Polystyrene resin composition

US12122913B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12122913-B2
Application numberUS-201917418433-A
CountryUS
Kind codeB2
Filing dateDec 25, 2019
Priority dateDec 27, 2018
Publication dateOct 22, 2024
Grant dateOct 22, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

There is provided a polystyrene resin composition including: (A) a polyamide; (B) a polystyrene resin having a syndiotactic structure; (C) a compatibilizer which has a polar group reactive with the polyamide (A), and which is compatible with the polystyrene resin (B); (D) a particular hindered phenol compound; and (E) an inorganic filler, wherein the amount of the polystyrene resin (B) is 10.0 to 30.0% by weight, and the amount of the hindered phenol compound (D) is 0.3 to 1.0% by weight per 100% by weight of the total amount of the components (A) to (E).

First claim

Opening claim text (preview).

The invention claimed is: 1. A polystyrene resin composition comprising: (A) a polyamide; (B) a polystyrene resin having a syndiotactic structure; (C) a compatibilizer which has a polar group reactive with the polyamide (A), and which is compatible with the polystyrene resin (B); (D) at least one hindered phenol compound selected from the group consisting of N,N′-hexane-1,6-diylbis[3-(3,5-di-tert-butyl-4-hydroxyphenyl propionamide)] and 2′,3′-bis[3-[3,5-di-tert-butyl-4-hydroxyphenyl]propionyl]hydrazine; and (E) an inorganic filler, wherein the compatibilizer (C) is a modified polyphenylene ether polymer, wherein the amount of the polystyrene resin (B) is 10.0% by weight or more and 30.0% by weight or less, the amount of the compatibilizer (C) is 1.5% by weight or more and 3.5% by weight or less, and the amount of the hindered phenol compound (D) is 0.3% by weight or more and 1.0% by weight or less per 100% by weight of the total amount of the components (A) to (E). 2. The polystyrene resin composition according to claim 1 , wherein when the amount of the polyamide (A) is denoted by x % by weight and the amount of the polystyrene resin (B) is denoted by y % by weight per 100% by weight of the total amount of the components (A) to (E), x is larger than y. 3. The polystyrene resin composition according to claim 1 , wherein the amount of the polyamide (A) is 40.0% by weight or more and 80.0% by weight or less per 100% by weight of the total amount of the components (A) to (E). 4. The polystyrene resin composition according to claim 1 , wherein the amount of the inorganic filler (E) is 25.0% by weight or more and 50.0% by weight or less per 100% by weight of the total amount of the components (A) to (E). 5. The polystyrene resin composition according to claim 1 , wherein the hindered phenol compound (D) is N,N′-hexane-1,6-diylbis[3-(3,5-di-tert-butyl-4-hydroxyphenyl propionamide)]. 6. The polystyrene resin composition according to claim 1 , wherein the inorganic filler (E) is a glass filler. 7. A molded product comprising the polystyrene resin composition according to claim 1 . 8. The polystyrene resin composition according to claim 1 , wherein the polystyrene resin composition is free of a polyolefin.

Assignees

Inventors

Classifications

  • containing additives to improve the compatibility between two polymers · CPC title

  • containing three or more polymers in a blend · CPC title

  • Glass · CPC title

  • Phenols; Phenolates · CPC title

  • Derivatives of hydrazine · CPC title

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What does patent US12122913B2 cover?
There is provided a polystyrene resin composition including: (A) a polyamide; (B) a polystyrene resin having a syndiotactic structure; (C) a compatibilizer which has a polar group reactive with the polyamide (A), and which is compatible with the polystyrene resin (B); (D) a particular hindered phenol compound; and (E) an inorganic filler, wherein the amount of the polystyrene resin (B) is 10.0 …
Who is the assignee on this patent?
Idemitsu Kosan Co
What technology area does this patent fall under?
Primary CPC classification C08L77/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 22 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).