Additive manufacturing of aromatic thermoplastics from photocurable precursor salts

US12018127B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12018127-B2
Application numberUS-201916969826-A
CountryUS
Kind codeB2
Filing dateFeb 13, 2019
Priority dateFeb 13, 2018
Publication dateJun 25, 2024
Grant dateJun 25, 2024

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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In various aspects, a polymer resin is provided for vat photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can be formed, for instance, by the addition of a diamine to a suitable dianhydride. Methods of additive manufacturing using the resins are also provided.

First claim

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We claim: 1. A polymer resin for vat photopolymerization, the polymer resin comprising: (i) a polyamic acid salt comprising repeat units having a structure according to the following formula where each occurrence of R″ comprises a photocrosslinkable group; where each occurrence of R is independently selected from the group consisting of H, substituted and unsubstituted alkyl, substituted and unsubstituted heteroalkyl, and substituted and unsubstituted alkenyl; where each occurrence of Ar is independently selected from the group where each occurrence of X is a substituted or unsubstituted aryl or heteroaryl group; where each occurrence of Y is independently selected from the group consisting of O, S, C═O, C(CF 3 ) 2 , C(CH 3 ) 2 , SO 2 , and C≡C; (ii) a photoinitiator suitable for initiating crosslinking of the photocrosslinkable groups when exposed to a light source of a suitable wavelength and intensity; and (iii) a suitable solvent; and wherein the polyamic acid salt comprises a polyether ether ketone, a polystyrene, or a polyallylamine. 2. The polymer resin according to claim 1 , wherein each occurrence of X is selected from the group where each occurrence of Y is independently selected from a bond, —O—, —CH 2 —, —CH 2 CH 2 —, —C(CF 3 ) 2 —, —C(CH 3 ) 2 —, —S(O) 2 —, —S—, —S—S—, —CH═CH—, —C(O)—, —NH—, —O—Si(CH 3 ) 2 —O—, where each occurrence of Y 1 is independently selected from —Cl, —OH, —OCH 3 , —CH 2 , —CH 2 CH 3 ; where each occurrence of Y 2 is independently selected from —CH 3 , —OCH 3 , —OH, —CF 3 , —SO 3 H; and where each occurrence of n is independently 1, 2, or 3. 3. The polymer resin according to claim 2 , wherein each occurrence of R″ is selected from the group 4. The polymer resin according to claim 1 , wherein the polymer has an average molecular weight of about 40000 g/mol to about 60000 g/mol. 5. The polymer resin according to claim 4 , wherein the polymer has a polydispersity of about 2 or less. 6. The polymer resin according to claim 1 , wherein the photocrosslinkable groups have a thermal decomposition temperature of about 350° C. or less. 7. The polymer resin according to claim 6 , wherein the photocrosslinkable groups comprise an acrylate, a methacrylate, or a combination thereof. 8. The polymer resin according to claim 1 , wherein the suitable solvent is selected from the group consisting of N-methyl-2-pyrrolidone (NMP), dimethylacetamide (DMAC), dimethylformamide (DMF), y-butyrolactone, mixtures with hydrocarbon solvents/aromatic hydrocarbon solvents, water, ammonia, and mixtures thereof. 9. The polymer resin according to claim 8 , wherein the suitable solvent is N-methyl-2-pyrrolidone (NMP). 10. The polymer resin according to claim 1 , wherein the suitable wavelength is about 300 nm to 500 nm. 11. The polymer resin according to claim 1 , wherein the photointiator is a phosphine oxide such as phenylbis(2,4,6-trimethylbenzoyl)phosphine. 12. The polymer resin according to claim 1 , wherein the photoinitiator is present in an amount from about 1.5 wt % to about 5 wt % based upon a total weight of the polymer resin. 13. A polymer resin according to claim 1 , further comprising a UV blocker selected from the group consisting of: a benzophenone, a benzotriazole, a diazine, a triazine, a benzoate, an oxalanilide, an azobenzone, a metal oxide, and any combination thereof. 14. A method of making an article, the method comprising: (a) applying an effective amount of a light to a polymer resin according to claim 1 ; (b) repeating step (a) a number of times to form the precursor article in a layer-by-layer fashion; and heating the precursor article to a first elevated temperature for a period of time to form the article. 15. The method according to claim 14 , wherein the articles comprises polyimide repeat units having a structure according to the following formula wherein each occurrence of X is a substituted or unsubstituted aromatic group, and wherein each occurrence of A is a substituted or unsubstituted aromatic group. 16. The method according to claim 14 , the method further comprising drying the precursor article to remove the solvent prior to forming the polyimide repeat units. 17. The method according to claim 16 , wherein the drying is performed by drying the precursor article in a vacuum oven for about 1 h, at one or more temperatures between 25° C. and 150° C. 18. The method according to claim 14 , wherein the article does not comprise a layered structure.

Assignees

Inventors

Classifications

  • monomers or prepolymers · CPC title

  • PI, i.e. polyimides or derivatives thereof · CPC title

  • Post-treatment, e.g. curing, coating or polishing · CPC title

  • Auxiliary operations or equipment · CPC title

  • using layers of liquid which are selectively solidified · CPC title

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What does patent US12018127B2 cover?
In various aspects, a polymer resin is provided for vat photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can b…
Who is the assignee on this patent?
Virginia Tech Intellectual Properties Inc
What technology area does this patent fall under?
Primary CPC classification C08G73/105. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 25 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).