Method and device for controlling stretching of mask, and stretching system

US12060633B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12060633-B2
Application numberUS-202017007909-A
CountryUS
Kind codeB2
Filing dateAug 31, 2020
Priority dateSep 20, 2019
Publication dateAug 13, 2024
Grant dateAug 13, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for controlling stretching of a mask includes: obtaining actual position information of at least one opening of the mask; determining an actual offset of each opening according to actual position information of the opening and preset position information of a light-emitting region of a sub-pixel corresponding to the opening; determining whether the actual offset of the opening is less than or equal to a theoretical maximum offset of the opening; and in response to determining that the actual offset of the opening is less than or equal to the theoretical maximum offset of the opening, generating a first end command for ending a process of stretching the mask.

First claim

Opening claim text (preview).

What is claimed is: 1. A stretching system, comprising a device for controlling a stretcher for stretching of a mask, and the stretcher; wherein the mask includes at least one patterned region, each of the at least one patterned region have a plurality of openings, and the device comprises: a memory configured to store executable program codes; a transceiver communicatively coupled to the stretcher; and a processor communicatively coupled to the memory and the transceiver, and the processor is configured to execute the executable program codes to: obtain actual position information of at least one opening of the mask; determine an actual offset of each of the at least one opening according to actual position information of the each opening and preset position information of a light-emitting region of a sub-pixel corresponding to the each opening; determine whether the actual offset of the each opening is less than or equal to a theoretical maximum offset of the each opening, wherein the theoretical maximum offset of the each opening is a minimum distance from a border of the light-emitting region to a border of the each opening in a case where a geometric center of the light-emitting region coincides with a geometric center of the each opening; and in response to determining that the actual offset of the each opening is less than or equal to the theoretical maximum offset of the each opening, generate a first end command for ending a process of stretching the mask; wherein the transceiver is configured to send the first end command to the stretcher, so that the stretcher ends the process of stretching the mask; and the processor is further configured to execute the executable program codes to: in response to determining that the actual offset of any one of the at least one opening is greater than a theoretical maximum offset of the one of the at least one opening, determine whether an actual geometric center of the one of the at least one opening is within a preset maximum offset region, wherein the preset maximum offset region is a region that allows a maximum offset of the actual geometric center of the one of the at least one opening; in response to determining that the actual geometric center of the one of the at least one opening is within the preset maximum offset region, generate a second end command for ending the process of stretching the mask; wherein the transceiver is further configured to send the second end command to the stretcher, so that the stretcher ends the process of stretching the mask; and in response to determining that the actual geometric center of the one of the at least one opening is not within the preset maximum offset region, generate an adjustment command for starting a parameter adjustment process for adjusting the stretching of the mask; wherein the transceiver is further configured to send the adjustment command to the stretcher, so that the stretcher starts the parameter adjustment process for adjusting the stretching of the mask; wherein the actual position information of the each opening includes coordinates of an actual geometric center of the each opening, and the preset position information of the light-emitting region includes coordinates of a preset geometric center of the light-emitting region; and the processor is further configured to execute the executable program codes to determine the actual offset of the each opening according to the coordinates of the actual geometric center of the each opening and the coordinates of the preset geometric center of the light-emitting region. 2. The stretching system according to claim 1 , wherein the processor is further configured to execute the executable program codes to: determine an offset function F(X m ) of the actual geometric center of the one of the at least one opening according to coordinates of the actual geometric center of the one of the at least one opening and coordinates of a preset geometric center of a corresponding light-emitting region, wherein an absolute value of X m is greater than an absolute value of X 0 , and is less than an absolute value of X 1 , one of X 0 and X 1 is an abscissa of the preset geometric center of the corresponding light-emitting region, and another is an abscissa of the actual geometric center of the one of the at least one opening; determine whether the offset function F(X m ) of the actual geometric center of the one of the at least one opening and a boundary function G(X n ) of the preset maximum offset region have a common solution (X, Y); in response to determining that the offset function F(X m ) and the boundary function G(X n ) have the common solution (X, Y), determine whether the X in the common solution is equal to one of X 0 and X 1 : in response to determining that the X in the common solution is equal to one of X 0 and X 1 , determine that the actual geometric center of the one of the at least one opening is within the preset maximum offset region; and in response to determining that the X in the common solution is not equal to one of X 0 and X 1 , determine that the actual geometric center of the one of the at least one opening is not within the preset maximum offset region; and in response to determining that the offset function F(X m ) and the boundary function G(X n ) do not have the common solution, determine that the actual geometric center of the one of the at least one opening is within the preset maximum offset region. 3. The stretching system according to claim 2 , wherein an expression of the offset function F(X m ) of the actual geometric center of the one of the at least one opening is: F ( X m ) = Y 1 - Y 0 X 1 - X 0 ⁢ X m + ( Y 1 - Y 1 - Y 0 X 1 - X 0 ⁢ X 1

Assignees

Inventors

Classifications

  • Optical field-shaping means, e.g. lenses · CPC title

  • for filtering or shielding light, e.g. multicolour filters for photodetectors · CPC title

  • using selective deposition, e.g. using a mask · CPC title

  • Controlling or regulating the coating process · CPC title

  • Vacuum evaporation · CPC title

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What does patent US12060633B2 cover?
A method for controlling stretching of a mask includes: obtaining actual position information of at least one opening of the mask; determining an actual offset of each opening according to actual position information of the opening and preset position information of a light-emitting region of a sub-pixel corresponding to the opening; determining whether the actual offset of the opening is less …
Who is the assignee on this patent?
Chengdu Boe Optoelect Tech Co, Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 13 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).