Uv-patternable hard-coating for transparent conductive film
US-2016238929-A1 · Aug 18, 2016 · US
US12128704B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12128704-B2 |
| Application number | US-202218263787-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 10, 2022 |
| Priority date | Feb 1, 2021 |
| Publication date | Oct 29, 2024 |
| Grant date | Oct 29, 2024 |
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The invention relates to a mask exposure method comprising the following steps: —the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; —the exposure of the radiation-crosslinkable washable dye layer in defined regions to radiation by means of a radiation mask, such that the washable dye is cured in the defined regions; —the applying of a metallization over the full area; —the removing of the non-radiation-exposed washable dye outside the defined regions together with the metal present thereon with the aid of a solvent, such that the resultant carrier substrate has cured washable dye with metal applied thereto only in defined regions.
Opening claim text (preview).
The invention claimed is: 1. A mask exposure method, comprising the following steps: providing a carrier substrate; applying a full-area, radiation-crosslinkable, washable ink layer to the carrier substrate; irradiating the radiation-crosslinkable, washable ink layer in defined regions by means of a shadow mask, so that washable ink is cured in the defined regions; applying a full-area metallization; removing non-irradiated washable ink outside of the defined regions, together with metal present thereon, by means of a solvent, so that the carrier substrate obtained comprises cured washable ink with metal applied thereon only in the defined regions. 2. The mask exposure method according to claim 1 , wherein the carrier substrate obtained which only in defined regions comprises cured washable ink with metal applied thereon forms a transparent, conductive metallization in the form of a periodic, coherent network. 3. The mask exposure method according to claim 2 , wherein the shadow mask comprises a radiation-transparent material which in defined regions comprises a material impervious to the radiation; wherein a geometry of the metallization generated in the method, in the form of a periodic, coherent network, is determined by choice of parameters of a geometric structure of the radiation-impervious shadow mask material and of spacing of the radiation-impervious shadow mask material. 4. A transparent, conductive metallization in the form of a periodic, coherent network, obtainable by the method according to claim 2 . 5. The mask exposure method according to claim 1 , wherein the shadow mask comprises a radiation-transparent material which in defined regions comprises a material impervious to the radiation. 6. The mask exposure method according to claim 5 , wherein the shadow mask has a cylindrical shape, and the radiation-transparent material comprises glass or quartz. 7. The mask exposure method according to claim 6 , wherein the step of irradiating the radiation-crosslinkable, washable ink layer in defined regions by means of the cylindrical shadow mask, so that the washable ink is cured in the defined regions, is carried out such that a web speed of the carrier substrate, present in the form of a substrate web, coincides with a rotary speed of the cylindrical shadow mask. 8. The mask exposure method according to claim 1 , wherein the radiation-crosslinkable, washable ink layer comprises a composition which comprises a photoinitiator and a binder. 9. The mask exposure method according to claim 8 , wherein the binder is a polymer selected from the group consisting of hydroxyethylcellulose, hydroxypropylcellulose, carboxymethylcellulose, polyvinyl alcohol, polyvinylpyrrolidone, polyethylene glycol and casein. 10. The mask exposure method according to claim 8 , wherein the composition of the radiation-crosslinkable, washable ink layer further comprises a reactive diluent. 11. The mask exposure method according to claim 1 , wherein after the step of the removal of the non-irradiated washable ink outside of the defined regions, together with the metal present thereon, by means of a solvent, the step of isolation of the metal removed takes place, in order thus to obtain platelet-shaped pigments. 12. A platelet-shaped pigment obtainable by the method according to claim 11 .
using chemical means, e.g. etching · CPC title
Metallic materials · CPC title
Providing a shape to conductive layers, e.g. patterning or selective deposition · CPC title
using electromagnetic radiation (B42D25/435 takes precedence) · CPC title
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