Method for preparing polyhedral oligomeric silsesquioxane
US-2018201734-A1 · Jul 19, 2018 · US
Polyorganosilsesquioxane and composition for forming hardcoat layer
US12116460B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12116460-B2 |
| Application number | US-202117394099-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 4, 2021 |
| Priority date | Feb 27, 2019 |
| Publication date | Oct 15, 2024 |
| Grant date | Oct 15, 2024 |
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Abstract
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A polyorganosilsesquioxane includes: a constitutional unit (a) having a fluorine atom-containing group; a constitutional unit (b) having a cationically polymerizable group; and a constitutional unit (c) having a radically polymerizable group.
First claim
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What is claimed is: 1. A composition for forming a hardcoat layer comprising a polyorganosilsesquioxane which includes: a constitutional unit (a) having a fluorine atom-containing group; a constitutional unit (b) having a cationically polymerizable group; and a constitutional unit (c) having a radically polymerizable group, wherein a content rate of the polyorganosilsesquioxane is 0.001 to 3% by mass with respect to a total solid content in the composition for forming a hardcoat layer. 2. The composition for forming a hardcoat layer according to claim 1 , wherein the constitutional unit (a) is a constitutional unit represented by the following General Formula (S-1), wherein the constitutional unit (b) is a constitutional unit represented by the following General Formula (S-2), and wherein the constitutional unit (c) is a constitutional unit represented by the following General Formula (S-3), wherein, in the General Formula (S-1), L 1 represents a single bond or a divalent linking group, and Q 1 represents the fluorine atom-containing group, wherein in the General Formula (S-2), L 2 represents a single bond or a divalent linking group, and Q 2 represents the cationically polymerizable group, and wherein in the General Formula (S-3), L 3 represents a single bond or a divalent linking group, and Q 3 represents the radically polymerizable group. 3. The composition for forming a hardcoat layer according to claim 1 , wherein the cationically polymerizable group of the constitutional unit (b) is an epoxy group. 4. The composition for forming a hardcoat layer according to claim 2 , wherein the cationically polymerizable group of the constitutional unit (b) is an epoxy group. 5. The composition for forming a hardcoat layer according to claim 3 , wherein the epoxy group is an alicyclic epoxy group. 6. The composition for forming a hardcoat layer according to claim 4 , wherein the epoxy group is an alicyclic epoxy group. 7. The composition for forming a hardcoat layer according to claim 1 , wherein the radically polymerizable group of the constitutional unit (c) is a (meth)acryloyl group. 8. The composition for forming a hardcoat layer according to claim 2 , wherein the radically polymerizable group of the constitutional unit (c) is a (meth)acryloyl group. 9. The composition for forming a hardcoat layer according to claim 3 , wherein the radically polymerizable group of the constitutional unit (c) is a (meth)acryloyl group. 10. The composition for forming a hardcoat layer according to claim 1 , wherein the number of fluorine atoms contained in the fluorine atom-containing group of the constitutional unit (a) is 9 or more. 11. The composition for forming a hardcoat layer according to claim 2 , wherein the number of fluorine atoms contained in the fluorine atom-containing group of the constitutional unit (a) is 9 or more. 12. The composition for forming a hardcoat layer according to claim 3 , wherein the number of fluorine atoms contained in the fluorine atom-containing group of the constitutional unit (a) is 9 or more. 13. The composition for forming a hardcoat layer according to claim 1 , wherein a molar ratio of a content of the constitutional unit (a) to a total content of constitutional units of the polyorganosilsesquioxane is 50 mol % or less. 14. The composition for forming a hardcoat layer according to claim 2 , wherein a molar ratio of a content of the constitutional unit (a) to a total content of constitutional units of the polyorganosilsesquioxane is 50 mol % or less. 15. The composition for forming a hardcoat layer according to claim 3 , wherein a molar ratio of a content of the constitutional unit (a) to a total content of constitutional units of the polyorganosilsesquioxane is 50 mol % or less. 16. The composition for forming a hardcoat layer according to claim 1 , wherein a molar ratio of a content of the constitutional unit (b) to a total content of constitutional units of the polyorganosilsesquioxane is 15 mol % or more. 17. The composition for forming a hardcoat layer according to claim 2 , wherein a molar ratio of a content of the constitutional unit (b) to a total content of constitutional units of the polyorganosilsesquioxane is 15 mol % or more. 18. The composition for forming a hardcoat layer according to claim 1 , wherein a molar ratio of a content of the constitutional unit (c) to a total content of constitutional units of the polyorganosilsesquioxane is 15 mol % or more. 19. The composition for forming a hardcoat layer according to claim 2 , wherein a molar ratio of a content of the constitutional unit (c) to a total content of constitutional units of the polyorganosilsesquioxane is 15 mol % or more.
Assignees
Inventors
Classifications
containing silicon bound to unsaturated aliphatic groups · CPC title
containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen · CPC title
halogen-containing groups · CPC title
containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen · CPC title
- C08G77/14Primary
containing silicon bound to oxygen-containing groups · CPC title
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- What does patent US12116460B2 cover?
- A polyorganosilsesquioxane includes: a constitutional unit (a) having a fluorine atom-containing group; a constitutional unit (b) having a cationically polymerizable group; and a constitutional unit (c) having a radically polymerizable group.
- Who is the assignee on this patent?
- Fujifilm Corp
- What technology area does this patent fall under?
- Primary CPC classification C08G77/14. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 15 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).