Advanced passive clearance control (APCC) control ring produced by field assisted sintering technology (FAST)

US12037912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12037912-B2
Application numberUS-202217842932-A
CountryUS
Kind codeB2
Filing dateJun 17, 2022
Priority dateJun 18, 2021
Publication dateJul 16, 2024
Grant dateJul 16, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An advanced passive clearance control (APCC) control ring is provided. The APCC control ring includes first and second cover sections, first and second wall sections and a control ring. At least one of the first and second cover sections is bonded to corresponding edges of the first and second wall sections by field assisted sintering technology (FAST) processing along a bond surface to form an enclosure for the control ring.

First claim

Opening claim text (preview).

What is claimed is: 1. An advanced passive clearance control (APCC) control ring, comprising: first and second cover sections; first and second wall sections; and a control ring, at least one of the first and second cover sections being bonded to corresponding edges of the first and second wall sections by field assisted sintering technology (FAST) processing along a bond surface to form an enclosure for the control ring, wherein the APCC control ring further comprises a thermal barrier coating (TBC) applied to exterior surfaces of the first and second cover sections and the first and second wall sections. 2. The APCC control ring according to claim 1 , wherein both the first and second cover sections are bonded to corresponding edges of the first and second wall sections by the FAST processing along corresponding bond surfaces. 3. The APCC control ring according to claim 1 , wherein the control ring is a full-hoop control ring and the first and second cover sections and the first and second wall sections are fully annular. 4. The APCC control ring according to claim 1 , wherein the control ring is segmented and the first and second cover sections and the first and second wall sections are partially annular. 5. The APCC control ring according to claim 1 , wherein the enclosure forms a thermally isolated cavity therein. 6. The APCC control ring according to claim 1 , further comprising hook elements attached to one of the first and second wall sections. 7. An advanced passive clearance control (APCC) control ring, comprising: first and second cover sections; first and second wall sections; and a control ring, at least one of the first and second cover sections being bonded to corresponding edges of the first and second wall sections by field assisted sintering technology (FAST) processing along a planar bond surface to form an enclosure for the control ring, wherein the APCC control ring further comprises a thermal barrier coating (TBC) applied to exterior surfaces of the first and second cover sections and the first and second wall sections. 8. The APCC control ring according to claim 7 , wherein both the first and second cover sections are bonded to corresponding edges of the first and second wall sections by the FAST processing along corresponding planar bond surfaces. 9. The APCC control ring according to claim 7 , wherein the control ring is a full-hoop control ring and the first and second cover sections and the first and second wall sections are fully annular. 10. The APCC control ring according to claim 7 , wherein the control ring is segmented and the first and second cover sections and the first and second wall sections are partially annular. 11. The APCC control ring according to claim 7 , wherein the enclosure forms a thermally isolated cavity therein. 12. The APCC control ring according to claim 7 , further comprising hook elements attached to one of the first and second wall sections. 13. A method of assembling an advanced passive clearance control (APCC) system, the method comprising: forming an enclosure to thermally isolate a control ring, wherein the forming of the enclosure comprises: bonding first a cover ring to respective first edges of inner and outer rings by field assisted sintering technology (FAST); and bonding a second cover ring to respective second edges of the inner and outer rings by the FAST, wherein the method further comprises applying a thermal barrier coating to exterior surfaces of the inner and outer rings and the first and second cover rings. 14. The method according to claim 13 , wherein the control ring and the enclosure are annular. 15. The method according to claim 13 , wherein the control ring is a full-hoop control ring. 16. The method according to claim 13 , wherein the control ring is segmented. 17. The method according to claim 13 , further comprising attaching hook elements to the inner ring.

Assignees

Inventors

Classifications

  • Retaining components in desired mutual position · CPC title

  • Coating; Surface treatment · CPC title

  • by sintering · CPC title

  • Selecting particular materials · CPC title

  • by using electric current {other than for infrared radiant energy}, laser radiation or plasma (B22F3/11 takes precedence){; by ultrasonic bonding (B22F3/115 takes precedence)} · CPC title

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What does patent US12037912B2 cover?
An advanced passive clearance control (APCC) control ring is provided. The APCC control ring includes first and second cover sections, first and second wall sections and a control ring. At least one of the first and second cover sections is bonded to corresponding edges of the first and second wall sections by field assisted sintering technology (FAST) processing along a bond surface to form an…
Who is the assignee on this patent?
Rtx Corp
What technology area does this patent fall under?
Primary CPC classification F01D11/18. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jul 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).