Resin composition and flow cells incorporating the same

Patent metadata

Field	Value
Publication number	US-12013330-B2
Application number	US-201916515849-A
Country	US
Kind code	B2
Filing date	Jul 18, 2019
Priority date	Jul 20, 2018
Publication date	Jun 18, 2024
Grant date	Jun 18, 2024

Abstract

An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.

First claim

What is claimed is:

1. A resin composition, consisting of:
an epoxy resin matrix comprising an epoxy material selected from the group consisting of tetrakis(epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane; a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; 1,3-bis(glycidoxypropyl)tetramethyl disiloxane; and combinations thereof;
a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide;
a photoacid generator;
a polyacrylate; and
a solvent selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), toluene, dimethyl sulfoxide (DMSO), and tetrahydrofuran (THF).

2. The resin composition as defined in claim 1 , wherein the free radical photoinitiator is the phosphine oxide, and wherein the phosphine oxide is selected from the group consisting of diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide; a blend of diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide and 2-hydroxy-2-methylpropiophenone; phenylbis(2,4,6-,trimethylbenzoyl)phosphine oxide; ethyl(2,4,6-trimethylbenzoyl)phenylphosphinate; and combinations thereof.

3. The resin composition as defined in claim 1 , wherein the photoacid generator is selected from the group consisting of N-hydroxynaphthalimide triflate; triarylsulfonium hexafluorophosphate salts, mixed; triarylsulfonium hexafluoroantimonate salts, mixed; 1-naphthyl diphenylsulfonium triflate; 4-phenylthiophenyl)diphenylsulfonium triflate; bis-(4-methylphenyl)iodonium hexafluorophosphate; bis(4-tert-butylphenyl)iodonium hexafluorophosphate; (2-methylphenyl)(2,4,6-trimethylphenyl)iodonium triflate; bis(2,4,6-trimethylphenyl)iodonium triflate; bis-(4-dedecylphenyl)iodonium hexafluoroantimonate salt; and combinations thereof.

4. The resin composition as defined in claim 1 , wherein the free radical photoinitiator and the photoacid generator together are present in an amount ranging from about 1 wt % to about 10 wt %.

5. The resin composition as defined in claim 1 , wherein the solvent is the propylene glycol monomethylether acetate (PGMEA).

6. A method of making a flow cell, comprising:
depositing a resin composition on a substrate, the resin composition consisting of:
an epoxy resin matrix comprising an epoxy material selected from the group consisting of tetrakis(epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane; a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane; 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl] tetramethyl disiloxane; 1,3-bis(glycidoxypropyl)tetramethyl disiloxane; and combinations thereof;
a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide;
a photoacid generator;
a polyacrylate; and
a solvent selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), toluene, dimethyl sulfoxide (DMSO), and tetrahydrofuran (THF);

nanoimprinting the deposited resin composition using a working stamp; and
curing the deposited resin composition to form a cured, patterned resin.

7. A resin composition, comprising:
an epoxy resin matrix;
a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide;
a photoacid generator;
a solvent selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), toluene, dimethyl sulfoxide (DMSO), and tetrahydrofuran (THF); and
a dark quencher selected from the group consisting of an azo dye, 4-dimethylaminobenzene-4′-carboxylic acid, dabcyl azide, dabsyl azide, disperse red 19, a black dye-based quencher, and combinations thereof.

8. The resin composition as defined in claim 7 , wherein the dark quencher is the 4-dimethylaminobenzene-4′-carboxylic acid, dabcyl azide, dabsyl azide, disperse red 19, a black dye-based quencher, or a combination thereof.

9. The resin composition as defined in claim 7 , wherein the solvent is the propylene glycol monomethyl ether acetate (PGMEA).

Assignees

• Illumina Inc
• Illumina Cambridge Ltd

Inventors

• Merkel Timothy J
• George Wayne N
• Brown Andrew A
• Zak Audrey
• Artioli Gianluca Andrea
• Morrison Julia
• Romanov Nikolai
• Berti Lorenzo
• Boud Graham

Classifications

• C08L63/00

  Compositions of epoxy resins; Compositions of derivatives of epoxy resins · CPC title

• C08L83/12

  containing polyether sequences · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B82Y5/00

  Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery · CPC title