Substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-12145171-B2
Application number	US-202217575685-A
Country	US
Kind code	B2
Filing date	Jan 14, 2022
Priority date	Feb 16, 2021
Publication date	Nov 19, 2024
Grant date	Nov 19, 2024

Abstract

Disclosed is a substrate treating apparatus in which a first treating unit is located rightward of a transportation space. The first treating unit includes a first holder. A second treating unit is located leftward of the transportation space. The second treating unit includes a second holder. The first holder has a center point positioned more rearward than a middle point of the first treating unit in plan view. The second holder has a center point positioned more forward than a middle point of the second treating unit in plan view. The second treating unit has a front end located more rearward than a front end of the first treating unit and more forward than a rear end of the first treating unit. The first liquid reservoir is located leftward of the transportation space and adjacent to and in front of the second treating unit.

First claim

What is claimed is:

1. A substrate treating apparatus, comprising:
an indexer; and
a treating block located behind the indexer and is connected to the indexer,
the treating block including:
a transportation space extending in a front-back direction;
a transport mechanism located in the transportation space and configured to be movable in parallel in the front-back direction and to transport a substrate;
a first treating unit arranged on a first lateral side of the transportation space and configured to treat a substrate;
a second treating unit arranged on a second lateral side of the transportation space and configured to treat a substrate; and
a first liquid reservoir configured to store a treatment liquid to be distributed to the first treating unit and the second treating unit,

the first treating unit including:
a first holder configured to hold a substrate; and
a first liquid supplying unit configured to supply a treatment liquid to a substrate held by the first holder,

the second treating unit including:
a second holder configured to hold a substrate; and
a second liquid supplying unit configured to supply a treatment liquid to a substrate held by the second holder,

the transport mechanism transporting a substrate to the first holder and the second holder,
the first holder having a center point positioned more rearward than a middle point of the first treating unit in plan view,
the second holder having a center point positioned more forward than a middle point of the second treating unit in plan view,
the second treating unit having a front end located more rearward than a front end of the first treating unit and more forward than a rear end of the first treating unit, and
the first liquid reservoir being located on the second lateral side of the transportation space and adjacent to and in front of the second treating unit.

2. The substrate treating apparatus according to claim 1 , wherein
the center point of the second holder is located more forward than the center point of the first holder.

3. The substrate treating apparatus according to claim 1 , wherein
the first liquid reservoir has a front end located at substantially the same position as the front end of the first treating unit in the front-back direction.

4. The substrate treating apparatus according to claim 1 , wherein
the first treating unit is located adjacent to and behind the indexer, and
the first liquid reservoir is located adjacent to and behind the indexer.

5. The substrate treating apparatus according to claim 1 , wherein
the second treating unit has a configuration equal to a configuration in which the first treating unit is rotated by 180 degrees about a vertical axis.

6. The substrate treating apparatus according to claim 1 , further comprising:
a substrate platform configured to place thereon a substrate transported between the indexer and the transport mechanism, wherein
at least part of the substrate platform is located in the transportation space.

7. The substrate treating apparatus according to claim 6 , wherein
the substrate platform is located between the first treating unit and the first liquid reservoir.

8. The substrate treating apparatus according to claim 1 , further comprising:
a third treating unit located on the first lateral side of the transportation space and adjacent to and behind the first treating unit and configured to treat a substrate; and
a fourth treating unit located on the second lateral side of the transportation space and adjacent to and behind the second treating unit and configured to treat a substrate,
the third treating unit including:
a third holder configured to hold a substrate; and
a third liquid supplying unit configured to supply a treatment liquid to a substrate held by the third holder,

the fourth treating unit including:
a fourth holder configured to hold a substrate; and
a fourth liquid supplying unit configured to supply a treatment liquid to a substrate held by the fourth holder, wherein

the transport mechanism transports a substrate to the third holder and the fourth holder,
the first liquid reservoir stores a treatment liquid to be distributed to the third treating unit and the fourth treating units,
the third holder has a center point positioned more rearward than a middle point of the third treating unit in plan view,
the fourth holder has a center point positioned more forward than a middle point of the fourth treating unit in plan view, and
the fourth treating unit has a front end located more rearward than a front end of the third treating unit and more forward than a rear end of the third treating unit.

9. The substrate treating apparatus according to claim 8 , wherein
the third treating unit has a configuration equal to a configuration of the first treating unit, and
the fourth treating unit has a configuration equal to a configuration in which the first treating unit is rotated by 180 degrees about a vertical axis.

10. The substrate treating apparatus according to claim 8 , further comprising:
a second liquid reservoir configured to store a treatment liquid to be distributed to the first treating unit, the second treating unit, the third treating unit, and the fourth treating unit, wherein
the second liquid reservoir is located on the first lateral side of the transportation space and adjacent to and behind the third treating unit.

11. The substrate treating apparatus according to claim 10 , wherein
the second liquid reservoir has a rear end located at substantially the same position as a rear end of the fourth treating unit in the front-back direction.

12. The substrate treating apparatus according to claim 10 , wherein
the treatment liquid stored in the second liquid reservoir is different in type from the treatment liquid stored in the first liquid reservoir.

13. The substrate treating apparatus according to claim 10 , further comprising:
an upper space formed above the transportation space, the first treating unit, the second treating unit, the third treating unit, the fourth treating unit, the first liquid reservoir, and the second liquid reservoir;
a first distributing portion provided in the upper space and configured to distribute a treatment liquid from the first liquid reservoir to the first treating unit, the second treating unit, the third treating unit, and the fourth treating unit; and
a second distributing portion provided in the upper space and configured to distribute a treatment liquid from the second liquid reservoir to the first treating unit, the second treating unit, the third treating unit, and the fourth treating unit.

14. The substrate treating apparatus according to claim 13 , wherein
the second distributing portion has a configuration equal to a configuration in which the first distributing portion is rotated by 180 degrees in plan view.

15. The substrate treating apparatus according to claim 13 , further comprising:
a first connecting box located above the first treating unit;
a second connecting box located above the second treating unit;
a third connecting box located above the third treating unit; and
a fourth connecting box located above the fourth treating unit, wherein
the first distributing portion extends from the first liquid reservoir to the first connecting box, the second connecting box, the third connecting box, and the fourth connecting box, and
the second distributing portion extends from the second liquid reservoir to the first connecting box, the second connecting box, the third connecting box, and the fourth connecting box.

Assignees

• Screen Holdings Co Ltd

Inventors

• Sawashima Jun
• Yamaguchi Takahiro

Classifications

• H10P72/3302

  Mechanical parts of transfer devices · CPC title

• H10P72/3304

  characterised by movements or sequence of movements of transfer devices · CPC title

• H10P72/0464 Primary

  characterised by the construction of the transfer chamber · CPC title

• H10P72/0458

  vertical arrangement · CPC title

• H10P72/0452

  characterised by the layout of the process chambers · CPC title