Method of electroplating with Sn-alloy and apparatus of electroplating with Sn-alloy
US-9506163-B2 · Nov 29, 2016 · US
US12024787B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12024787-B2 |
| Application number | US-202117514971-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 29, 2021 |
| Priority date | Mar 11, 2021 |
| Publication date | Jul 2, 2024 |
| Grant date | Jul 2, 2024 |
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The present disclosure relates to a filling device and apparatus, an electrochemical deposition system, and a filling method. The filling device includes: a feeding structure including a first feed port and a first discharge port; a container including a second feed port and a second discharge port; a weighing means disposed on the container; a conveying structure disposed between the first discharge port and the second feed port, the second feed port being in communication with the first discharge port via the conveying structure, and the conveying structure being configured to convey a material output from the first discharge port to the second feed port; and a control structure connected to the weighing means and the conveying structure, respectively, and configured to control a conveying speed of the conveying structure according to the weight detected by the weighing means.
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What is claimed is: 1. An electrochemical deposition system, comprising an electrochemical deposition apparatus and a filling device, wherein the filling device comprises: a feeding structure comprising a first feed port and a first discharge port; a container comprising a second feed port and a second discharge port, the second discharge port serving as a discharge port of the filling device, the second discharge port of the container is in communication with the electrochemical deposition apparatus; a weighing component disposed on the container, the weighing component being configured to detect a weight of a material in the container; a conveying structure disposed between the first discharge port and the second feed port, the second feed port being in communication with the first discharge port via the conveying structure, and the conveying structure being configured to convey a material output from the first discharge port to the second feed port; and a control structure connected to the weighing component and the conveying structure, respectively, and configured to control a conveying speed of the conveying structure according to the weight detected by the weighing component. 2. The electrochemical deposition system according to claim 1 , wherein the conveying structure comprises: a conveying pipeline connected between the first discharge port and the second feed port; and a spiral member disposed in the conveying pipeline, the spiral member comprising a rotation shaft and spiral blades arranged on the rotation shaft; and wherein the control structure is connected to the rotation shaft and controls the conveying speed of the conveying structure by controlling a speed of the rotation shaft. 3. The electrochemical deposition system according to claim 2 , wherein the control structure comprises a controller and a driver, wherein the controller is coupled with the weighing component and configured to send a control signal to the driver based on the weight detected by the weighing component; and the driver is connected to the rotation shaft and configured to control a rotation speed of the rotation shaft according to the control signal. 4. The electrochemical deposition system according to claim 1 , wherein the control structure is configured to, when the weight detected by the weighing component is less than or equal to b times of a target weight, control the conveying structure to convey a material at a first speed; when the weight detected by the weighing component is greater than b times of the target weight and less than the target weight, control the conveying structure to convey a material at a second speed; and when the weight detected by the weighing component reaches the target weight, control the conveying structure to stop conveying of the material; and wherein 0<b<1, and the first speed is greater than the second speed. 5. The electrochemical deposition system according to claim 4 , wherein the container is further provided with a second valve, the control structure is connected to the second valve, and the control structure is further configured to, control the second valve to remain close when the material entering the container; control the second valve to remain closed when the weight of the material detected by the weighing component does not reach the target weight; and control the second valve to open to form the second discharge port when the weight detected by the weighing component reaches the target weight. 6. The electrochemical deposition system according to claim 1 , wherein the feeding structure comprises: a feeder comprising a feeder feed port and a feeder discharge port, the feeder feed port serving as the first feed port; a buffer bin comprising a buffer bin feed port and a buffer bin discharge port, the buffer bin feed port being in communication with the feeder discharge port, and the buffer bin discharge port serving as the first discharge port; and a first valve provided on the feeder and configured to control a material quantity output from the feeder to the buffer bin. 7. The electrochemical deposition system according to claim 1 , wherein the filling device further comprises: a bracket on which the container and the feeding structure are provided. 8. The electrochemical deposition system according to claim 1 , wherein the filling device further comprises: a display component coupled with the weighing component and configured to display the weight detected by the weighing component. 9. The electrochemical deposition system according to claim 1 , comprising: a supply source, the supply source being in communication with the first feed port of the feeding structure. 10. The electrochemical deposition system according to claim 1 , wherein the electrochemical deposition system further comprises a dissolution device, the dissolution device is connected to the second discharge port and the electrochemical deposition apparatus, respectively, and the material output from the second discharge port is discharged to the dissolution device to form an electrochemical deposition liquid with a target concentration, and the electrochemical deposition liquid is discharged from the dissolution device to the electrochemical deposition apparatus. 11. The electrochemical deposition system according to claim 10 , wherein the material is copper oxide powder, and the electrochemical deposition liquid has a target concentration of copper ions. 12. A filling method for an electrochemical deposition system according to claim 1 , wherein the electrochemical deposition system comprises an electrochemical deposition apparatus and a filling device, wherein the filling device comprises: a feeding structure comprising a first feed port and a first discharge port; a container comprising a second feed port and a second discharge port, the second discharge port serving as a discharge port of the filling device, the second discharge port of the container is in communication with the electrochemical deposition apparatus; a weighing component disposed on the container, the weighing component being configured to detect a weight of a material in the container; a conveying structure disposed between the first discharge port and the second feed port, the second feed port being in communication with the first discharge port via the conveying structure, and the conveying structure being configured to convey a material output from the first discharge port to the second feed port; and a control structure connected to the weighing component and the conveying structure, respectively, and configured to control a conveying speed of the conveying structure according to the weight detected by the weighing component, the filling method performs filling with the filling device and comprises: controlling, by the control structure, the conveying structure so that the material is conveyed from the first discharge port of the feeding structure to the second feed port of the container through the conveying structure; detecting, by the weighing component, the weight of the material in the container; controlling, by the control structure, a conveying speed of the conveying structure according to the weight detected by the weighing component, when the material in the container is less than a target weight, the control structure controls the conveying speed of the conveying structure to be greater than 0; and when the material in the container reaches the target weight, the control structure controls the conveying speed of the conveying structure to be equal to 0; and outputting the material from the second discharge port of the container.
Constructional parts, or assemblies thereof, of cells for electrolytic coating · CPC title
Controlled addition of electrolyte components · CPC title
Tanks; Installations therefor · CPC title
Process control or regulation (controlling or regulating in general G05) · CPC title
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