Process of removing microorganism from an article of clothing

Patent metadata

Field	Value
Publication number	US-12091643-B2
Application number	US-202117520935-A
Country	US
Kind code	B2
Filing date	Nov 8, 2021
Priority date	Dec 23, 2020
Publication date	Sep 17, 2024
Grant date	Sep 17, 2024

Abstract

A process of removing microorganism from an article of clothing is provided in which the process comprises the steps of a) providing an article of clothing in a washing machine; and b) contacting the article of clothing during a wash sub-cycle of the washing machine with a liquid detergent composition comprising a surfactant system and an organic acid, wherein the composition has a neat pH of from 1.5 to 5.0.

First claim

What is claimed is:

1. A process of removing microorganism from an article of clothing comprising the steps of:
a) providing an article of clothing in a washing machine; and
b) contacting said article of clothing during a wash sub-cycle of said washing machine with a liquid detergent composition comprising
from 15% to 60% by weight of the composition of a surfactant system comprising an anionic surfactant and a nonionic surfactant,
from 7% to 40% by weight of the composition of an organic acid, wherein the organic acid comprises citric acid, and
from 0.05% to 1% by weight of the composition of an anti-microbial agent, wherein the anti-microbial agent is 4-4′-dichloro-2-hydroxy diphenyl ether, and

wherein the composition has a neat pH of from 1.5 to 3.5.

2. The process according to claim 1 , wherein the composition has a neat pH of from 1.6 to 3.5.

3. The process according to claim 1 , wherein through-the-wash (TTW) pH during the wash sub-cycle is from 2.5 to 6.0.

4. The process according to claim 1 , wherein the composition comprises from 7% to 30% by weight of the composition of the organic acid.

5. The process according to claim 1 , wherein the composition comprises from 15% to 50% by weight of the composition of the surfactant system.

6. The process according to claim 1 , wherein the nonionic surfactant is selected from the group consisting of alkyl alkoxylated alcohols, alkyl alkoxylated phenols, alkyl polysaccharides, polyhydroxy fatty acid amides, alkoxylated fatty acid esters, sucrose esters, sorbitan esters and alkoxylated derivatives of sorbitan esters, and any combinations thereof;
wherein the ratio of anionic surfactant to nonionic surfactant is between 0.01 and 100.

7. The process according to claim 5 , wherein the anionic surfactant is present as the main surfactant, preferably as the majority surfactant, in the composition.

8. The process according to claim 5 , wherein the nonionic surfactant is present as the main surfactant in the composition, and the nonionic surfactant comprises C 6 -C 20 alkoxylated alcohol.

9. The process according to claim 1 , wherein the composition further comprises from 0.1% to 5% by weight of the composition of an amphoteric surfactant.

10. The process according to claim 1 , wherein the composition further comprises from 0.1% to 10% by weight of the composition of a polyamine.

11. The process according to claim 1 , wherein the composition further comprises from 0.1% to 5% by weight of the composition of a chelating agent.

12. The process according to claim 1 , wherein the composition comprises:
1) from 15% to 30% by weight of the composition of the surfactant system comprising an anionic surfactant and a nonionic surfactant with a weight ratio of the anionic surfactant to the nonionic surfactant between 0.3 and 1.2 in which the nonionic surfactant comprises C 12 -C 18 alkyl ethoxylate;
2) from 7% to 18% by weight of the composition of a citric acid; and
3) from 0.05% to 0.5% by weight of the composition, of 4-4′-dichloro-2-hydroxy diphenyl ether,
wherein the composition has a neat pH of from 1.9 to 3.1.

13. The process according to claim 1 , further comprising:
c) providing a rinse composition comprising from 10% to 40% by weight of the composition of an organic acid, wherein the rinse composition has a neat pH of from 1.5 to 4.0; and
d) contacting said article of clothing during a rinse sub-cycle of said washing machine with said rinse composition.

14. A process of removing biofilm from a biofilm-affected surface comprising contacting said biofilm-affected surface with a liquid detergent composition comprising
from 15% to 60% by weight of the composition of a surfactant system comprising an anionic surfactant and a nonionic surfactant,
from 10% to 40% by weight of the composition of an organic acid, wherein the organic acid comprises citric acid, and
from 0.05% to 1% by weight of the composition of an anti-microbial agent, wherein the anti-microbial agent is 4-4′-dichloro-2-hydroxy diphenyl ether, and

wherein the composition has a neat pH of from about 2.4 to 2.6.

Assignees

• Procter & Gamble

Inventors

• Huang Haiyan
• Ohtani Ryohei
• Cao Yijia
• Liu Yuxiang

Classifications

• C11D2111/12

  Soft surfaces, e.g. textile · CPC title

• C11D3/0047

  pH regulated compositions · CPC title

• C11D3/3723

  Polyamines or polyalkyleneimines · CPC title

• C11D3/2086

  Hydroxy carboxylic acids-salts thereof · CPC title

• C11D3/2082

  Polycarboxylic acids-salts thereof · CPC title