Fluid introduction module for plasma system

US12150234B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12150234-B2
Application numberUS-202117525977-A
CountryUS
Kind codeB2
Filing dateNov 15, 2021
Priority dateOct 12, 2021
Publication dateNov 19, 2024
Grant dateNov 19, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A fluid introduction module for plasma system is adapted for being disposed in a plasma system and includes a rotating nozzle and a precursor supply device. The rotating nozzle includes a main flow channel, a plasma outlet located at an end of the main flow channel, a mixing flow channel that penetrates a side wall of the rotating nozzle and communicates with the main flow channel, an independent flow channel separated from the main flow channel, and a precursor independent outlet located at an end of the independent flow channel. The precursor supply device includes a fixed housing and a rotating bearing. The fixed housing is sleeved outside the rotating nozzle and includes a precursor inlet selectively communicating with either the mixing flow channel or the independent flow channel. The rotating bearing is disposed between the rotating nozzle and the fixed housing.

First claim

Opening claim text (preview).

What is claimed is: 1. A fluid introduction module for plasma system, adapted for being disposed in a plasma system, the fluid introduction module for plasma system comprising: a rotating nozzle, comprising a main flow channel adapted to communicate with the plasma system, a plasma outlet located at an end of the main flow channel, a mixing flow channel that penetrates through a side wall of the rotating nozzle and communicates with the main flow channel, an independent flow channel separated from the main flow channel, and a precursor independent outlet located at an end of the independent flow channel; and a precursor supply device, comprising: a fixed housing, sleeved outside the rotating nozzle, comprising a precursor inlet, wherein the precursor inlet selectively communicates with either the mixing flow channel or the independent flow channel; and a rotating bearing, disposed between the rotating nozzle and the fixed housing, wherein when the precursor inlet is adjusted to communicate with the mixing flow channel, a precursor fluid is adapted to flow from the precursor inlet to the main flow channel through the mixing flow channel, mix with a plasma flowing into the main flow channel, and flow out from the plasma outlet together with the plasma, and when the precursor inlet is adjusted to communicate with the independent flow channel, the precursor fluid is adapted to flow from the precursor inlet to the independent flow channel, and flow out from the precursor independent outlet, and then mix with the plasma flowing out from the plasma outlet. 2. The fluid introduction module for plasma system according to claim 1 , further comprising a rotating housing, wherein the rotating nozzle is disposed below the rotating housing and communicates with the rotating housing, wherein the plasma system comprises an inner electrode disposed in the rotating housing, a plasma generating zone is formed among the inner electrode, the rotating housing, and the rotating nozzle, and the mixing flow channel is connected to the plasma generating zone. 3. The fluid introduction module for plasma system according to claim 1 , wherein the precursor supply device further comprises a blocking member adjustably disposed on the mixing flow channel or the independent flow channel to block communication between the precursor inlet and the mixing flow channel or to block communication between the precursor inlet and the independent flow channel. 4. The fluid introduction module for plasma system according to claim 3 , wherein the block member comprises an external thread, the mixing flow channel comprises a first internal thread, and the independent flow channel comprises a second internal thread. 5. The fluid introduction module for plasma system according to claim 1 , further comprising a sealing set fixed on the fixed housing, wherein the sealing set surrounds the rotating nozzle and abuts against the rotating nozzle closely. 6. The fluid introduction module for plasma system according to claim 5 , wherein the sealing set comprises a first sealing ring, a second sealing ring, and an elastic member, the fluid introduction module for plasma system further comprises a positioning member fixed to an end of the rotating nozzle, the first sealing ring is sleeved outside the rotating nozzle, the second sealing ring is sleeved outside the positioning member, and the elastic member is located between the first sealing ring and the second sealing ring, such that the first sealing ring and the second sealing ring respectively abut against the rotating nozzle and the positioning member. 7. The fluid introduction module for plasma system according to claim 6 , wherein the first sealing ring comprises a first contact surface that contacts a first outer surface of the rotating nozzle, and the first contact surface and the first outer surface are two inclined surfaces or two stepped surfaces with corresponding contours. 8. The fluid introduction module for plasma system according to claim 6 , wherein the second sealing ring comprises a second contact surface that contacts a second outer surface of the positioning member, and the second contact surface and the second outer surface are two inclined surfaces or two stepped surfaces with corresponding contours. 9. The fluid introduction module for plasma system according to claim 1 , further comprising a safety switch and a bearing gland, wherein the safety switch is electrically connected to the rotating nozzle, the bearing gland is fixed to the fixed housing and comprises an abutting portion, the abutting portion abuts against the safety switch, and when the fixed housing rotates, the abutting portion pushes and triggers the safety switch, such that the rotating nozzle stops rotating. 10. The fluid introduction module for plasma system according to claim 9 , wherein the abutting portion is a V-shaped groove, and the safety switch abuts on a surface of the V-shaped groove. 11. The fluid introduction module for plasma system according to claim 1 , wherein the rotating bearing is a roller bearing or a ball bearing. 12. The fluid introduction module for plasma system according to claim 1 , wherein the fixed housing comprises two inner ribs protruding from an inner surface, and a channel is formed between the two inner ribs. 13. The fluid introduction module for plasma system according to claim 12 , wherein a switch or a valve is arranged on the channel such that the precursor inlet communicates with the mixing flow channel or communicates with the independent flow channel.

Assignees

Inventors

Classifications

  • Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements · CPC title

  • Oblique nozzles · CPC title

  • H05H1/24Primary

    Generating plasma {(nuclear fusion reactors G21B1/00; gas-filled discharge reactors H01J37/32)} · CPC title

  • H05H1/42Primary

    with provisions for introducing materials into the plasma, e.g. powder or liquid {(arc stabilising or constricting arrangements H05H1/3405; coaxial protecting fluids H05H1/341)} · CPC title

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What does patent US12150234B2 cover?
A fluid introduction module for plasma system is adapted for being disposed in a plasma system and includes a rotating nozzle and a precursor supply device. The rotating nozzle includes a main flow channel, a plasma outlet located at an end of the main flow channel, a mixing flow channel that penetrates a side wall of the rotating nozzle and communicates with the main flow channel, an independe…
Who is the assignee on this patent?
Ind Tech Res Inst
What technology area does this patent fall under?
Primary CPC classification H05H1/24. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 19 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).