Process for reducing the content of boron compounds in halosilane-containing compositions

Patent metadata

Field	Value
Publication number	US-12060376-B2
Application number	US-201817294455-A
Country	US
Kind code	B2
Filing date	Dec 7, 2018
Priority date	Dec 7, 2018
Publication date	Aug 13, 2024
Grant date	Aug 13, 2024

Abstract

The content of boron compounds in a composition containing at least one halosilane is reduced by bringing the composition into contact with at least one phenylsilane and removing the at least one halosilane. The invention further relates to the use of phenylsilanes for removing boron compounds from halosilane-containing compositions.

First claim

The invention claimed is:

1. A method for purifying a composition containing at least one halosilane, comprising reducing a content of boron in the composition, by:
a) bringing the composition into contact with at least one phenylsilane,
b) removing the at least one halosilane by means of a thermal separation method,
wherein the phenylsilane is selected from the group consisting of the phenylsilanes of formulae A, B, C, and D, and mixtures thereof

wherein R 1 , R 2 , R 3 each individually, are H, F, Cl, Br, I, aryl, polyether or OR 5 , where R 5 each individually is alkyl, aryl, or polyether, and
R 4 each individually is H, alkyl, aryl, F, Cl, Br, or I, and wherein the halosilane is selected from the group comprising the chlorosilanes of general formulae H n SiCl 4−n , H m Cl 6−m Si 2 , (CH 3 ) n SiCl 4−n where n=1-3 and m=0-4, (CH 3 ) n H m SiCl 4−n−m where n=0-3 and m=0 or n=0-2 and m=1, and Me n Si 2 Cl 6-n where n=1-5; and
the boron compounds are halogen compounds of boron.

2. The method of claim 1 , wherein
R 4 =H and R 1 , R 2 , R 3 each individually are H, Cl, Me, Et, or Ph.

3. The method of claim 1 , wherein at least one phenylsilane is selected from the group consisting of the phenylsilanes A1, A2, and A3,

4. The method of claim 1 , wherein the thermal separation method comprises a distillation.

5. The method of claim 1 , wherein the halosilane removed in step b) has a boron content of less than 1 ppmw.

6. The method of claim 1 , wherein the halosilane removed in step b) has a boron content of less than 0.1 ppmw.

7. The method of claim 1 , wherein the halosilane removed in step b) has a boron content of less than 0.01 ppmw.

8. The method of claim 1 , wherein the boiling point of the phenylsilane is above 145° C.

9. The method of claim 1 , wherein the boiling point of the phenylsilane is from greater than 145° C. and up to 250° C.

10. The method of claim 1 , wherein the boiling point of the phenylsilane is from greater than 150° C. and up to 201° C.

11. The method of claim 1 , wherein the phenylsilane is used in an amount of 1 ppmw to 5% by weight, based on the amount of chlorosilane.

12. The method of claim 1 , wherein the phenylsilane is used in an amount of 100 ppmw to 3% by weight, based on the amount of chlorosilane.

13. The method of claim 1 , wherein the phenylsilane is used in an amount of 1 ppmw to 1% by weight, based on the amount of chlorosilane.

14. The method of claim 1 , wherein step a) is carried out at a temperature of −80 to 600° C.

15. The method of claim 1 , wherein step a) is carried out at a temperature of −40 to 350° C.

16. The method of claim 1 , wherein step a) and/or step b) is carried out continuously.

17. The method of claim 1 , wherein the phenylsilane is present as a constituent of a quench gas for cooling a chlorosilane off-gas from a reactor for preparing chlorosilanes.

18. The method of claim 1 , wherein step a) takes place at a temperature of from −80° C. to 60° C.

19. The method of claim 1 , wherein the composition is a product stream from the production of chlorosilane by low-temperature conversion, high-temperature conversion, or hydrochlorination.

20. A process for removing boron compounds from a composition containing at least one halosilane, comprising contacting the composition with at least one phenylsilane of formulae A, B, C or D,

and removing a boron-containing reaction product of the boron compounds with the phenylsilane(s), wherein R 1 , R 2 , R 3 =H, F, Cl, Br, I, aryl, polyether or OR 5 , where R 5 =alkyl, aryl, polyether, and R 4 =H, alkyl, aryl, F, Cl, Br, I; and wherein the halosilane is selected from the group consisting of the chlorosilanes of the formulae H n SiCl 4−n , H m Cl 6−m Si 2 , (CH 3 ) n SiCl 4−n where n=1-3 and m=0-4, (CH 3 ) n H m SiCl 4−n−m where n=0-3 and m=0 or where n=0-2 and m=1, and (CH 3 ) n Si 2 Cl 6−n where n=1-5 and mixtures thereof; and wherein the boron compounds are halogen compounds of boron.

21. The process of claim 20 , wherein R 4 each individually is H or R 1 , and R 2 , R 3 each individually are H, Cl, Me, Et, or Ph.

22. The process of claim 20 , wherein at least one phenylsilane is selected from the group consisting of the phenylsilanes A1, A2, and A3

23. A method for purifying a chlorosilane-containing composition from a commercial manufacture of chlorosilanes, comprising removing boron from the composition, by:
a) bringing the composition into contact with at least one phenylsilane, and
b) removing at least one halosilane by means of a distillative separation method,
wherein the phenylsilane is selected from the group consisting of the phenylsilanes of formulae A, B, C, and D, and mixtures thereof

wherein R 1 , R 2 , R 3 each individually, are H, F, Cl, Br, I, aryl, polyether or OR 5 , where R 5 each individually is alkyl, aryl, or polyether, and R 4 each individually is H, alkyl, aryl, F, Cl, Br, or I.

Assignees

• Wacker Chemie Ag

Inventors

• Rimboeck Karl-Heinz

Classifications

• C07F7/20 Primary

  Purification, separation · CPC title

• C01B33/10742

  prepared by hydrochlorination of silicon or of a silicon-containing material · CPC title

• C01B33/10778 Primary

  Purification · CPC title

• C07F5/02

  Boron compounds · CPC title