Thin film transistor substrate and display device using the same
US-2016372497-A1 · Dec 22, 2016 · US
US12068334B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12068334-B2 |
| Application number | US-202017039474-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 30, 2020 |
| Priority date | Nov 6, 2019 |
| Publication date | Aug 20, 2024 |
| Grant date | Aug 20, 2024 |
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According to some embodiments of the present disclosure, a display device includes an active pattern including a metal oxide, a gate electrode overlapping the active pattern, a first capacitor electrode spaced apart from the active pattern and including a conductive oxide, and a second capacitor electrode on the first capacitor electrode.
Opening claim text (preview).
What is claimed is: 1. A display device comprising: an active pattern disposed on a base substrate and including a metal oxide; a gate electrode overlapping the active pattern; a first capacitor electrode including a conductive oxide; a dummy semiconductor pattern between the first capacitor electrode and a planarized upper surface of the base substrate that faces the dummy semiconductor pattern and having a conductivity different from a conductivity of the first capacitor electrode, wherein an entire portion of a lower surface of the first capacitor electrode directly contacts an upper surface of the dummy semiconductor pattern without an intervening layer between the entire portion of the lower surface of the first capacitor electrode and the upper surface of the dummy semiconductor pattern; an insulation layer disposed on the active pattern and the dummy semiconductor pattern, the insulation layer directly contacting a side surface of the active pattern and a side surface of the dummy semiconductor pattern; and a second capacitor electrode on the first capacitor electrode, the first capacitor electrode being between the dummy semiconductor pattern and the second capacitor electrode, wherein a thickness between a lower surface and the upper surface of the dummy semiconductor pattern is at least as great as a thickness between a lower surface and the upper surface of the active pattern. 2. The display device of claim 1 , wherein the metal oxide includes tin. 3. The display device of claim 2 , wherein the metal oxide includes tin and gallium. 4. The display device of claim 3 , wherein the metal oxide includes at least one selected from among the group consisting of indium tin gallium oxide, indium tin gallium zinc oxide, and tin aluminum gallium oxide. 5. The display device of claim 2 , wherein the conductive oxide includes indium and tin. 6. The display device of claim 1 , wherein the conductive oxide is crystalline. 7. The display device of claim 1 , further comprising: a gate insulation pattern between the active pattern and the gate electrode; and a dielectric pattern between the first capacitor electrode and the second capacitor electrode and formed from a same layer as the gate insulation pattern. 8. The display device of claim 1 , further comprising a connection line to transfer a constant voltage to the first capacitor electrode. 9. The display device of claim 8 , wherein the connection line extends over the second capacitor electrode to form a third capacitor electrode overlapping the second capacitor electrode. 10. The display device of claim 1 , wherein the second capacitor electrode is electrically connected to the gate electrode. 11. The display device of claim 1 , wherein the second capacitor electrode and the gate electrode are in a same pattern. 12. The display device of claim 1 , wherein the dummy semiconductor pattern comprises a same material as the active pattern comprises.
Interconnections, e.g. scanning lines · CPC title
comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO · CPC title
using masks, e.g. half-tone masks · CPC title
integrated with passive devices, e.g. auxiliary capacitors · CPC title
wherein the TFTs are in active matrices · CPC title
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