Single layer nanofluidic separator chip and fluidic processor

US12011679B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12011679-B2
Application numberUS-201715815846-A
CountryUS
Kind codeB2
Filing dateNov 17, 2017
Priority dateNov 17, 2017
Publication dateJun 18, 2024
Grant dateJun 18, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A fluidic processor device and a wafer including the same, the device including a nanofluidic separator chip including a nanoDLD array, a housing for housing the chip including a top plate disposed on a topside of the chip, a bottom plate disposed on a backside of the chip and fastened to the top plate, and a spacer disposed between the chip and the bottom plate to create a clearance between the chip and the bottom plate for forming a drain space on the backside of the chip.

First claim

Opening claim text (preview).

What is claimed is: 1. A fluidic processor device including an input through-surface-via (TSV), a product TSV, a drain TSV, two sets of bussing channels, an inlet injection port channel, a product access port channel, a drain access port channel and a fastener, the fluidic processor device comprising: a nanofluidic separator chip including a nanofluidic deterministic lateral displacement (nanoDLD) array; a housing, for housing the nanofluidic separator chip, including: a top plate disposed on a top side of the nanofluidic separator chip; a bottom plate disposed on a back side of the nanofluidic separator chip; and a first spacer and a second spacer disposed between the nanofluidic separator chip and the bottom plate; a first chamber that stores a drain fluid which flows through the nanoDLD array via the drain TSV and that is: geometrically aligned about a center axis of the first chamber with the drain TSV and the nanoDLD array; and located between inner edges of the first spacer; and a second chamber that stores an output product which flows through the product TSV and that is: geometrically aligned about a center axis of the second chamber with the product TSV; and positioned between inner edges of the second spacer. 2. The fluidic processor device of claim 1 , wherein the first spacer includes an O-ring, and wherein the second spacer includes an O-ring. 3. The fluidic processor device of claim 2 , wherein an inner diameter of the O-ring of the second spacer corresponds to the inner edges of the second spacer. 4. The fluidic processor device of claim 1 , wherein the housing further includes: a third spacer geometrically aligned about a center axis with the input TSV, wherein a sample fluid is injected through the third spacer into the input TSV. 5. The fluidic processor device of claim 4 , wherein the first spacer, the second spacer, and the third spacer are separated from each other in a fluid flow direction. 6. The fluidic processor device of claim 1 , wherein the first spacer and the second spacer are separated from each other in a fluid flow direction. 7. The fluidic processor device of claim 1 , wherein the first chamber is sandwiched between the nanoDLD array, the bottom plate, and the first spacer, and wherein the second chamber is sandwiched between the product TSV, the bottom plate, and the second spacer. 8. The fluidic processor device of claim 1 , wherein the inner edges of the second spacer are spaced such that a distance between a first edge and a second edge of the inner edges is larger than a diameter of the product TSV. 9. The fluidic processor device of claim 1 , wherein both a front side and the back side of the nanofluidic separator chip isolate fluid. 10. The fluidic processor device of claim 1 , wherein the first chamber and the second chamber are simultaneously connected to the back side of the nanofluidic separator chip, and wherein the first chamber and the second chamber are disposed between the nanoDLD and the bottom plate. 11. The fluidic processor device of claim 1 , wherein the nanofluidic separator chip includes the two sets of bussing channels which are interdigitated together, and wherein each bus of the two sets of bussing channels brackets a region in which the nanoDLD array is fabricated so as to allow a fluid to flow from an input bus, through a plurality of separators, and into a product bus. 12. The fluidic processor device of claim 1 , wherein the first chamber isolates the drain fluid emitted from the nanoDLD array on the back side of the nanofluidic separator chip. 13. A fluidic processor device including an input through-surface-via (TSV), a product TSV, a drain TSV, two sets of bussing channels, an inlet injection port channel, a product access port channel, a drain access port channel and a fastener, the fluidic processor device comprising: a single layer chip for mass-parallel processing of a sample fluid; a housing, for housing the single layer chip, including: a top plate disposed on a top side of the single layer chip; a bottom plate disposed on a back side of the single layer chip; and a first spacer and a second spacer disposed between the single layer chip and the bottom plate; a first chamber that stores a drain fluid which flows through the single layer chip via the drain TSV and that is: geometrically aligned about a center axis of the first chamber with the drain TSV and the single layer chip; and located between inner edges of the first spacer; and a second chamber that stores an output product which flows through the product TSV and that is: geometrically aligned about a center axis of the second chamber with the product TSV; and positioned between inner edges of the second spacer. 14. The fluidic processor device of claim 13 , wherein the single layer chip uses interdigitated bus channel networks to link together several separator nanostructures in parallel. 15. A wafer, the wafer comprising: a fluidic processor device including an input through-surface-via (TSV), a product TSV, a drain TSV, two sets of bussing channels, an inlet injection port channel, a product access port channel, a drain access port channel and a fastener, the fluidic processor device including: a nanofluidic separator chip including a nanofluidic deterministic lateral displacement (nanoDLD) array; a housing, for housing the nanofluidic separator chip, including: a top plate disposed on a top side of the nanofluidic separator chip; a bottom plate disposed on a back side of the nanofluidic separator chip; and a first spacer and a second spacer disposed between the nanofluidic separator chip and the bottom plate; a first chamber that stores a drain fluid which flows through the nanoDLD array via the drain TSV and that is: geometrically aligned about a center axis of the first chamber with the drain TSV and the nanoDLD array; and located between inner edges of the first spacer; and a second chamber that stores an output product which flows through the product TSV and that is: geometrically aligned about a center axis of the second chamber with the product TSV; and positioned between inner edges of the second spacer.

Assignees

Inventors

Classifications

  • Settling tanks provided with means for ensuring a special flow pattern, e.g. even inflow or outflow (B01D21/2411 takes precedence) · CPC title

  • Washing granular, powdered or lumpy materials; Wet separating (separating by pneumatic tables or by pneumatic jigs B03B4/00) · CPC title

  • Micromachined or nanomachined, e.g. micro- or nanosize · CPC title

  • Field flow fractionation · CPC title

  • Discharge mechanisms for the classified liquid · CPC title

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What does patent US12011679B2 cover?
A fluidic processor device and a wafer including the same, the device including a nanofluidic separator chip including a nanoDLD array, a housing for housing the chip including a top plate disposed on a topside of the chip, a bottom plate disposed on a backside of the chip and fastened to the top plate, and a spacer disposed between the chip and the bottom plate to create a clearance between th…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification B01D17/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 18 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 11 related publications on this page (citations in our corpus or others sharing the same primary CPC).