Master, transfer copy, and method for manufacturing master

Patent metadata

Field	Value
Publication number	US-12083713-B2
Application number	US-202318106749-A
Country	US
Kind code	B2
Filing date	Feb 7, 2023
Priority date	Sep 16, 2016
Publication date	Sep 10, 2024
Grant date	Sep 10, 2024

Abstract

There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.

First claim

The invention claimed is:

1. A master comprising:
a substrate with a hollow cylindrical shape or cylindrical shape; and
a concave-convex structure on an outer peripheral surface of the substrate,
wherein the concave-convex structure has concavities or convexities continuously arranged in a spiral shape in a circumferential direction of the substrate at a dot pitch equal to or less than a wavelength of a visible light band, and
the concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate,
wherein the master is made by a method comprising:
a step of sharing a reference clock between a plurality of signal generating circuits, and generating a rotation control signal and an exposure signal in the plurality of respective signal generating circuits; and
a step of forming a pattern on an outer peripheral surface of the substrate by rotating the substrate about a central axis of the substrate on a basis of the rotation control signal and irradiating the outer peripheral surface of the substrate with a laser beam on a basis of the exposure signal while performing scanning in an axial direction of the substrate,
wherein a frequency of the rotation control signal is not an integral multiple of a frequency of the exposure signal, and wherein the phase of the exposure signal is inverted by 180° for each rotation.

2. The master according to claim 1 , wherein the concave-convex structure does not have a blank region where the concavities or convexities are not formed in the axial direction of the substrate.

3. The master according to claim 2 , wherein the concave-convex structure has the concavities or convexities continuously and uninterruptedly arranged in the spiral shape on the outer peripheral surface of the substrate at the dot pitch, such that the concave-convex structure does not have the blank region for each round of the spiral arrangement.

4. The master according to claim 1 , wherein the concave-convex structure does not have a blank region where the concavities or convexities are not formed in the axial direction of the substrate, or an error region where concavities or convexities are formed in an arrangement different from the arrangement of the concavities or convexities.

5. The master according to claim 4 , wherein the concave-convex structure has the concavities or convexities continuously and uninterruptedly arranged in the spiral shape on the outer peripheral surface of the substrate at the dot pitch, such that the concave-convex structure does not have the blank region or the error region for each round of the spiral arrangement.

6. The master according to according to claim 1 , wherein the concave-convex structure has the concavities or convexities arranged in a hexagonal lattice at the dot pitch and a track pitch equal to or less than the wavelength of the visible light band on the outer peripheral surface of the substrate.

7. The master according to according to claim 6 , wherein the dot pitch and the track pitch are equal to or more than 100 nm and equal to or less than 350 nm.

8. The master according to according to claim 1 , wherein at least the outer peripheral surface of the substrate includes a glass material.

9. The master according to according to claim 1 , wherein in the method of making the master, in one rotation of the substrate, a number of pulses from the rotation control signal is an integer, and a number of pulses from the exposure signal is not an integer.

10. A transfer copy obtained by transferring a concave-convex structure on an outer peripheral surface of the master according to claim 1 to a sheet-shaped substrate with the master.

Assignees

• Dexerials Corp

Inventors

• Muramoto Yutaka
• Kikuchi Masanao

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• B29C59/046 Primary

  for layered or coated substantially flat surfaces · CPC title

• B29C2059/023

  Microembossing · CPC title

• B29C2035/0827

  using UV radiation · CPC title

• G03F7/00

  Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) · CPC title