl, and k is an integer ranging from 0 to 4,
and the monomer 3 comprises one or more selected from a group consisting of glycidyl methacrylate, allyl glycidyl ether, 1,2-epoxy-4-vinyl cyclohexane, 3-(2,3-epoxy-propoxy) propyl vinyl dimethoxysilane and enbucrilate, or the monomer 3 has a structural formula (III),

where R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are respectively selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl, and halogenated aryl, and i as well as h are integers ranging from 0 to 10 but not both be 0 in the meantime, and R 13 represents bond, —CO—, —COO—, arylene, alicyclic alkylene or hydroxyl substituted aliphatic alkylene,
wherein a thickness of the water-resistant nanofilm ranges from 10 to 2000 nm.

2. The water-resistant nanofilm according to claim 1 , wherein the fluorocarbon gas is selected from a group consisting of: carbon tetrafluoride, tetrafluoroethylene and hexafluoroethane.

3. The water-resistant nanofilm according to claim 1 , wherein a static contact angle of water of the water-resistant nanofilm is selected from 110°˜115°, 115°˜120°, 120°˜125°, 125°˜130°, 130°˜135°, 135°˜140°, 140°˜145°, and 145°˜150°.

4. The water-resistant nanofilm according to claim 1 , wherein m is an integer ranging from 0 to 2, n is an integer ranging from 1 to 7.

5. The water-resistant nanofilm according to claim 1 , wherein p is 1 or 2 and q is 1.

6. The water-resistant nanofilm according to claim 1 , wherein the monomer 1 is selected from a group consisting of: 1H,1H,2H,2H-Perfluorooctylacrylate, 1H,1H,2H,2H-perfluorohexylacrylate, perfluoro-2-methyl-2-pentene, and 1H,1H,2H,2H-Perfluorooctyltriethoxysilane.

7. The water-resistant nanofilm according to claim 1 , wherein k is an integer ranging from 0 to 2.

8. The water-resistant nanofilm according to claim 1 , wherein the monomer 2 is selected from a group consisting of: vinyl triethoxysilane and vinyl trimethoxysilane.

9. The water-resistant nanofilm according to claim 1 , wherein the substrate is one selected from a group consisting of: electronic products, silk fabric, woven bag, metal products, glass products and ceramic products.

10. An article comprising a water-resistant nanofilm, wherein the article is prepared by exposing the article to plasma source which contains a structural formula C x F 2x+2 or C x F 2x , and forming the water-resistant nanofilm on at least a part of surfaces of the article from reaction materials by plasma enhanced chemical vapor deposition, wherein x is 1, 2 or 3,
wherein the water-resistant nanofilm is formed of one, two or three selected from a group consisting of monomer 1, monomer 2 and monomer 3 as reaction materials for vapor deposition,
wherein the monomer 1 has a structural formula (I):
Y—C m H 2m —C n F 2n+1   (I)

where m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 12, and Y represents an organic functional group and is selected from the following structure: vinyl, halogened vinyl, alkyl substituted vinyl, acrylate group, C—C—O—C(O), methacrylate group, and, hydroxyl,
and the monomer 2 has a structural formula (II)

where R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are respectively selected from hydrogen, alkyl, aryl, halogenated aryl, halogen, halogenated alkyl, alkoxy and vinyl, and k is an integer ranging from 0 to 4, and the monomer 3 comprises one or more selected from a group consisting of glycidyl methacrylate, allyl glycidyl ether, 1,2-epoxy-4-vinyl cyclohexane, 3-(2,3-epoxy-propoxy) propyl vinyl dimethoxysilane and enbucrilate, or the monomer 3 has a structural formula (III),

where R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are respectively selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl, and halogenated aryl, and i as well as h are integers ranging from 0 to 10 but not both be 0 in the meantime, and R 13 represents bond, —CO—, —COO—, arylene, alicyclic alkylene or hydroxyl substituted aliphatic alkylene,

wherein a thickness of the water-resistant nanofilm ranges from 10 to 2000 nm.

Assignees

• Jiangsu Favored Nanotechnology Co Ltd

Inventors

• Zong Jian

Classifications

• C23C16/513

  using plasma jets · CPC title

• C09D143/04

  Homopolymers or copolymers of monomers containing silicon · CPC title

• C09D137/00

  Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (based on polymers of cyclic esters of polyfunctional acids C09D131/00; based on polymers of cyclic anhydrides of unsaturated acids C09D135/00); Coating compositions based on derivatives of such polymers · CPC title

• D06M15/277

  containing fluorine · CPC title

• D06M15/256

  containing fluorine · CPC title