High purity 2-naphthylacetonitrile and method for producing same

Patent metadata

Field	Value
Publication number	US-12084404-B2
Application number	US-202217824393-A
Country	US
Kind code	B2
Filing date	May 25, 2022
Priority date	Oct 29, 2019
Publication date	Sep 10, 2024
Grant date	Sep 10, 2024

Abstract

The present invention provides high purity 2-naphthylacetonitrile with fewer impurities that is useful as a starting material or intermediate for the synthesis of various pharmaceutical products, agricultural chemicals, and chemical products, and a production method thereof. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, and containing naphthalene compounds represented by the formulas (a)-(j) at a content of a predetermined area % or below. A method for producing high purity 2-naphthylacetonitrile, including the following step 1 and step 2: step 1: a step of subjecting 2′-acetonaphthone to a Willgerodt reaction in the presence of an additive where necessary, and hydrolyzing the obtained amide compound to give 2-naphthylacetic acid; step 2: a step of reacting the 2-naphthylacetic acid obtained in step 1, a halogenating agent and sulfamide in the presence of a catalyst as necessary in an organic solvent to give 2-naphthylacetonitrile.

First claim

The invention claimed is:

1. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, comprising one or more kinds selected from the naphthalene compounds represented by the following formulas (a)-(i) as impurities in an amount greater than zero and a content of each naphthalene compound is as follows:
(a)

 not more than 0.3 area %
(b)

 not more than 0.1 area %
(c)

 not more than 1 area %
(d)

 not more than 0.1 area %
(e)

 not more than 0.05 area %
(f)

 not more than 0.05 area %
(g)

 not more than 0.1 area %
(h)

 not more than 0.05 area %
(i)

 not more than 0.05 area %.

2. The high purity 2-naphthylacetonitrile according to claim 1 , comprising one or more kinds selected from the naphthalene compounds represented by the following formulas (a)-(d) as impurities, wherein the content of each naphthalene compound is as follows:
(a)

 not more than 0.3 area %
(b)

 not more than 0.1 area %
(c)

 not more than 1 area %
(d)

 not more than 0.1 area %.

3. The high purity 2-naphthylacetonitrile according to claim 1 , comprising the naphthalene compound represented by the following formula (c) as impurity, wherein the content of the naphthalene compound represented by the following formula (c) is not more than 1 area %:

Assignees

• Api Corp

Inventors

• Nagahama Masaki
• Okado Daiki
• Taniike Hirotsugu

Classifications

• C07C303/34

  of amides of sulfuric acids · CPC title

• C07C255/33 Primary

  with cyano groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by saturated carbon chains · CPC title

• C07C253/34 Primary

  Separation; Purification · CPC title

• C07C253/00

  Preparation of carboxylic acid nitriles (of cyanogen or compounds thereof C01C3/00) · CPC title

• C07D295/194

  Radicals derived from thio- or thiono carboxylic acids · CPC title