Laser dicing glass wafers using advanced laser sources
US-2024409449-A1 · Dec 12, 2024 · US
US12005523B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12005523-B2 |
| Application number | US-201917257134-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 12, 2019 |
| Priority date | Jul 13, 2018 |
| Publication date | Jun 11, 2024 |
| Grant date | Jun 11, 2024 |
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The invention relates to a process for nanostructuring the surface of a solid material in order to form a regular pattern of nanostructures on said surface, comprising: irradiating the surface by a plurality of pulse trains ( 20 ) of a femtosecond laser beam: each pulse train ( 20 ) comprises at least two pulses ( 21, 22 ), each pulse has a peak fluence, and a sum of the peak fluences of the pulses of a pulse train is between 10% and 70% of a threshold fluence corresponding to a material ablation threshold for one pulse for said material, two consecutive pulses of a pulse train are separated by a peak-to-peak duration ΔT between 500 fs and 150 ps, two consecutive pulse trains are separated by a duration greater than 10 ΔT, obtaining a regular pattern of nanostructures on said portion of surface, having a spatial periodicity lower than 130 nm.
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The invention claimed is: 1. Process for nanostructuring a surface of a solid material in order to form a regular pattern of nanostructures on said surface, said process comprising: supplying the solid material, said material comprising the surface; irradiating a portion of the surface by a femtosecond laser beam, comprising a plurality of pulse trains, wherein: each pulse train comprises at least two pulses, each pulse has a peak fluence, and a sum of the peak fluences of the pulses of a pulse train is between 10% and 70% of a threshold fluence corresponding to a material ablation threshold for one pulse for said material, two consecutive pulses of a pulse train are temporally separated by a peak-to-peak duration ΔT between 500 fs and 150 ps, two consecutive pulse trains are temporally separated by a duration greater than 10 ΔT, obtaining of a regular pattern of nanostructures on said portion of the surface, having a spatial periodicity lower than 130 nm, displacing the femtosecond laser beam on the surface in such a way as to irradiate other portions of said surface. 2. Process according to claim 1 , wherein each pulse has a peak fluence between 5% and 65% of a threshold fluence corresponding to a material ablation threshold for one pulse for said material. 3. Process according to claim 1 , wherein the irradiating by the plurality of pulse trains on a same surface portion represents a total dose less than 6 J/cm 2 . 4. Process according to claim 1 , wherein each portion of the surface is irradiated by at least 5 pulse trains. 5. Process according to claim 1 , wherein each portion of the surface is irradiated by a number of pulse trains less than 500. 6. Process according to claim 1 , wherein each pulse of a pulse train has a duration less than the duration ΔT between two consecutive pulses of the pulse train. 7. Process according to claim 1 , wherein the material has a crystalline structure, and in particular a face-centred cubic structure. 8. Process according to claim 1 , wherein the material contains diamond-like carbon. 9. Process according to claim 1 , wherein pulses of a pulse train have different linear polarisations when said pulses arrive on the surface. 10. Process according to claim 9 , wherein pulses of a pulse train have linear cross-polarisations. 11. Process according to claim 1 , wherein the nanostructures obtained are nano-pits or nano-holes and/or nano-bumps, forming a regular lattice on the surface. 12. Process according to claim 11 , wherein the nano-pits have a diameter between 10 nm and 40 nm, and preferably between 20 nm and 30 nm. 13. Process according to claim 1 , wherein the irradiated portions of the surface overlap partially. 14. Process according to claim 1 , wherein the material has a thickness less than 200 nm.
Devices involving relative movement between laser beam and workpiece · CPC title
taking account of the properties of the material involved (B23K26/32, B23K26/40 take precedence) · CPC title
Ceramics · CPC title
using ultrashort pulses, i.e. pulses of 1 ns or less · CPC title
Modifying rugosity · CPC title
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