Switch linearization with anti-series varactor
US-2018337670-A1 · Nov 22, 2018 · US
US12052015B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12052015-B2 |
| Application number | US-202318141927-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 1, 2023 |
| Priority date | Dec 31, 2020 |
| Publication date | Jul 30, 2024 |
| Grant date | Jul 30, 2024 |
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Described herein are switches with asymmetrical anti-series varactor pairs to improve switching performance. The disclosed switches can include asymmetrical varactor pairs to reduce distortions. The asymmetry in the varactor pairs can be associated with geometry of each varactor in the pair. The disclosed switches can stack both symmetrical and asymmetrical varactor pairs. The disclosed switches with asymmetrical anti-series varactor pairs can be configured to improve both H 2 and H 3 simultaneously.
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a radio-frequency switch, the method comprising: forming a series arm on a semiconductor die by coupling an input node to an output node with a switch field-effect transistor (FET); forming a shunt arm on the semiconductor die by coupling the series arm to a reference potential node through a shunt FET; and forming a varactor stack on the semiconductor die by coupling a pair of anti-series varactors between the series arm and the reference potential node in such a way that the varactor stack is in parallel with the shunt arm, the pair of anti-series varactors being formed with a first varactor having a first width and a second varactor having a second width different from the first width to achieve a tailored asymmetry, the tailored asymmetry of the varactor stack configured to generate distortions that reduce distortions generated by the shunt arm or by the series arm, the difference between the first width and the second width being configured to reduce second order harmonics generated by the shunt arm or by the series arm. 2. The method of claim 1 wherein the varactor stack comprises a plurality of asymmetric anti-series varactor pairs, the tailored asymmetry of the varactor stack being an aggregated asymmetry of each asymmetric varactor pair in the varactor stack. 3. The method of claim 2 wherein the varactor stack does not include any symmetric anti-series varactor pairs. 4. The method of claim 1 further comprising forming a symmetric anti-series varactor pair in the varactor stack. 5. The method of claim 1 wherein the first width and the second width are tailored to reduce third order harmonics generated by the shunt arm or by the series arm. 6. The method of claim 1 wherein the shunt arm comprises a plurality of FETs. 7. The method of claim 1 wherein the series arm comprises a plurality of FETs. 8. A method of manufacturing a radio-frequency switch module, the method comprising: mounting a semiconductor die on a packaging substrate, the semiconductor die formed with a series arm that couples an input node to an output node with a switch field-effect transistor (FET); the semiconductor die further formed with a shunt arm that couples the series arm to a reference potential node through a shunt FET; and the semiconductor die further formed with a varactor stack that couples a pair of anti-series varactors between the series arm and the reference potential node in such a way that the varactor stack is in parallel with the shunt arm, the pair of anti-series varactors being formed with a first varactor having a first width and a second varactor having a second width different from the first width to achieve a tailored asymmetry, the tailored asymmetry of the varactor stack configured to generate distortions that reduce distortions generated by the shunt arm or by the series arm, the difference between the first width and the second width being configured to reduce second order harmonics generated by the shunt arm or by the series arm. 9. The method of claim 8 wherein the varactor stack comprises a plurality of asymmetric anti-series varactor pairs, the tailored asymmetry of the varactor stack being an aggregated asymmetry of each asymmetric varactor pair in the varactor stack. 10. The method of claim 9 wherein the varactor stack does not include any symmetric anti-series varactor pairs. 11. The method of claim 8 wherein the semiconductor die is further formed with a symmetric anti-series varactor pair in the varactor stack. 12. The method of claim 8 wherein the first width and the second width are tailored to reduce third order harmonics generated by the shunt arm or by the series arm. 13. The method of claim 8 wherein the shunt arm comprises a plurality of FETs. 14. The method of claim 8 wherein the series arm comprises a plurality of FETs. 15. A method of manufacturing a wireless device, the method comprising: implementing a transceiver configured to process radio-frequency (RF) signals; coupling an antenna to the transceiver, the antenna configured to facilitate transmission of an amplified RF signal; connecting a power amplifier to the transceiver, the power amplifier configured to generate the amplified RF signal; and connecting a switch to the antenna and the power amplifier, the switch formed on a semiconductor die mounted on a packaging substrate, the semiconductor die formed with a series arm that couples an input node to an output node with a switch field-effect transistor (FET); the semiconductor die further formed with a shunt arm that couples the series arm to a reference potential node through a shunt FET; and the semiconductor die further formed with a varactor stack that couples a pair of anti-series varactors between the series arm and the reference potential node in such a way that the varactor stack is in parallel with the shunt arm, the pair of anti-series varactors being formed with a first varactor having a first width and a second varactor having a second width different from the first width to achieve a tailored asymmetry, the tailored asymmetry of the varactor stack configured to generate distortions that reduce distortions generated by the shunt arm or by the series arm, the difference between the first width and the second width being configured to reduce second order harmonics generated by the shunt arm or by the series arm. 16. The method of claim 15 wherein the varactor stack comprises a plurality of asymmetric anti-series varactor pairs, the tailored asymmetry of the varactor stack being an aggregated asymmetry of each asymmetric varactor pair in the varactor stack. 17. The method of claim 16 wherein the varactor stack does not include any symmetric anti-series varactor pairs. 18. The method of claim 15 wherein the semiconductor die is further formed with a symmetric anti-series varactor pair in the varactor stack.
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