Gas flow control valve and mounting method for gas flow control valve

US12098783B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12098783-B2
Application numberUS-202117999722-A
CountryUS
Kind codeB2
Filing dateMay 20, 2021
Priority dateMay 25, 2020
Publication dateSep 24, 2024
Grant dateSep 24, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A cylinder porous cylinder, a gas flow control valve, and a mounting method for the gas flow control valve. The porous cylinder ( 1 ) includes a plurality of pipe bundles filled inside the pipe. A single flow passage is formed in each of the pipe bundles, such that a seepage passage is formed inside the pipe. The inner diameter, length and permeability of the pipe bundle are determined in advance based on a Reynolds number smaller than 2300. The porous cylinder ( 1 ) is capable of implementing a stable gas flow in a gas injection channel. The valve body ( 21 ) of the gas flow control valve ( 2 ) is provided therein with a plurality of tubular passages arranged in sequence along the horizontal direction of the valve body. The tubular passages include a pipe flow passage ( 24 ) and a plurality of seepage passages ( 25 ). The porous cylinder ( 1 ) is mounted in each of the seepage passages ( 25 ). A plurality of connection channels ( 221 ) are provided in the valve cap. One end of each of the connection channels ( 221 ) communicates with the interior of each of the tubular passages, and the other end of each of the connection channels ( 221 ) is provided respectively with a valve stem. The opening and closing of the plurality of tubular passages are controlled by the valve stem, thus regulating the output ratio of the injected gas. In addition, a mounting method for the gas flow control valve is further provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas flow control valve, comprising a tubular valve body, two valve caps respectively provided at both ends of the valve body, and two flanges respectively provided at both ends of the valve body; wherein one side of the flange is communicated with the gas injection channel, and the other side of the flange is connected to the valve cap; the valve body is provided therein with a plurality of tubular passages arranged in sequence along the horizontal direction of the valve body, and the tubular passages comprises a pipe flow passage and a plurality of mounting passages; a porous cylinder with a porous structure is mounted in each of the mounting passages, and an interior of the porous cylinder forms a seepage passage for stable seepage flow of gas, wherein a Reynolds number for characterizing the flow state of the gas flowing through the seepage passage is a positive number smaller than 2300; a plurality of connection channels are provided in the valve cap, one end of each of the connection channels communicates with an interior of each of the tubular passages, and the other end of each of the connection channels is provided respectively with a valve stem, such that the gas in the gas injection channel flows through the connection channel corresponding to the valve stem in an open state, and flows into the tubular passage communicating with the connection channel. 2. The gas flow control valve according to claim 1 , wherein there are two porous cylinders, an interior of one of which forms a first seepage passage and an interior of the other of which forms a second seepage passage. 3. The gas flow control valve according to claim 2 , wherein the valve body is provided therein with a first mounting passage and a second mounting passage, and the two porous cylinders are mounted in the first mounting passage and the second mounting passage, respectively; a communication hole is provided between the first mounting passage and the second mounting passage; a pressure measuring hole is provided between the second mounting passage and the valve body, and a pressurization and depressurization hole is provided between the second mounting passage and the valve body. 4. The gas flow control valve according to claim 3 , further comprising a pressure gauge and a pressurizer which are provided on an outer surface of the valve body; wherein the pressure gauge is connected to the pressure measuring hole, and the pressurizer is connected to the pressurization and depressurization hole. 5. The gas flow control valve according to claim 1 , wherein a sealing ring is provided at the connection between a port of the valve body and the valve cap. 6. The gas flow control valve according to claim 1 , wherein a rubber cylinder arranged in the length direction of the mounting passage is provided in the mounting passage, and a sealing ring is provided between the rubber cylinder and inner surfaces of both ports of the mounting passage, such that a confining pressure annulus is formed between the rubber cylinder and an inner surface of the mounting passage; the rubber cylinder is provided therein with supporting short pipes respectively close to two ports of the mounting passage; the porous cylinder is connected between the two supporting short pipes. 7. The gas flow control valve according to claim 6 , wherein a sealing circle is provided on a side of the sealing ring that is close to the port of the mounting passage. 8. A mounting method for a gas flow control valve according to claim 1 , comprising: mounting the porous cylinders in mounting passages of the flow control valve, respectively; mounting valve caps provided with the flanges in advance on both sides of the valve body, respectively; and fixedly connecting the flanges with the gas injection channel. 9. The mounting method for a gas flow control valve according to claim 8 , wherein mounting the porous cylinders in mounting passages of the flow control valve, respectively, comprises: mounting each of the porous cylinders in a rubber cylinder; providing supporting short pipes in gaps between the porous cylinders and ports of the rubber cylinder; mounting sealing rings on both sides of the rubber cylinder, respectively; and mounting the rubber cylinder into the mounting passage. 10. The mounting method for a gas flow control valve according to claim 9 , wherein after mounting valve caps provided with the flanges in advance on both sides of the valve body respectively, the mounting method further comprises: providing a pressure gauge for measuring the mounting passage and a pressurizer for pressurizing or depressurizing the plurality of mounting passages on an outer surface of the valve body; controlling the pressurizer to apply pressure such that gas is filled in a confining pressure annulus formed between the rubber cylinder and the inner surface of the mounting passage.

Assignees

Inventors

Classifications

  • Injecting a gaseous medium; Injecting a gaseous medium and a liquid medium (CO2 injection E21B43/164; steam injection E21B43/24) · CPC title

  • E21B34/02Primary

    in well heads · CPC title

  • using an element with multiple tubes · CPC title

  • Guiding yokes for spindles; Means for closing housings; Dust caps, e.g. for tyre valves · CPC title

  • in pipes or conduits · CPC title

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What does patent US12098783B2 cover?
A cylinder porous cylinder, a gas flow control valve, and a mounting method for the gas flow control valve. The porous cylinder ( 1 ) includes a plurality of pipe bundles filled inside the pipe. A single flow passage is formed in each of the pipe bundles, such that a seepage passage is formed inside the pipe. The inner diameter, length and permeability of the pipe bundle are determined in advan…
Who is the assignee on this patent?
Petrochina Co Ltd
What technology area does this patent fall under?
Primary CPC classification E21B34/02. Mapped technology areas include Fixed Constructions.
When was this patent published?
Publication date Tue Sep 24 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).