Active gas generation apparatus

US12074012B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12074012-B2
Application numberUS-202017789793-A
CountryUS
Kind codeB2
Filing dateDec 7, 2020
Priority dateDec 7, 2020
Publication dateAug 27, 2024
Grant dateAug 27, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An active gas generation apparatus according to the present disclosure includes: a base flange having a central bottom surface region and a peripheral protruding part; a cooling plate provided on the peripheral protruding part of the base flange; an insulating plate provided between the cooling plate and the high voltage apply electrode part; and an electrode holding member provided on a lower surface of the cooling plate to support the high voltage apply electrode part from a lower side. Provided is a gas separation structure of separating a gas flow between an in-housing space and a discharge space by the cooling plate, the electrode holding member, and the high voltage apply electrode part.

First claim

Opening claim text (preview).

The invention claimed is: 1. An active gas generation apparatus generating active gas obtained by activating material gas supplied to a discharge space, comprising: a first electrode constituting part; and a second electrode constituting part provided on a lower side of said first electrode constituting part, wherein said first electrode constituting part includes a first electrode dielectric film and a first metal electrode formed on an upper surface of said first electrode dielectric film, said second electrode constituting part includes a second electrode dielectric film and a second metal electrode formed on a lower surface of said second electrode dielectric film, AC voltage is applied to said first metal electrode, said second metal electrode is set to ground potential, and a dielectric space where said first and second electrode dielectric films face each other includes a region where said first and second metal electrodes overlap with each other in a plan view as said discharge space, said second electrode dielectric film includes a gas ejection hole for ejecting said active gas to a lower side of said active gas generation apparatus, said active gas generation apparatus further comprising a base flange having conductivity, having a cross-section structure with a concave shape, and including a central bottom surface region and a peripheral protruding part provided along an outer periphery of said central bottom surface region to protrude in a height direction, wherein said second electrode constituting part is provided so that said second metal electrode has contact with said central bottom surface region, said active gas generation apparatus further comprising: a cooling plate provided on the peripheral protruding part of the base flange and located above an upper side of said first electrode constituting part without contact with said first electrode constituting part; an insulating material provided between said cooling plate and said first electrode constituting part, having an upper surface having contact with a lower surface of said cooling plate, and having a lower surface having contact with the upper surface of said first metal electrode; an electrode support member provided on the lower surface of said cooling plate to support said first electrode constituting part from a lower side of said first electrode constituting part; and a metal housing provided on said peripheral protruding part of said base flange and having an in-housing space housing said cooling plate, wherein said base flange includes: a gas supply port receiving said material gas from outside said active gas generation apparatus; a gas transmission path for supplying said material gas to said discharge space; a cooling medium supply port receiving a cooling medium from outside said active gas generation apparatus; a cooling medium transmission hole for supplying said cooling medium to said cooling plate; and a base flange gas ejection hole for ejecting said active gas ejected from said gas ejection hole to said lower side of said active gas generation apparatus; ground potential is supplied to said base flange, said cooling plate includes a cooling medium path transmitting said cooling medium supplied through said cooling medium transmission hole to an inner portion of said cooling plate, and a gas separation structure of separating a gas flow between said in-housing space and said discharge space by said cooling plate is provided based on said cooling plate, said electrode support member, and said first electrode constituting part. 2. The active gas generation apparatus according to claim 1 , wherein said base flange includes: a gas relay region connected to said discharge space; a gas internal flow path with a groove structure connected to said gas transmission path, formed into an annular shape surrounding said gas relay region; and a gas diffusion path provided between said gas internal flow path and said gas relay region, wherein said material gas flows from said gas internal flow path to said gas relay region through said gas diffusion path, and said gas diffusion path is formed with a dimension so that pressure in said gas internal flow path is higher than pressure in said gas relay region. 3. The active gas generation apparatus according to claim 2 , wherein said discharge space is formed into an annular shape in an inner side of said gas internal flow path via said gas relay region, said gas ejection hole is provided in an inner side of said discharge space, said gas diffusion path includes a plurality of gas diffusion paths, and said plurality of gas diffusion paths are provided at regular intervals along a formation direction of said gas internal flow path. 4. The active gas generation apparatus according to claim 3 , wherein a center position of said gas internal flow path having an annular shape is defined as a virtual center point, and with regard to a diffusion path formation direction of each of said plurality of gas diffusion paths, a path angle of said diffusion path formation direction with a virtual center line is set within a range of 30° to 60°, the virtual center line is a line from a connection position between each of said plurality of gas diffusion paths and said gas internal flow path toward said virtual center point. 5. The active gas generation apparatus according to claim 1 , wherein said insulating material is a plate-like insulating plate, and said insulating plate includes a region overlapping with said cooling medium path of said cooling plate in a plan view.

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What does patent US12074012B2 cover?
An active gas generation apparatus according to the present disclosure includes: a base flange having a central bottom surface region and a peripheral protruding part; a cooling plate provided on the peripheral protruding part of the base flange; an insulating plate provided between the cooling plate and the high voltage apply electrode part; and an electrode holding member provided on a lower …
Who is the assignee on this patent?
Toshiba Mitsubishi Electric Industrial Systems Corp, Tmeic Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/32348. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 27 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).