Methods and systems for stencil printing

Patent metadata

Field	Value
Publication number	US-12145392-B2
Application number	US-202118258700-A
Country	US
Kind code	B2
Filing date	Dec 21, 2021
Priority date	Dec 29, 2020
Publication date	Nov 19, 2024
Grant date	Nov 19, 2024

Abstract

Methods and apparatuses for screen or stencil printing a pattern on a substrate are provided. The substrate ( 2 ) has its major surface in contact with a first major surface ( 112 ) of a stencil shell ( 111 ) having apertures ( 116 ). A coating material is disposed onto the second major surface ( 114 ) of the stencil shell ( 111 ) to flow through the apertures ( 116 ) to contact the substrate ( 2 ), where the coating material is at least partially cured. The substrate ( 2 ) is separated (C) from the first major surface ( 112 ) of the stencil shell ( 111 ) after the curing ( 142 ) and a pattern ( 42 ) of the at-least-partially-cured coating material is formed on the substrate ( 2 ).

First claim

What is claimed is:

1. A stencil printing system comprising:
a stencil comprising a stencil shell having a first major surface and a second major surface opposite the first major surface, the stencil shell comprising one or more apertures extending from the first major surface to the second major surface, the stencil being a rotary stencil or a flatbed stencil;
a substrate including a major surface in contact with the first major surface of the stencil shell; wherein the stencil shell comprises a release material to facilitate the separating of the major surface of the substrate from the first major surface of the stencil shell;
an applicator disposed adjacent to the second major surface of the stencil shell, configured to dispose a coating material onto the second major surface of the stencil shell to allow at least some of the coating material to fill in the one or more apertures and contact the major surface of the substrate;
a curing mechanism configured to at least partially cure the coating material in contact to the major surface of the substrate at a curing zone where the major surface of the substrate is in contact with the first major surface of the stencil shell;
a shield structure adjacent to the second major surface of the stencil shell and facing the curing zone; and
a separation mechanism positioned downstream of the curing mechanism, configured to separate the major surface of the substrate from the first major surface of the stencil shell after the coating material is at least partially cured by the curing mechanism, wherein a pattern of the coating material that is at least partially cured is formed on the major surface of the substrate.

2. A method of applying a pattern to a substrate, the method comprising:
providing the stencil printing system of claim 1 ;
contacting the major surface of the substrate with the first major surface of the stencil shell;
disposing a coating material onto the second major surface of the stencil shell to allow at least some of the coating material to fill in the one or more apertures and contact the major surface of the substrate;
at least partially curing the coating material in contact to the major surface of the substrate at the curing zone where the major surface of the substrate is in contact with the first major surface of the stencil shell; and
after at least partially curing the coating material, separating the major surface of the substrate from the first major surface of the stencil shell, wherein a pattern of the coating material that is at least partially cured is formed on the major surface of the substrate.

3. The method of claim 2 , wherein contacting the major surface of the substrate with the first major surface of the stencil comprises at least partially wrapping the substrate around the rotary stencil.

4. The method of claim 2 , further comprises forcing, via the applicator positioned adjacent to the second major surface of the stencil shell, the coating material to flow through the one or more apertures of the stencil shell, wherein a coating bead of the coating material is formed upstream of the applicator and in contact with the second major surface of the stencil shell.

5. The method of claim 2 , wherein the stencil printing system further comprises a backing roll to abut the rotary stencil to form a nip, and wherein the major surface of the substrate is separated from the first major surface of the stencil shell when the substrate exits the nip.

6. The method of claim 2 , wherein the stencil printing system further comprises a second curing system, and the method further comprises further curing the pattern of the coating material after the separating of the major surface of the substrate from the first major surface of the stencil shell.

7. The stencil printing system of claim 1 , wherein the applicator is configured to force the coating material to flow through the one or more apertures of the stencil shell to form a coating bead of the coating material upstream of the applicator and in contact with the second major surface of the stencil shell.

8. The stencil printing system of claim 1 , wherein the separation mechanism comprises a backing roll to abut the rotary stencil to form a nip.

9. The stencil printing system of claim 1 , further comprising a second curing mechanism to cure the pattern of the coating material that is at least partially cured after the separating of the major surface of the substrate from the first major surface of the stencil shell.

10. The stencil printing system of claim 1 , wherein the one or more apertures of the stencil shell have a thickness of 50 micrometers to 1.0 mm.

11. The stencil printing system of claim 1 , wherein the one or more apertures of the stencil shell have a lateral dimension of 100 micrometers to 5.0 mm.

12. A stencil printing system comprising:
a stencil comprising a stencil shell having a first major surface and a second major surface opposite the first major surface, the stencil shell comprising one or more apertures extending from the first major surface to the second major surface, the stencil being a rotary stencil or a flatbed stencil;
a gasket layer on the first major surface of the stencil shell, wherein the gasket layer comprises a pattern of apertures in registration with the one or more apertures of the stencil shell;
a substrate including a major surface in contact with the gasket layer;
an applicator disposed adjacent to the second major surface of the stencil shell, configured to dispose a coating material onto the second major surface of the stencil shell to allow at least some of the coating material to fill in the one or more apertures of the stencil shell and the one or more apertures of the gasket layer and contact the major surface of the substrate;
a curing mechanism configured to at least partially cure the coating material in contact to the major surface of the substrate at a curing zone where the major surface of the substrate is in contact with the first major surface of the stencil shell;
a shield structure adjacent to the second major surface of the stencil shell and facing the curing zone; and
a separation mechanism positioned downstream of the curing mechanism, configured to separate the major surface of the substrate from the first major surface of the stencil shell after the coating material is at least partially cured by the curing mechanism, wherein a pattern of the coating material that is at least partially cured is formed on the major surface of the substrate.

13. The stencil printing system of claim 12 , wherein the gasket layer has a thickness from 10 to 500 micrometers.

14. The stencil printing system of claim 12 , wherein the gasket layer comprises at least one of polydimethylsiloxane (PDMS), polyurethane, or photopolymer.

Assignees

• 3M Innovative Properties Company

Inventors

• Gilman Ann M
• Reddy Kevin T
• Dodds Shawn C
• Smith Matthew R D
• Cook Clinton J
• Pekurovsky Mikhail L
• Stay Matthew S

Classifications

• B41M1/12 Primary

  Stencil printing; Silk-screen printing · CPC title

• B41L13/14

  Attachments, e.g. for punching, cutting, severing · CPC title

• B41M7/009 Primary

  using thermal means, e.g. infrared radiation, heat · CPC title

• B41M7/0081

  using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams · CPC title

• B41L13/00

  Stencilling apparatus for office or other commercial use (screen printing B41F15/00; stencils, stencil materials, carriers therefor B41N1/24) · CPC title