Silver-containing solution and method of forming silver catalyst layer in chemical plating

US12023653B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12023653-B2
Application numberUS-202217846433-A
CountryUS
Kind codeB2
Filing dateJun 22, 2022
Priority dateFeb 22, 2022
Publication dateJul 2, 2024
Grant dateJul 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A method of forming a silver catalyst layer in chemical plating includes providing a substrate; applying a silver-containing solution onto the substrate; and applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate. The silver-containing solution includes silver ions, a diamine compound, a carboxylic acid compound, and a solvent. In addition, the substrate having the silver catalyst layer thereon can be immersed into a chemical plating solution to form a metal layer over the silver catalyst layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A silver-containing solution, consisting of: silver ions; a diamine compound; a carboxylic acid compound; and a solvent. 2. The silver-containing solution as claimed in claim 1 , wherein the silver-containing solution has a silver ion concentration of 0.01 M to 10 M. 3. The silver-containing solution as claimed in claim 1 , wherein the diamine compound comprises ethylene diamine, propylene diamine, or a combination thereof, and the diamine to the silver ions have a molar concentration ratio of 2.5:1 to 200:1. 4. The silver-containing solution as claimed in claim 1 , wherein the carboxylic acid compound comprises formic acid, acetic acid, citric acid, oxalic acid, malic acid, or a combination thereof, and the carboxylic acid compound to the silver ions have a molar concentration ratio of 0.1:1 to 1.2:1. 5. The silver-containing solution as claimed in claim 1 , wherein the solvent comprises water, alcohol, or a combination thereof. 6. A silver-containing solution consisting of: silver ions; a diamine compound; a carboxylic acid compound; a solvent; and a dispersant. 7. A method of forming a silver catalyst layer in chemical plating, comprising: providing a substrate; applying a silver-containing solution onto the substrate; applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate; wherein the silver-containing solution is consisting of: silver ions; a diamine compound; a carboxylic acid compound; and a solvent. 8. The method as claimed in claim 7 , wherein the silver-containing solution has a silver ion concentration of 0.01 M to 10 M. 9. The method as claimed in claim 7 , wherein the diamine compound comprises ethylene diamine, propylene diamine, or a combination thereof, and the diamine to the silver ions have a molar concentration ratio of 2.5:1 to 200:1. 10. The method as claimed in claim 7 , wherein the carboxylic acid compound comprises formic acid, acetic acid, citric acid, oxalic acid, malic acid, or a combination thereof, and the carboxylic acid compound to the silver ions have a molar concentration ratio of 0.1:1 to 1.2:1. 11. The method as claimed in claim 7 , wherein the solvent comprises water, alcohol, or a combination thereof. 12. The method as claimed in claim 7 , further comprising immersing the substrate having the silver catalyst layer thereon into a chemical plating solution to form a metal layer over the silver catalyst layer. 13. A method of forming a silver catalyst layer in chemical plating, comprising: providing a substrate; applying a silver-containing solution onto the substrate; applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate, wherein the silver-containing solution is consisting of: silver ions; a diamine compound; a carboxylic acid compound; a solvent; and a dispersant. 14. The method as claimed in claim 7 , wherein the energy of activation comprises plasma, pulsed light, ultraviolet radiation, or laser. 15. The method as claimed in claim 12 , wherein the chemical plating solution includes copper ions or nickel ions, and the metal layer includes a copper layer or a nickel layer.

Assignees

Inventors

Classifications

  • Photocatalytic properties · CPC title

  • C23C28/023Primary

    only coatings of metal elements only · CPC title

  • Protection of catalysts, e.g. by coating · CPC title

  • Coating with noble metals · CPC title

  • making use of flames, plasmas or lasers · CPC title

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What does patent US12023653B2 cover?
A method of forming a silver catalyst layer in chemical plating includes providing a substrate; applying a silver-containing solution onto the substrate; and applying energy of activation to the silver-containing solution to form a silver catalyst layer over the substrate. The silver-containing solution includes silver ions, a diamine compound, a carboxylic acid compound, and a solvent. In addi…
Who is the assignee on this patent?
Ind Tech Res Inst
What technology area does this patent fall under?
Primary CPC classification C23C28/023. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).