Mask exposure method, transparent conductive metallization and pigment

US12128704B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12128704-B2
Application numberUS-202218263787-A
CountryUS
Kind codeB2
Filing dateJan 10, 2022
Priority dateFeb 1, 2021
Publication dateOct 29, 2024
Grant dateOct 29, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention relates to a mask exposure method comprising the following steps: —the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; —the exposure of the radiation-crosslinkable washable dye layer in defined regions to radiation by means of a radiation mask, such that the washable dye is cured in the defined regions; —the applying of a metallization over the full area; —the removing of the non-radiation-exposed washable dye outside the defined regions together with the metal present thereon with the aid of a solvent, such that the resultant carrier substrate has cured washable dye with metal applied thereto only in defined regions.

First claim

Opening claim text (preview).

The invention claimed is: 1. A mask exposure method, comprising the following steps: providing a carrier substrate; applying a full-area, radiation-crosslinkable, washable ink layer to the carrier substrate; irradiating the radiation-crosslinkable, washable ink layer in defined regions by means of a shadow mask, so that washable ink is cured in the defined regions; applying a full-area metallization; removing non-irradiated washable ink outside of the defined regions, together with metal present thereon, by means of a solvent, so that the carrier substrate obtained comprises cured washable ink with metal applied thereon only in the defined regions. 2. The mask exposure method according to claim 1 , wherein the carrier substrate obtained which only in defined regions comprises cured washable ink with metal applied thereon forms a transparent, conductive metallization in the form of a periodic, coherent network. 3. The mask exposure method according to claim 2 , wherein the shadow mask comprises a radiation-transparent material which in defined regions comprises a material impervious to the radiation; wherein a geometry of the metallization generated in the method, in the form of a periodic, coherent network, is determined by choice of parameters of a geometric structure of the radiation-impervious shadow mask material and of spacing of the radiation-impervious shadow mask material. 4. A transparent, conductive metallization in the form of a periodic, coherent network, obtainable by the method according to claim 2 . 5. The mask exposure method according to claim 1 , wherein the shadow mask comprises a radiation-transparent material which in defined regions comprises a material impervious to the radiation. 6. The mask exposure method according to claim 5 , wherein the shadow mask has a cylindrical shape, and the radiation-transparent material comprises glass or quartz. 7. The mask exposure method according to claim 6 , wherein the step of irradiating the radiation-crosslinkable, washable ink layer in defined regions by means of the cylindrical shadow mask, so that the washable ink is cured in the defined regions, is carried out such that a web speed of the carrier substrate, present in the form of a substrate web, coincides with a rotary speed of the cylindrical shadow mask. 8. The mask exposure method according to claim 1 , wherein the radiation-crosslinkable, washable ink layer comprises a composition which comprises a photoinitiator and a binder. 9. The mask exposure method according to claim 8 , wherein the binder is a polymer selected from the group consisting of hydroxyethylcellulose, hydroxypropylcellulose, carboxymethylcellulose, polyvinyl alcohol, polyvinylpyrrolidone, polyethylene glycol and casein. 10. The mask exposure method according to claim 8 , wherein the composition of the radiation-crosslinkable, washable ink layer further comprises a reactive diluent. 11. The mask exposure method according to claim 1 , wherein after the step of the removal of the non-irradiated washable ink outside of the defined regions, together with the metal present thereon, by means of a solvent, the step of isolation of the metal removed takes place, in order thus to obtain platelet-shaped pigments. 12. A platelet-shaped pigment obtainable by the method according to claim 11 .

Assignees

Inventors

Classifications

  • using chemical means, e.g. etching · CPC title

  • B42D25/373Primary

    Metallic materials · CPC title

  • Providing a shape to conductive layers, e.g. patterning or selective deposition · CPC title

  • B42D25/41Primary

    using electromagnetic radiation (B42D25/435 takes precedence) · CPC title

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Frequently asked questions

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What does patent US12128704B2 cover?
The invention relates to a mask exposure method comprising the following steps: —the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; —the exposure of the radiation-crosslinkable washable dye layer in defined regions to radiation by means of a radiation mask, such that the washable dye is cured in …
Who is the assignee on this patent?
Giesecke & Devrient Currency Technology Gmbh
What technology area does this patent fall under?
Primary CPC classification B42D25/373. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 29 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).