Process for nanostructuring the surface of a material by laser

US12005523B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12005523-B2
Application numberUS-201917257134-A
CountryUS
Kind codeB2
Filing dateJul 12, 2019
Priority dateJul 13, 2018
Publication dateJun 11, 2024
Grant dateJun 11, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The invention relates to a process for nanostructuring the surface of a solid material in order to form a regular pattern of nanostructures on said surface, comprising: irradiating the surface by a plurality of pulse trains ( 20 ) of a femtosecond laser beam: each pulse train ( 20 ) comprises at least two pulses ( 21, 22 ), each pulse has a peak fluence, and a sum of the peak fluences of the pulses of a pulse train is between 10% and 70% of a threshold fluence corresponding to a material ablation threshold for one pulse for said material, two consecutive pulses of a pulse train are separated by a peak-to-peak duration ΔT between 500 fs and 150 ps, two consecutive pulse trains are separated by a duration greater than 10 ΔT, obtaining a regular pattern of nanostructures on said portion of surface, having a spatial periodicity lower than 130 nm.

First claim

Opening claim text (preview).

The invention claimed is: 1. Process for nanostructuring a surface of a solid material in order to form a regular pattern of nanostructures on said surface, said process comprising: supplying the solid material, said material comprising the surface; irradiating a portion of the surface by a femtosecond laser beam, comprising a plurality of pulse trains, wherein: each pulse train comprises at least two pulses, each pulse has a peak fluence, and a sum of the peak fluences of the pulses of a pulse train is between 10% and 70% of a threshold fluence corresponding to a material ablation threshold for one pulse for said material, two consecutive pulses of a pulse train are temporally separated by a peak-to-peak duration ΔT between 500 fs and 150 ps, two consecutive pulse trains are temporally separated by a duration greater than 10 ΔT, obtaining of a regular pattern of nanostructures on said portion of the surface, having a spatial periodicity lower than 130 nm, displacing the femtosecond laser beam on the surface in such a way as to irradiate other portions of said surface. 2. Process according to claim 1 , wherein each pulse has a peak fluence between 5% and 65% of a threshold fluence corresponding to a material ablation threshold for one pulse for said material. 3. Process according to claim 1 , wherein the irradiating by the plurality of pulse trains on a same surface portion represents a total dose less than 6 J/cm 2 . 4. Process according to claim 1 , wherein each portion of the surface is irradiated by at least 5 pulse trains. 5. Process according to claim 1 , wherein each portion of the surface is irradiated by a number of pulse trains less than 500. 6. Process according to claim 1 , wherein each pulse of a pulse train has a duration less than the duration ΔT between two consecutive pulses of the pulse train. 7. Process according to claim 1 , wherein the material has a crystalline structure, and in particular a face-centred cubic structure. 8. Process according to claim 1 , wherein the material contains diamond-like carbon. 9. Process according to claim 1 , wherein pulses of a pulse train have different linear polarisations when said pulses arrive on the surface. 10. Process according to claim 9 , wherein pulses of a pulse train have linear cross-polarisations. 11. Process according to claim 1 , wherein the nanostructures obtained are nano-pits or nano-holes and/or nano-bumps, forming a regular lattice on the surface. 12. Process according to claim 11 , wherein the nano-pits have a diameter between 10 nm and 40 nm, and preferably between 20 nm and 30 nm. 13. Process according to claim 1 , wherein the irradiated portions of the surface overlap partially. 14. Process according to claim 1 , wherein the material has a thickness less than 200 nm.

Assignees

Inventors

Classifications

  • Devices involving relative movement between laser beam and workpiece · CPC title

  • taking account of the properties of the material involved (B23K26/32, B23K26/40 take precedence) · CPC title

  • Ceramics · CPC title

  • using ultrashort pulses, i.e. pulses of 1 ns or less · CPC title

  • Modifying rugosity · CPC title

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What does patent US12005523B2 cover?
The invention relates to a process for nanostructuring the surface of a solid material in order to form a regular pattern of nanostructures on said surface, comprising: irradiating the surface by a plurality of pulse trains ( 20 ) of a femtosecond laser beam: each pulse train ( 20 ) comprises at least two pulses ( 21, 22 ), each pulse has a peak fluence, and a sum of the peak flue…
Who is the assignee on this patent?
Univ Jean Monnet Saint Etienne, Centre Nat Rech Scient
What technology area does this patent fall under?
Primary CPC classification B23K26/0006. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 11 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).