Electron beam patterning system in additive manufacturing

Patent metadata

Field	Value
Publication number	US-12115720-B2
Application number	US-202017091915-A
Country	US
Kind code	B2
Filing date	Nov 6, 2020
Priority date	Oct 30, 2015
Publication date	Oct 15, 2024
Grant date	Oct 15, 2024

Abstract

A method and an apparatus involve applying a pattern on an addressable patternable cathode unit. The cathode unit is stimulated to emit an electron beam pattern. A patterned image in the electron beam pattern is positioned to a desired position such directly to as a powder bed for additive manufacturing or to an electron beam addressed light valve for controlling spatial patterns on an optical signal for powder bed manufacturing.

First claim

What is claimed is:

1. A method, comprising:
applying a pattern on a cathode unit comprising an array that is addressable by the applied pattern;
stimulating the cathode unit to emit an electron beam pattern according to the applied pattern; and
positioning the electron beam pattern to a desired position.

2. The method of claim 1 , wherein the applying of the pattern comprises applying a two-dimensional image using a light projector.

3. The method of claim 1 , further comprising:
generating the electron beam pattern with an electrically driven imagery using an integrated emission array.

4. The method of claim 2 , further comprising:
generating the electron beam pattern by emitting light from the light projector at a wavelength appropriate to stimulate a photoconductive layer.

5. The method of claim 4 , wherein the photoconductive layer is stimulated by an optical field that enables individual emitters or one or more groups of emitters to produce an electron beam.

6. The method in claim 1 , further comprising:
focusing the electron beam pattern directly to a powder bed in an electron beam system by using an ensemble of integrated focusing grids.

7. The method of claim 6 , wherein the focusing of the electron beam pattern directly to the powder bed comprises scanning the electron beam pattern in a one-dimensional (1D) or two-dimensional (2D) space across a print bed by using an ensemble of scanning grids.

8. The method of claim 7 , wherein the ensemble of scanning grids is either integrated into a field emission array or constructed separately and assembled into a system.

9. The method of claim 7 , wherein the scanning of the electron beam pattern comprises optically activating the ensemble of scanning grids through inclusion of photoconductors that are activated by optical control beams allowing for individual field emitters or groups therein to be scanned up to three dimensions across the print bed as a three-dimensional (3D) scanning electron beam.

10. The method of claim 9 , wherein the 3D scanning electron beam is positioned below a top surface of the powder bed to cause sub-surface melting.

11. The method of claim 2 , wherein the stimulating of the cathode unit comprises energizing the cathode unit by an electrical power system when the two-dimensional image is optically addressed.

12. The method of claim 6 , wherein the focusing of the electron beam pattern is by using imaging coils of an image relay system.

13. The method of claim 1 , wherein the positioning of the electron beam pattern is by using a deflection coil.

14. The method of claim 13 , wherein individual pixels of the electron beam pattern are scanned in up to three dimensions, in conjunction with global imaging positioning using a deflection coil.

15. The method of claim 1 , wherein the positioning of the electron beam pattern comprises positioning a patterned image in the electron beam pattern to a position on a powder bed of an additive manufacturing component.

16. An apparatus, comprising:
an cathode unit;
a projector configured to apply a pattern on the cathode unit, wherein the cathode unit is optically addressable by the applied pattern;
an electricity power system configured to stimulate the cathode unit to emit an electron beam pattern according to the applied pattern;
an image relay system configured to focus the electron beam pattern; and
a deflection coil configured to position a patterned image in the focused electron beam pattern to a desired position.

17. The apparatus of claim 16 , wherein, in stimulating the cathode unit, the electrical power system is configured to energize the cathode unit when the cathode unit is optically addressed by a two-dimensional image.

18. The apparatus of claim 16 , wherein, in focusing the electron beam pattern, the image relay system is configured to focus the electron beam pattern using imaging coils of the image relay system.

19. The apparatus of claim 16 , further comprising:
an additive manufacturing component having a powder bed configured to hold one or more powdered materials thereon,
wherein, in positioning the patterned image in the focused electron beam pattern to the desired position, the deflection coil is configured to position the patterned image to a position on the powder bed of the additive manufacturing component.

Assignees

• Seurat Tech Inc

Inventors

• Demuth James A
• Toomre Erik
• Leard Francis L
• Kamshad Kourosh
• Fees Heiner
• Berdichevsky Eugene

Classifications

• B29C64/245

  Platforms or substrates (support structures intended to be sacrificed after manufacture B29C64/40) · CPC title

• B33Y10/00

  Processes of additive manufacturing · CPC title

• B29C64/286

  Optical filters, e.g. masks · CPC title

• B33Y30/00

  Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title

• B29C64/268

  using laser beams; using electron beams [EB] · CPC title