Vacuum deposition facility and method for coating a substrate

Patent metadata

Field	Value
Publication number	US-12139784-B2
Application number	US-201816770872-A
Country	US
Kind code	B2
Filing date	Dec 11, 2018
Priority date	Dec 14, 2017
Publication date	Nov 12, 2024
Grant date	Nov 12, 2024

Abstract

A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including:
a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.

First claim

The invention claimed is:

1. A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility comprising:
a vacuum chamber including:
a central casing having a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the vapor jet coater configured to spray metal or metal alloy vapors onto the substrate, inner walls of the central casing configured to be heated at a temperature above a condensation temperature of the metal or metal alloy vapors; and
a vapor trap in a form of an external casing located at the substrate exit of the central casing, vapor trap inner walls configured to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors,

a substrate path in the vacuum chamber through the central casing and the vapor trap,
a passage linking the central casing to the vapor trap including at least one thermal connector comprising an inward end and an outward end, the at least one thermal connector inserted into the substrate exit of the central casing such that outer walls of the central casing and outer walls of the vapor trap directly contact, the thermal connector extending from the outer walls of the vapor trap to the inner walls of the central casing.

2. The vacuum deposition facility as recited in claim 1 , wherein the thermal connector includes a monobloc metallic piece.

3. The vacuum deposition facility as recited in claim 2 , wherein the metallic piece is made of a metal with a thermal conductivity above 20 W·m −1 K −1 .

4. The vacuum deposition facility as recited in claim 3 , wherein the metallic piece is made of copper.

5. The vacuum deposition facility as recited in claim 1 , wherein a thickness of the thermal connector is between 6 and 18 mm.

6. The vacuum deposition facility as recited in claim 1 , wherein the thermal connector has a uniform cross-sectional shape and extends over an entire width of the substrate exit of the central casing.

7. The vacuum deposition facility as recited in claim 1 , wherein the thermal connector has a rectangular cross-section.

8. The vacuum deposition facility as recited in claim 1 , wherein the thermal connector protrudes in an inward direction from the inner walls of the central casing by at least 4 mm.

9. The vacuum deposition facility as recited in claim 1 , wherein the outward end of the thermal connector does not extend beyond a plane of one of the vapor trap inner walls at an inward end of the vapor trap.

10. The vacuum deposition facility as recited in claim 1 , wherein the central casing includes a local heater adjacent the thermal connector.

11. The vacuum deposition facility as recited in claim 1 , further comprising a second vapor trap located at the substrate entry of the central casing.

12. The vacuum deposition facility as recited in claim 1 , wherein the at least one thermal connector includes two thermal connectors, one below the substrate path of the substrate and the other one above the substrate path.

13. The vacuum deposition facility as recited in claim 1 , wherein the outward end of the thermal connector protrudes from the vapor trap to a position inside the central casing and is in contact with the outer walls of the central casing.

14. The vacuum deposition facility according to claim 1 , further comprising a heater, the heater heating the inner walls of the central casing to the temperature above the condensation temperature of the metal or metal alloy vapors.

15. The vacuum deposition facility according to claim 1 , wherein the vapor jet coater is a sonic vapor jet coater.

16. The vacuum deposition facility according to claim 15 , wherein the sonic vapor jet coater is coupled to an induction-heated evaporation crucible or an electromagnetic levitation vapor generator.

17. The vacuum deposition facility according to claim 1 , wherein the coatings formed from metal or metal alloy are zinc or zinc magnesium coatings.

18. The vacuum deposition facility according to claim 1 , wherein the coatings formed from metal or metal alloy comprise zinc, as a main element, and chromium, nickel, titanium, manganese, magnesium, silicium, aluminum and combinations thereof, as an additional element.

19. The vacuum deposition facility according to claim 1 , wherein the at least one thermal connector conducts heat from the central casing to the vapor trap while keeping the at least one thermal connector in contact with the central casing at the temperature above the condensation temperature of the metal or metal alloy vapors.

20. The vacuum deposition facility according to claim 1 , wherein the at least one thermal connector is heated by radiation in the central casing and heat is transmitted by conduction to the vapor trap.

21. The vacuum deposition facility according to claim 1 , wherein the at least one thermal connector is thicker than sides of the vapor trap.

22. The vacuum deposition facility according to claim 1 , wherein the vapor trap, in longitudinal cross-section, comprises a trapezoid shape pointing in a direction opposite to the central casing.

23. The vacuum deposition facility according to claim 1 , wherein the vapor trap inner walls are maintained at a temperature below 100° C.

24. The vacuum deposition facility according to claim 1 , wherein the at least one thermal connector comprises a solid metallic piece.

25. The vacuum deposition facility according to claim 1 , wherein the outer walls of the central casing and the outer walls of vapor trap are aligned and define a plane of contact between the central casing and the vapor trap.

26. The vacuum deposition facility according to claim 1 , wherein the inward end is protruding in an inward direction past the inner walls of the central casing.

27. A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility comprising:
a vacuum chamber including:
a central casing having a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the vapor jet coater configured to spray metal or metal alloy vapors onto the substrate, inner walls of the central casing configured to be heated at a temperature above a condensation temperature of the metal or metal alloy vapors; and
a vapor trap in a form of an external casing located at the substrate exit of the central casing, vapor trap inner walls configured to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors,

a substrate path in the vacuum chamber through the central casing and the vapor trap, a passage linking the central casing to the vapor trap including at least one thermal connector extending from the inner walls of the central casing to the vapor trap inner walls,
wherein the thermal connector comprises an inward end and an outward end, the inward end is inserted into the central casing such that outer walls of the central casing and outer walls of the vapor trap directly contact, and the inward end is protruding in an inward direction from the inner walls of the central casing to a position inside the central casing, and the outward end is in contact with the outer walls of the vapor trap.

28. The vacuum deposition facility as recited in claim 27 , wher

Assignees

• Arcelormittal

Inventors

• Silberberg Eric
• Schmitz Bruno
• Pace Sergio
• Bonnemann Remy
• Marneffe Didier

Classifications

• C23C14/564 Primary

  Means for minimising impurities in the coating chamber such as dust, moisture, residual gases · CPC title

• C23C14/562

  for coating elongated substrates · CPC title

• C23C14/24 Primary

  Vacuum evaporation · CPC title