Method for producing porous metal oxide

US12012337B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12012337-B2
Application numberUS-202318094542-A
CountryUS
Kind codeB2
Filing dateJan 9, 2023
Priority dateJan 21, 2016
Publication dateJun 18, 2024
Grant dateJun 18, 2024

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.

First claim

Opening claim text (preview).

The invention claimed is: 1. A technetium 99m ( 99m Tc) generator, wherein the generator comprises a porous metal oxide as a molybdenum (Mo) absorbent, and the porous metal oxide has a pore volume of 0.3 cm 3 /g or larger and an average pore size of 9 nm or larger, wherein the porous metal oxide is porous titania, porous zirconia or porous alumina. 2. The generator of claim 1 , wherein the porous metal oxide has a specific surface area of 180 m 2 /g or larger. 3. The generator of claim 1 , wherein the porous metal oxide is porous alumina. 4. The generator of claim 1 , wherein the porous metal oxide is porous zirconia. 5. The generator of claim 1 , wherein the porous metal oxide has the pore volume of 0.3 cm 3 /g or larger and 1.153 cm 3 /g or smaller. 6. The generator of claim 1 , wherein the porous metal oxide has an average particle size of 1 μm or greater. 7. The generator of claim 1 , wherein a Mo held amount of Mo atoms held per gram of the porous metal oxide is 200 mg/g or higher. 8. A kit for preparation of a radiopharmaceutical, the kit comprising: a technetium 99m ( 99m Tc) generator comprising a column and a porous metal oxide as a Mo absorbent packed in the column, wherein the porous metal oxide has a pore volume of 0.3 cm 3 /g or larger and an average pore size of 9 nm or larger; an aqueous solution containing ( 99 Mo)O 4 2- ; and an eluent, wherein the porous metal oxide is porous titania, porous zirconia or porous alumina. 9. The kit of claim 8 , wherein the porous metal oxide has a specific surface area of 180 m 2 /g or larger. 10. The kit of claim 8 , wherein the porous metal oxide has the pore volume of 0.3 cm 3 /g or larger and 1.153 cm 3 /g or smaller. 11. The kit of claim 8 , wherein the porous metal oxide has an average particle size of 1 μm or greater. 12. The kit of claim 8 , wherein a Mo held amount of Mo atoms held per gram of the porous metal oxide is 200 mg/g or higher. 13. The kit of claim 8 , wherein the radiopharmaceutical includes technetium 99m.

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What does patent US12012337B2 cover?
Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up…
Who is the assignee on this patent?
Fujimi Inc
What technology area does this patent fall under?
Primary CPC classification C01F7/36. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 18 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).