Touch substrate having layers with varying refractive index, touch displaying device, and manufacturing method of touch substrate

Patent metadata

Field	Value
Publication number	US-12039136-B2
Application number	US-202318312038-A
Country	US
Kind code	B2
Filing date	May 4, 2023
Priority date	Nov 18, 2020
Publication date	Jul 16, 2024
Grant date	Jul 16, 2024

Abstract

A touch substrate includes a base plate; touch electrodes; and at least three light adjustment layers stacked on a side of the base plate, and adjacent two of the light adjustment layers have different refractive indexes; the touch electrodes include a first touch electrode and a second touch electrode that are disposed on a side, backing onto the light adjustment layers, of the base plate, the second touch electrode is disposed on a side, backing onto the base plate, of the first touch electrode; the touch substrate further includes: a first insulating layer disposed between the base plate and the first touch electrode; a second insulating layer disposed between the first touch electrode and the second touch electrode; and a third insulating layer disposed on a side, backing onto the base plate, of the second touch electrode.

First claim

The invention claimed is:

1. A touch substrate, comprising:
a base plate;
touch electrodes; and
at least three light adjustment layers stacked on a side of the base plate, wherein adjacent two of the light adjustment layers have different refractive indexes;
wherein the touch electrodes comprise a first touch electrode and a second touch electrode that are disposed on a side, backing onto the light adjustment layers, of the base plate, the second touch electrode is disposed on a side, backing onto the base plate, of the first touch electrode;
wherein the touch substrate further comprises:
a first insulating layer disposed between the base plate and the first touch electrode;
a second insulating layer disposed between the first touch electrode and the second touch electrode; and
a third insulating layer disposed on a side, backing onto the base plate, of the second touch electrode.

2. The touch substrate according to claim 1 , wherein the light adjustment layers comprises a first light adjustment layer, a second light adjustment layer, a third light adjustment layer, a fourth light adjustment layer and a fifth light adjustment layer stacked in sequence, wherein the fifth light adjustment layer is disposed close to the base plate, the first light adjustment layer is disposed far away from the base plate;
wherein the refractive indexes of the first light adjustment layer, the third light adjustment layer and the fifth light adjustment layer are less than the refractive indexes of the second light adjustment layer and the fourth light adjustment layer.

3. The touch substrate according to claim 2 , wherein the first light adjustment layer, the third light adjustment layer and the fifth light adjustment layer are made from at least one of silicon dioxide and magnesium fluoride, and the second light adjustment layer and the fourth light adjustment layer are made from at least one of titanium dioxide and niobium oxide.

4. The touch substrate according to claim 3 , wherein when a host material of the first light adjustment layer, the third light adjustment layer and the fifth light adjustment layer is silicon dioxide and the host material of the second light adjustment layer and the fourth light adjustment layer is niobium oxide, a thickness of the fifth light adjustment layer is greater than thicknesses of the first light adjustment layer, the second light adjustment layer, the third light adjustment layer and the fourth light adjustment layer, the thicknesses of the second light adjustment layer and the fourth light adjustment layer are greater than thicknesses of the first light adjustment layer and the third light adjustment layer.

5. The touch substrate according to claim 4 , wherein the thicknesses of the first light adjustment layer, the second light adjustment layer, the third light adjustment layer, the fourth light adjustment layer and the fifth light adjustment layer are all greater than or equal to 50 nm, and less than or equal to 150 nm.

6. The touch substrate according to claim 1 , wherein the first insulating layer and the second insulating layer have different refractive indexes, and the third insulating layer and the second insulating layer have different refractive indexes.

7. The touch substrate according to claim 6 , wherein the refractive index of the second insulating layer is less than the refractive indexes of the first insulating layer and the third insulating layer.

8. The touch substrate according to claim 7 , wherein the first insulating layer and the third insulating layer are made from at least one of titanium dioxide and niobium oxide; the second insulating layer is made from at least one of silicon dioxide and magnesium fluoride.

9. The touch substrate according to claim 1 , wherein the light adjustment layers comprise a sixth light adjustment layer, a seventh light adjustment layer, and an eighth light adjustment layer stacked in sequence, wherein the sixth light adjustment layer is disposed close to the base plate, the eighth light adjustment layer is disposed far away from the base plate, and the refractive index of the seventh light adjustment layer is less than refractive indexes of the sixth light adjustment layer and the eighth light adjustment layer.

10. The touch substrate according to claim 9 , wherein the sixth light adjustment layer and the eighth light adjustment layer are made from at least one of titanium dioxide and niobium oxide, the seventh light adjustment layer is made from at least one of silicon dioxide and magnesium fluoride.

11. The touch substrate according to claim 9 , wherein when host materials of the sixth light adjustment layer and the eighth light adjustment layer are niobium oxide, the host material of the seventh light adjustment layer is silicon dioxide, thicknesses of the sixth light adjustment layer and the eighth light adjustment layer are both greater than or equal to 100 nm, and less than or equal to 130 nm; the thickness of the seventh light adjustment layer is greater than or equal to 80 nm, and less than or equal to 110 nm.

12. The touch substrate according to claim 1 , wherein the first touch electrode and the second touch electrode intersect with each other, and form metal grids.

13. The touch substrate according to claim 12 , wherein the metal grids comprise:
a first metal grid formed by intersection of the first touch electrode, wherein the first metal grid comprises a first node located at a crossing point of the first touch electrode, and a first hollow area surrounded by the first touch electrode; and
a second metal grid formed by intersection of the second touch electrode, wherein the second metal grid comprises a second node located at a crossing point of the second touch electrode, and a second hollow area surrounded by the second touch electrode;
wherein an orthographic projection of the first node on the base plate is located at a center of the orthographic projection of the second hollow area on the base plate, and the orthographic projection of the second node on the base plate is located at a center of the orthographic projection of the first hollow area on the base plate.

14. The touch substrate according to claim 12 , wherein the first touch electrode and the second touch electrode have an uneven surface on a side facing away from the base plate.

15. A touch displaying device, comprising a display panel and the touch substrate according to claim 1 , wherein the touch substrate is located on a light emitting side of the display panel.

16. The touch displaying device according to claim 15 , wherein the display panel is located on the side, backing onto the light adjustment layers, of the base plate.

17. The touch displaying device according to claim 15 , wherein the touch substrate and the display panel are bonded with an optically clear adhesive.

18. A manufacturing method of a touch substrate, comprising:
providing a base plate;
forming at least three light adjustment layers on a side of the base plate sequentially, wherein refractive indexes of adjacent light adjustment layers are different; and
forming a first insulating layer, a first touch electrode, a second insulating layer, a second touch electrode and a third insulating layer on a side, backing onto the light adjustment layers, of the base plate sequentially.

19. The manufacturing method according to claim 18 , wherein the forming at least three light adjustment layers on a side of the base plate sequentially comprises:
forming a fifth light adjustment layer on a side of the base plate;
for

Assignees

• Wuhan Boe Optoelectronics Technology Co Ltd
• Boe Technology Group Co Ltd

Inventors

• Shi Xia
• Guo Yuanhui
• Han Jie
• Zhao Jian
• Zhang Peipei
• Gao Yujie

Classifications

• G06F2203/04103

  Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices · CPC title

• G06F2203/04112

  Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material · CPC title

• G06F3/0412

  Digitisers structurally integrated in a display · CPC title

• G06F3/0443

  using a single layer of sensing electrodes · CPC title

• G06F2203/04111

  Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate · CPC title