Photopolymerization reaction system including air injection module for preventing contamination of ultraviolet-transmitting plate

Patent metadata

Field	Value
Publication number	US-12065520-B2
Application number	US-201917251056-A
Country	US
Kind code	B2
Filing date	Sep 11, 2019
Priority date	Sep 14, 2018
Publication date	Aug 20, 2024
Grant date	Aug 20, 2024

Abstract

A photopolymerization reaction system according to an embodiment of the present disclosure may include: a housing; a UV lamp disposed within the housing; a UV light-transmitting plate disposed below the UV lamp; a ventilation part configured to receive supply and discharge therethrough of a first flow of air for heat removal from the UV lamp; and an air injection module configured to inject a second flow of air into the housing between the UV light-transmitting plate and the reactant, the air injection module being configured to prevent the UV light-transmitting plate from being contaminated by by-products generated by a photopolymerization reaction in which a reactant is supplied below the UV light-transmitting plate.

First claim

The invention claimed is:

1. A photopolymerization reaction system comprising:
a housing;
a UV lamp disposed within the housing;
a UV light-transmitting plate disposed below the UV lamp;
a frame accommodating the UV light-transmitting plate therein;
a substrate disposed below and spaced apart from the UV light-transmitting plate in a height direction of the frame such that a top surface of the substrate faces a bottom surface of the UV light-transmitting plate, the substrate oriented parallel to the UV light-transmitting plate such that a plate-shaped space extends between the substrate and the UV light-transmitting plate, the substrate disposed below the frame;
a ventilation part configured to receive supply and discharge therethrough of a first flow of air for heat removal from the UV lamp; and
an air injection module configured to inject a second flow of air into the housing between the UV light-transmitting plate and a reactant disposed on the top surface of the substrate, the second flow of air being a portion of the first flow of air, the air injection module configured to inject the second flow of air through the plate-shaped space in a width direction of the frame perpendicular to the height direction and parallel to the top surface of the substrate and the bottom surface of the UV light-transmitting plate, the air injection module being configured to prevent the UV light-transmitting plate from being contaminated by by-products generated by a photopolymerization reaction in which the reactant is disposed on the top surface of the substrate below the UV light-transmitting plate,
wherein the air injection module comprises:
a plurality of air holes each extending through upper and lower surfaces of one side of the frame in the height direction, the plurality of air holes being spaced apart from one another along a length direction of the frame perpendicular to the height direction and the width direction; and
a guide unit disposed below the plurality of air holes and configured to guide an injection direction of the second flow of air that is discharged through the plurality of air holes, so as to guide the second flow of air to be injected in the width direction from the one side of the frame to another side of the frame, the guide unit comprising a guide portion spaced apart in the height direction from the lower surface of the one side of the frame and extending parallel to the UV light-transmitting plate in the width direction from the one side of the frame to the another side of the frame.

2. The photopolymerization reaction system of claim 1 , wherein the guide unit comprises a deviation preventing portion connecting the guide portion to the lower surface of the one side of the frame so as to prevent the second flow of air from deviating from the guide portion in directions other than the direction in which the guide portion extends.

3. The photopolymerization reaction system of claim 1 , wherein the second flow of air is discharged from the photopolymerization reaction system from a location below the frame.

Assignees

• Lg Chemical Ltd

Inventors

• Kim Hyo Jung
• Min Kyung Hoon
• Joo Eun Jung
• Im Ye Hoon

Classifications

• C08F2/01 Primary

  characterised by special features of the polymerisation apparatus used · CPC title

• B01J2219/1203

  Incoherent waves · CPC title

• B01J2219/0869

  Feeding or evacuating the reactor · CPC title

• B01J2219/00164

  controlling the flow · CPC title

• B01J19/123 Primary

  Ultraviolet light · CPC title