Tailored laser pulse trains for burst-mode illumination

Patent metadata

Field	Value
Publication number	US-12088054-B2
Application number	US-202217981738-A
Country	US
Kind code	B2
Filing date	Nov 7, 2022
Priority date	May 13, 2020
Publication date	Sep 10, 2024
Grant date	Sep 10, 2024

Abstract

A laser system may include one or more seed lasers to generate a pulsed seed beam. The system may further include a pulse pattern generator to generate an intermediate patterned burst-mode beam from at least one laser pulse from the pulsed seed beam, where the intermediate patterned burst-mode beam includes one or more pulse bursts, and where each of the one or more pulse bursts includes a series of laser pulses with a selected pattern of inter-pulse spacings. The system may further include two or more power amplifiers to amplify the intermediate patterned burst-mode beam to form an amplified patterned burst-mode beam, where at least two of the power amplifiers amplify different portions of the intermediate patterned burst-mode beam, and where the amplified patterned burst-mode beam includes a series of amplified pulse bursts including amplified laser pulses with the selected pattern of inter-pulse spacings.

First claim

What is claimed is:

1. A laser system comprising:
one or more seed lasers configured to generate a pulsed seed beam including one or more laser pulses;
a pulse pattern generator to generate an intermediate patterned burst-mode beam from at least one laser pulse from the pulsed seed beam, wherein the pulse pattern generator includes one or more beam-splitters to split the at least one laser pulse from the pulsed seed beam along two or more delay paths and one or more beam combiners to combine light along the two or more delay paths to a common optical path, wherein the intermediate patterned burst-mode beam includes one or more pulse bursts, wherein each of the one or more pulse bursts includes a series of laser pulses with a selected pattern of inter-pulse spacings associated with the two or more delay paths; and
two or more power amplifiers to amplify the series of laser pulses in the intermediate patterned burst-mode beam to form an amplified patterned burst-mode beam, wherein at least two of the two or more power amplifiers amplify different portions of the intermediate patterned burst-mode beam, wherein the amplified patterned burst-mode beam includes a series of amplified pulse bursts including amplified laser pulses with the selected pattern of inter-pulse spacings.

2. The laser system of claim 1 , wherein gain characteristics of the at least two of the two or more power amplifiers are tailored for the different portions of the intermediate patterned burst-mode beam.

3. The laser system of claim 1 , wherein the series of amplified laser pulses in the amplified patterned burst-mode beam have a selected pattern of pulse energies.

4. The laser system of claim 3 , wherein the pulse pattern generator further includes one or more intensity filters in at least one of the two or more delay paths to provide the intermediate patterned burst-mode beam with a scaled version of the selected pattern of pulse energies, wherein the two or more power amplifiers provide uniform amplification of the intermediate patterned burst-mode beam.

5. The laser system of claim 3 , wherein the two or more power amplifiers provide a non-uniform amplification of the intermediate patterned burst-mode beam to generate the selected pattern of pulse energies in the amplified patterned burst-mode beam.

6. The laser system of claim 3 , wherein at least one of the two or more power amplifiers is configured to provide temporally-controlled gain of the amplified patterned burst-mode beam.

7. The laser system of claim 1 , wherein a gain profile through at least one of the two or more power amplifiers reduces a variation of at least one beam parameter for different amplified laser pulses in the amplified patterned burst-mode beam associated with different delay paths of the two or more delay paths relative to laser pulses in the intermediate patterned burst-mode beam.

8. The laser system of claim 7 , wherein the at least one beam parameter comprises:
at least one of a pointing direction, a spot size, or a divergence.

9. The laser system of claim 1 , wherein the one or more laser pulses of the pulsed seed beam are provided at a seed repetition rate, wherein the pulse pattern generator comprises:
an envelope shaper to form the intermediate patterned burst-mode beam.

10. The laser system of claim 9 , wherein the envelope shaper comprises:
at least one of a pulse picker, a pulse carver, or a pulse shaper.

11. The laser system of claim 9 , wherein at least one of the one or more seed lasers comprise:
an oscillator configured to generate the pulsed seed beam at the seed repetition rate.

12. The laser system of claim 9 , wherein at least one of the one or more seed lasers comprise:
a pulsed laser configured to generate the pulsed seed beam at a fraction of the seed repetition rate; and
a pulse multiplier including one or more beamsplitters and one or more beam combiners to provide the pulsed seed beam at the seed repetition rate.

13. The laser system of claim 9 , wherein the pulse pattern generator further comprises:
one or more beamsplitters to split the pulsed seed beam into two or more delay paths; and
one or more beam combiners to combine portions of the pulsed seed beam in the two or more delay paths into a common coaxial path to form the amplified patterned burst-mode beam.

14. The laser system of claim 13 , wherein the two or more delay paths in the pulse pattern generator have different path lengths such that the amplified patterned burst-mode beam includes two or more temporally-offset pulse trains.

15. The laser system of claim 1 , wherein the pulse pattern generator includes a pulse multiplier to provide a train of laser pulses having a multiple of a repetition rate of at least one of the one or more seed lasers.

16. The laser system of claim 1 , wherein the pulsed seed beam includes a single pulse picked from the one or more seed lasers.

17. The laser system of claim 16 , wherein the pulse pattern generator further comprises:
one or more beamsplitters to split the pulsed seed beam into two or more delay paths; and
one or more beam combiners to combine portions of the pulsed seed beam in the two or more delay paths into the intermediate patterned burst-mode beam, wherein the two or more delay paths in the pulse pattern generator have different path lengths, wherein the selected pattern of inter-pulse spacings is based on the different path lengths.

18. The laser system of claim 16 , wherein the pulse pattern generator further comprises:
a cavity to generate a train of pulses having an inter-pulse spacing based on a length of the cavity.

19. The laser system of claim 16 , wherein the pulse pattern generator further comprises:
an envelope shaper to form the intermediate patterned burst-mode beam.

20. The laser system of claim 19 , wherein the envelope shaper comprises:
at least one of a pulse picker, a pulse carver, or a pulse shaper.

21. The laser system of claim 1 , further comprising:
one or more pulse shapers to control an intensity of one or more of the amplified laser pulses in the amplified patterned burst-mode beam.

22. The laser system of claim 21 , wherein at least one of the one or more pulse shapers comprise:
at least one of an acousto-optical modulator, an electro-optical modulator, or a saturable absorber.

23. The laser system of claim 21 , wherein at least one of the one or more pulse shapers comprise:
one or more optical elements to introduce optical loss.

24. The laser system of claim 1 , further comprising:
a pulse stretcher located prior to at least one of the two or more power amplifiers; and
a pulse compressor located after the two or more power amplifiers.

25. The laser system of claim 1 , wherein at least one of the pulse pattern generator or the two or more power amplifiers are dynamically adjustable to adjust at least one of the selected pattern of inter-pulse spacings, a pattern of amplitudes of the laser pulses in the intermediate patterned burst-mode beam, a pattern of amplitudes of the amplified laser pulses in the amplified patterned burst-mode beam, or a number of the amplified laser pulses in a particular amplified pulse burst of the amplified patterned burst-mode beam.

26. The laser system of claim 25 , further comprising:
a controller communicatively coupled to at least one of the pulse pattern generator or the two or more power amplifiers, the controller includin

Assignees

• Univ Central Florida Res Found Inc

Inventors

• Richardson Martin
• Bernath Robert
• Bodnar Nathan
• Kerrigan Haley
• Reyes Danielle
• Thul Daniel
• Pena Jessica

Classifications

• H01S3/2308

  Amplifier arrangements, e.g. MOPA · CPC title

• H01S3/10084

  Frequency control by seeding · CPC title

• H01S3/10023

  by functional association of additional optical elements, e.g. filters, gratings, reflectors · CPC title

• H01S3/0014

  Monitoring arrangements not otherwise provided for (photometry G01J1/00, e.g. G01J1/4257; radiation pyrometry G01J5/00; measuring coherence of light G01J9/00; measuring wavelength of light G01J9/00, e.g. G01J9/0246; measuring optical pulses G01J11/00; calorimetrically measuring power of laser beams G01K17/003) · CPC title

• H01S3/0092

  Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity (nonlinear frequency conversion per se G02F1/35) · CPC title