Gas distribution system and reactor system including same

Patent metadata

Field	Value
Publication number	US-12024775-B2
Application number	US-202318207322-A
Country	US
Kind code	B2
Filing date	Jun 8, 2023
Priority date	Jun 4, 2018
Publication date	Jul 2, 2024
Grant date	Jul 2, 2024

Abstract

A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas distribution system coupled to a reaction chamber.

First claim

What is claimed is:

1. A gas distribution system, comprising:
a first gas supply line;
a first gas manifold coupled to the first gas supply line, wherein the first gas manifold comprises a plurality of first gas outlets;
a plurality of first gas flow sensors, wherein at least one of the plurality of first gas flow sensors is coupled to each of the plurality of first gas outlets;
a plurality of first gas valves, wherein at least one of the plurality of first gas valves is coupled to an outlet of each of the plurality of first gas flow sensors;
a first gas pressure-controlled vent line selectively fluidly coupled to an outlet of each of the plurality of first gas valves;
a first pressure transducer configured to measure the pressure within the first gas pressure-controlled vent line;
a second pressure transducer configured to measure a reaction chamber pressure within the reaction chamber;
a vacuum source coupled to the first gas pressure-controlled vent line; and
a controller programmed to operate the vacuum source, during operations of the gas distribution system to provide a first gas via the first gas supply line to the first gas manifold, to maintain a pressure measured by the first pressure transducer in the first gas pressure-controlled vent line within plus or minus ten percent of the reaction chamber pressure within the reaction chamber.

2. The gas distribution system of claim 1 , further comprising a plurality of first gas selection valves, wherein an inlet of each of the plurality of first gas selection valves is coupled to an outlet of one of the plurality of first gas valves and the outlet of each of the plurality of first gas selection valves is coupled to an inlet of the first gas pressure-controlled vent line.

3. The gas distribution system of claim 2 , wherein the outlet of each of the plurality of first gas selection valves is selectively coupled to the reaction chamber.

4. The gas distribution system of claim 1 , further comprising:
a first relief valve configured to allow venting of the first gas manifold;
a moisture sample panel;
an inert gas inlet valve; and
a plurality of channel purge valves.

5. The gas distribution system of claim 1 , further comprising a flange, wherein the plurality of first gas valves are fluidly coupled to gas flange channels formed within the flange.

6. The gas distribution system of claim 1 , further comprising a proportional-integral-derivative controller coupled to the plurality of first gas valves, wherein the proportional-integral-derivative controller is configured to independently adjust a flow in each of the first gas valves to desired set points.

7. The gas distribution system of claim 1 , wherein the plurality of first gas valves comprises at least one of a proportional valve or a solenoid valve.

8. A gas distribution system comprising:
a first gas supply line;
a plurality of first gas outlets coupled to the first gas supply line;
a plurality of first gas valves, wherein at least one of the plurality of first gas valves is coupled to each of the plurality of first gas outlets;
a first gas pressure-controlled vent line selectively fluidly coupled to an outlet of each of the plurality of first gas valves;
a second gas supply line;
a plurality of second gas outlets coupled to the second gas supply line;
a plurality of second gas valves, wherein at least one of the plurality of second gas valves is coupled to each of the plurality of second gas outlets;
a second gas pressure-controlled vent line selectively fluidly coupled to an outlet of each of the plurality of second gas valves;
a first pressure transducer configured to measure the pressure within the first gas pressure-controlled vent line;
a second pressure transducer configured to measure the pressure within the second gas pressure-controlled vent line;
a third pressure transducer configured to measure a reaction chamber pressure within the reaction chamber;
a vacuum source coupled to the first gas pressure-controlled vent line; and
a controller programmed to operate the vacuum source, during operations of the gas distribution system to provide a first gas via the first gas supply line or to provide a second gas via the second gas supply line, to maintain a pressure measured by the first and second pressure transducers in the first and second gas pressure-controlled vent lines within plus or minus ten percent of the reaction chamber pressure within the reaction chamber.

9. The gas distribution system of claim 8 , further comprising at least one of:
a plurality of first gas selection valves, wherein an inlet of each of the plurality of first gas selection valves is coupled to an outlet of one of the plurality of first gas valves and the outlet of each of the plurality of first gas selection valves is coupled an inlet of the first gas pressure-controlled vent line; or
a plurality of second gas selection valves, wherein an inlet of each of the plurality of second gas selection valves is coupled to an outlet of one of the plurality of second gas valves and the outlet of each of the plurality of second gas selection valves is coupled to an inlet of the second gas pressure-controlled vent line.

10. The gas distribution system of claim 9 , wherein the outlet of each of the plurality of first gas selection valves is selectively coupled to the reaction chamber; and wherein the outlet each of the plurality of second gas selection valves is selectively coupled to the reaction chamber.

11. The gas distribution system of claim 8 , further comprising:
a first relief valve configured to allow venting of the first gas supply line;
a second relief valve configured to allow venting of the second gas supply line;
a moisture sample panel;
an inert gas inlet valve; and
a plurality of channel purge valves.

12. The gas distribution system of claim 8 , further comprising a flange, wherein the plurality of first gas valves and the plurality of second gas valves are fluidly coupled to gas flange channels formed within the flange.

13. The gas distribution system of claim 8 , further comprising a proportional-integral-derivative controller coupled to the plurality of first gas valves and to the plurality of second gas valves, wherein the proportional-integral-derivative controller is configured to independently adjust a flow in each of the first and second gas valves to desired set points.

14. The gas distribution system of claim 8 , wherein the plurality of first gas valves comprises at least one of a proportional valve or a solenoid valve.

15. A gas distribution system comprising:
a first gas supply line;
a plurality of first gas outlets coupled to the first gas supply line;
a plurality of first gas valves, wherein at least one of the plurality of first gas valves is coupled to each of the plurality of first gas outlets;
a first gas pressure-controlled vent line selectively fluidly coupled to an outlet of each of the plurality of first gas valves;
a first pressure transducer configured to measure the pressure within the first gas pressure-controlled vent line;
a second pressure transducer configured to measure a reaction chamber pressure within the reaction chamber;
a vacuum source coupled to the first gas pressure-controlled vent line; and
a controller programmed to operate the vacuum source, during operations of the gas distribution system to provide a first gas via the first gas supply line, to maintain a pressure measured by the first pressure transducer in the first gas pressure-controlled vent line within plus or minus ten percent of the reaction chamber pressure within the rea

Assignees

• Asm Ip Holding Bv

Inventors

• Sreeram Sonti
• Su Junwei
• Tran Loc Vinh

Classifications

• C23C16/45563

  Gas nozzles · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• C23C16/45561 Primary

  Gas plumbing upstream of the reaction chamber · CPC title

• H01J37/32458

  Vessel · CPC title

• C23C16/45557

  Pulsed pressure or control pressure · CPC title