Vapor phase photoresists deposition

Patent metadata

Field	Value
Publication number	US-12084764-B2
Application number	US-202117351096-A
Country	US
Kind code	B2
Filing date	Jun 17, 2021
Priority date	Jul 1, 2020
Publication date	Sep 10, 2024
Grant date	Sep 10, 2024

Abstract

Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes. In an embodiment, the method for forming a photoresist layer over a substrate in a vacuum chamber comprises providing a metal precursor vapor into the vacuum chamber. In an embodiment, the method further comprises providing an oxidant vapor into the vacuum chamber, where a reaction between the metal precursor vapor and the oxidant vapor results in the formation of the photoresist layer on a surface of the substrate. In an embodiment, the photoresist layer is a metal oxo containing material.

First claim

What is claimed is:

1. A method of forming a photoresist layer over a substrate in a vacuum chamber, comprising:
providing a first metal precursor vapor into the vacuum chamber;
providing a first oxidant vapor into the vacuum chamber, wherein a reaction between the first metal precursor vapor and the first oxidant vapor results in the formation of the photoresist layer on a surface of the substrate, wherein the photoresist layer is a metal oxo containing material;
providing a second metal precursor vapor into the vacuum chamber, wherein the second metal precursor vapor is different than the first metal precursor vapor;
providing a second oxidant vapor into the vacuum chamber, wherein the second oxidant vapor is different than the first oxidant vapor, and wherein providing the second oxidant vapor or the first oxidant vapor into the vacuum chamber comprises providing the second oxidant vapor or the first oxidant vapor together with an oxygen-containing gas, the oxygen-containing gas different than the corresponding one of the second oxidant vapor or the first oxidant vapor, wherein the oxygen-containing gas comprises acrylic acid, and wherein the corresponding one of the second oxidant vapor or the first oxidant vapor comprises a glycol; and
alternating between (i) providing the first metal precursor vapor and the first oxidant vapor into the chamber, and (ii) providing the second metal precursor vapor and the second oxidant vapor into the chamber.

2. The method of claim 1 , wherein the first metal precursor vapor and the first oxidant vapor are provided to the vacuum chamber at the same time.

3. The method of claim 1 , wherein a pulse of the first metal precursor vapor is provided to the vacuum chamber, and a pulse of the first oxidant vapor is provided to the vacuum chamber after the pulse of the first metal precursor vapor.

4. The method of claim 3 , further comprising:
repeating alternating pulses of the first metal precursor vapor and the first oxidant vapor.

5. The method of claim 1 , further comprising:
striking a plasma in the vacuum chamber during one or both of providing the first metal precursor vapor into the vacuum chamber and providing the first oxidant vapor into the vacuum chamber.

6. The method of claim 1 , further comprising:
treating the photoresist layer with a plasma.

7. The method of claim 6 , further comprising:
flowing a hydrocarbon to the chamber during plasma assisted deposition.

8. The method of claim 1 , wherein the first metal precursor vapor comprises one or more of Sn, Hf, Zr, Co, Cr, Mn, Fe, Cu, Ni, Mo, W, Ta, Os, Re, Pd, Pt, Ti, V, In, Sb, Al, As, Ge, Se, Cd, Ag, Pb, Au, Er, Yb, Pr, La, Na, and Mg.

9. A method of forming a photoresist layer stack over a substrate in a vacuum chamber, comprising:
initiating a deposition cycle, wherein the deposition cycle comprises:
providing a first metal precursor vapor into the vacuum chamber, wherein the first metal precursor vapor absorbs to a surface over the substrate;
purging the vacuum chamber;
providing a first oxidant vapor into the vacuum chamber, wherein a reaction between the first metal precursor absorbed to the surface over the substrate and the first oxidant vapor results in the formation of a first photoresist layer over the surface of the substrate, wherein the first photoresist layer is a metal oxo containing material;
purging the vacuum chamber;
providing a second metal precursor vapor into the vacuum chamber, wherein the second metal precursor vapor is different than the first metal precursor vapor;
purging the vacuum chamber;
providing a second oxidant vapor into the vacuum chamber, wherein the second oxidant vapor is different than the first oxidant vapor, wherein a reaction between the second metal precursor and the second oxidant vapor results in the formation of a second photoresist layer over the surface of the first photoresist layer, wherein the second photoresist layer is a metal oxo containing material, and wherein providing the second oxidant vapor or the first oxidant vapor into the vacuum chamber comprises providing the second oxidant vapor or the first oxidant vapor together with an oxygen-containing gas, the oxygen-containing gas different than the corresponding one of the second oxidant vapor or the first oxidant vapor, wherein the oxygen-containing gas comprises acrylic acid, and wherein the corresponding one of the second oxidant vapor or the first oxidant vapor comprises a glycol.

10. The method of claim 9 , further comprising:
repeating the deposition cycle a plurality of times.

11. The method of claim 10 , wherein the deposition cycle further comprises:
treating the first photoresist layer and/or the second photoresist layer with a plasma.

12. The method of claim 10 , further comprising:
treating the photoresist layer stack with a plasma after repeating the deposition cycle the plurality of times.

13. The method of claim 9 , further comprising:
striking a plasma in the vacuum chamber during the deposition cycle.

14. The method of claim 9 , wherein the first metal precursor vapor comprises one or more of Sn, Hf, Zr, Co, Cr, Mn, Fe, Cu, Ni, Mo, W, Ta, Os, Re, Pd, Pt, Ti, V, In, Sb, Al, As, Ge, Se, Cd, Ag, Pb, Au, Er, Yb, Pr, La, Na, and Mg.

Assignees

• Applied Materials Inc

Inventors

• Kalutarage Lakmal Charidu
• Dangerfield Aaron
• Saly Mark Joseph
• Thompson David Michael
• Singha Roy Susmit
• Freed Regina

Classifications

• C23C16/45529

  specially adapted for making a layer stack of alternating different compositions or gradient compositions · CPC title

• C23C16/45527

  characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations · CPC title

• G03F7/167 Primary

  from the gas phase, by plasma deposition (G03F7/2035 takes precedence) · CPC title

• C23C16/40

  Oxides · CPC title

• C23C16/45536

  Use of plasma, radiation or electromagnetic fields · CPC title