Made-to-stock patterned transparent conductive layer

US12013622B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12013622-B2
Application numberUS-202217934418-A
CountryUS
Kind codeB2
Filing dateSep 22, 2022
Priority dateDec 28, 2018
Publication dateJun 18, 2024
Grant dateJun 18, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparent conductive layer overlying the anodic electrochemical layer. The method can include depositing an insulating layer over the stack and determining a first pattern for the second transparent conductive layer. The first pattern can include a first region and a second region. The first region and the second region can be the same material. The method can include patterning the first region of the second transparent conductive layer without removing the material from the first region. The first region can have a first resistivity and the second region can have a second resistivity.

First claim

Opening claim text (preview).

What is claimed is: 1. An electrochromic device obtained by production process, comprising: providing a substrate and a stack overlying the substrate, the stack comprising: a first transparent conductive layer over the substrate; a second transparent conductive layer over the substrate; a cathodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and an anodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and patterning a first region of the second transparent conductive layer without removing the material from the first region, wherein after patterning the first region, the first region comprises a first resistivity and a second region of the second transparent conductive layer comprises a second resistivity, wherein the first resistivity is different from the second resistivity, wherein patterning the second transparent conductive layer to form the first resistivity and the second resistivity is patterned through an insulating layer; wherein the first region and the second region comprise the same material. 2. The electrochromic device of claim 1 , wherein patterning the second transparent conductive layer to form the first resistivity and the second resistivity is patterned through the substrate, the first transparent conductive layer, the cathodic electrochemical layer, and the anodic electrochemical layer. 3. The electrochromic device of claim 1 , wherein patterning the second transparent conductive layer comprises using a short pulse laser having a wavelength between 400 nm and 700 nm. 4. The electrochromic device of claim 3 , wherein the short pulse laser has a wavelength between 500 nm and 550 nm. 5. The electrochromic device of claim 4 , wherein the short pulse laser fires for a duration of between 50 femtoseconds and 1 second. 6. The electrochromic device of claim 1 , wherein the first resistivity is greater than the second resistivity. 7. The electrochromic device of claim 1 , wherein the first resistivity is between 15 Ω/sq to 100 Ω/sq. 8. An electrochromic device, comprising: a substrate; a first transparent conductive layer over the substrate; a second transparent conductive layer, wherein the second transparent conductive layer comprises a material, wherein the material has a first resistivity and a second resistivity, and wherein the first resistivity is greater than the second resistivity, wherein the first resistivity and the second resistivity comprise the same material; an anodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer; and a cathodic electrochemical layer between the first transparent conductive layer and the second transparent conductive layer. 9. The electrochemical device of claim 8 , wherein no material is removed from the second transparent conductive layer. 10. The electrochemical device of claim 9 , wherein the first resistivity is between 15 Ω/sq to 100 Ω/sq. 11. The electrochromic device of claim 8 , wherein the substrate comprises a material selected from the group consisting of glass, sapphire, aluminum oxynitride, spinel, polyacrylic compound, polyalkene, polycarbonate, polyester, polyether, polyethylene, polyimide, polysulfone, polysulfide, polyurethane, polyvinylacetate, another suitable transparent polymer, co-polymer of the foregoing, float glass, borosilicate glass, and any combination thereof. 12. The electrochromic device of claim 8 , wherein the stack further comprises an ion conducting layer between the cathodic electrochemical layer and the anodic electrochemical layer. 13. The electrochromic device of claim 12 , wherein the ion-conducting layer comprises a material selected from the group consisting of lithium, sodium, hydrogen, deuterium, potassium, calcium, barium, strontium, magnesium, oxidized lithium, Li 2 WO 4 , tungsten, nickel, lithium carbonate, lithium hydroxide, lithium peroxide, and any combination thereof. 14. The electrochromic device of claim 8 , wherein the cathodic electrochemical layer comprises an electrochromic material. 15. The electrochromic device of claim 14 , wherein the electrochromic material comprises a material selected from the group consisting of WO 3 , V 2 O 5 , MoO 3 , Nb 2 O 5 , TiO 2 , CuO, Ni 2 O 3 , NiO, Ir 2 O 3 , Cr 2 O 3 , Co 2 O 3 , Mn 2 O 3 , mixed oxides (e.g., W—Mo oxide, W—V oxide), lithium, aluminum, zirconium, phosphorus, nitrogen, fluorine, chlorine, bromine, iodine, astatine, boron, a borate with or without lithium, a tantalum oxide with or without lithium, a lanthanide-based material with or without lithium, another lithium-based ceramic material, or any combination thereof. 16. The electrochromic device of claim 8 , wherein the first transparent conductive layer comprises indium oxide, indium tin oxide, doped indium oxide, tin oxide, doped tin oxide, zinc oxide, doped zinc oxide, ruthenium oxide, doped ruthenium oxide, silver, gold, copper, aluminum, and any combination thereof. 17. The electrochromic device of claim 8 , wherein the second transparent conductive layer comprises a material selected from the group consisting of indium oxide, indium tin oxide, doped indium oxide, tin oxide, doped tin oxide, zinc oxide, doped zinc oxide, ruthenium oxide, doped ruthenium oxide and any combination thereof. 18. The electrochromic device of claim 8 , wherein the anodic electrochemical layer comprises a material selected from the group consisting of an inorganic metal oxide electrochemically active material, such as WO 3 , V 2 O 5 , MoO 3 , Nb 2 O 5 , TiO 2 , CuO, Ir 2 O 3 , Cr 2 O 3 , Co 2 O 3 , Mn 2 O 3 , Ta 2 O 5 , ZrO 2 , HfO 2 , Sb 2 O 3 , a lanthanide-based material with or without lithium, another lithium-based ceramic material, a nickel oxide (NiO, Ni 2 O 3 , or combination of the two), and Li, nitrogen, Na, H, or another ion, any halogen, and any combination thereof. 19. An insulated glazing unit comprising: a first panel; an electrochemical device coupled to the first panel, the electrochemical device comprising: a substrate; a first transparent conductive layer disposed on the substrate; a cathodic electrochemical layer overlying the first transparent conductive layer; an anodic electrochemical layer overlying the cathodic electrochemical layer; and a second transparent conductive layer, wherein the second transparent conductive layer comprises a material, wherein the material has a first resistivity and a second resistivity, wherein the first resistivity is different from the second resistivity, wherein the first resistivity and the second resistivity comprise the same material; and wherein the first resistivity is between 15 Ω/sq to 100 Ω/sq; a second panel; and a spacer frame disposed between the first panel and the second panel. 20. The insulated glazing unit of claim 19 , wherein the second transparent conductive layer comprises a material selected from the group consisting of indium oxide, indium tin oxide, doped indium oxide, tin oxide, doped tin oxide, zinc oxide, doped zinc oxide, ruthenium oxide, doped ruthenium oxide and any combination thereof.

Assignees

Inventors

Classifications

  • G02F1/155Primary

    Electrodes · CPC title

  • Structural association of cells with optical devices, e.g. reflectors or illuminating devices · CPC title

  • Inner electrode, e.g. the electrochromic layer being sandwiched between the inner electrode and the support substrate · CPC title

  • having a particular pattern · CPC title

  • G02F1/163Primary

    Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor · CPC title

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What does patent US12013622B2 cover?
An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparen…
Who is the assignee on this patent?
Sage Electrochromics Inc
What technology area does this patent fall under?
Primary CPC classification G02F1/155. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 18 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).