Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device
US-2021147629-A1 · May 20, 2021 · US
Preparing method for polymer, composition for radical polymerization and control agent for radical polymerization
US12134665B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12134665-B2 |
| Application number | US-202217704106-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 25, 2022 |
| Priority date | Apr 2, 2021 |
| Publication date | Nov 5, 2024 |
| Grant date | Nov 5, 2024 |
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- Title
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- Abstract
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- CPC / IPC classifications
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Abstract
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The present invention provides a preparing method of a polymer which is low-toxic, environmental-friendly, highly controllable, and low cost to obtain a polymer with high molecular weight. The preparing method comprises conducting a controlled radical polymerization process of monomer (Y). In the controlled radical polymerization process, organic compound (A) which has the formula (I) and radical initiator (B) are existing in a mole ratio (B/A) ranged from 0.5 to 25, wherein R 1 is a hydrogen atom, alkyl group, aryl group, or hydroxyl group, the alkyl group can be alkyl having substituents or alkyl substituent, and the aryl group can be aryl having substituents or aryl substituent.
First claim
Opening claim text (preview).
What is claimed is: 1. A composition for controlled radical polymerization comprises organic compound (A) having formula (III) and radical initiator (B) existing in a mole ratio (B/A) ranged from 0.5 to 25, the structure of formula (III) is shown as wherein the formula of organic compound (A) does not contain halogen atoms, sulfur atoms, or metals. 2. The composition of claim 1 , further comprising monomer (Y), wherein the monomer (Y) and the organic compound (A) existing in a mole ratio (Y/A) ranged from 300 to 30000. 3. The composition of claim 2 , wherein the monomer (Y) includes vinyl acetate.
Assignees
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Classifications
using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent · CPC title
- C08F2/38Primary
Polymerisation using regulators, e.g. chain terminating agents {, e.g. telomerisation} · CPC title
Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO] · CPC title
Azo-compounds · CPC title
Living radical polymerisation · CPC title
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- What does patent US12134665B2 cover?
- The present invention provides a preparing method of a polymer which is low-toxic, environmental-friendly, highly controllable, and low cost to obtain a polymer with high molecular weight. The preparing method comprises conducting a controlled radical polymerization process of monomer (Y). In the controlled radical polymerization process, organic compound (A) which has the formula (I) and radic…
- Who is the assignee on this patent?
- Univ Nat Tsing Hua
- What technology area does this patent fall under?
- Primary CPC classification C08F2/38. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Nov 05 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).